Adjustable extended electrode for edge uniformity control
Embodiments described herein generally related to a substrate processing apparatus. In one embodiment, a process kit for a substrate processing chamber disclosed herein. The process kit includes a ring having a first ring component and a second ring component, an adjustable tuning ring, and an actuating mechanism. The first ring component is interfaced with the second ring component such that the second ring component is movable relative to the first ring component forming a gap therebetween. The adjustable tuning ring is positioned beneath the ring and contacts a bottom surface of the second ring component. A top surface of the adjustable tuning ring contacts the second ring component. The actuating mechanism is interfaced with the bottom surface of the adjustable tuning ring. The actuating mechanism is configured to actuate the adjustable tuning ring such that the gap between the first ring component and the second ring component varies.
1. A process kit for a substrate processing chamber, the process kit comprising:
a ring having a first ring component and a second ring component, the first ring component interfaced with the second ring component such that the second ring component is movable relative to the first ring component to form a gap therebetween;
an adjustable tuning ring positioned beneath the second ring component and contacting a bottom surface of the second ring component, the adjustable tuning ring having a top surface and a bottom surface, the top surface of the adjustable tuning ring contacting the second ring component; and
an actuating mechanism interfaced with the bottom surface of the adjustable tuning ring, the actuating mechanism configured to actuate the adjustable tuning ring such that the gap between the first ring component and the second ring component is varied.
2. The process kit of claim 1 , wherein the adjustable tuning ring is formed from a conductive material.
3. The process kit of claim 1 , wherein the first ring component comprises:
a stepped surface formed therein.
4. The process kit of claim 3 , wherein the second ring component comprises:
a stepped surface formed therein, wherein the stepped surface of the second ring component interfaces with the stepped surface of the first ring component.
5. The process kit of claim 1 , wherein the actuating mechanism comprises:
a lift pin having a first end and a second end, the first end of the lift pin contacting the bottom surface of the adjustable tuning ring, the second end of the lift pin in communication with a lift mechanism.
6. The process kit of claim 1 , wherein the actuating mechanism is configured to move up and down a plasma sheath formed between a plasma and the ring while maintaining a plasma sheath thickness nearly constant by raising and lowering the second ring component.
7. The process kit of claim 6 , wherein the adjustable tuning ring comprises:
an annular body having the top surface and the bottom surface of the adjustable tuning ring;
a cavity formed in the bottom surface of the annular body; and
an access orifice formed in the annular body, the access orifice extending from the top surface of the annular body into the cavity.
8. The process kit of claim 7 , wherein the cavity has a first diameter and the access orifice has a second diameter, the first diameter being larger than the second diameter, and the actuating mechanism is a screw disposed at least partially in the cavity, the screw configured to be rotated through the access orifice to actuate the adjustable tuning ring.
9. A process kit for a substrate processing chamber, the process kit comprising:
a ring having a first ring component and a second ring component, the first ring component interfaced with the second ring component such that the second ring component is movable relative to the first ring component to form a gap therebetween;
an adjustable tuning ring positioned beneath the second ring component and radially outside of the first ring component, the adjustable tuning ring having a top surface and a bottom surface, the top surface of the adjustable tuning ring contacting a bottom surface of the second ring component; and
an actuating mechanism interfaced with the bottom surface of the adjustable tuning ring, the actuating mechanism configured to actuate the adjustable tuning ring such that the gap between the first ring component and the second ring component is varied.
10. The process kit of claim 9 , wherein the adjustable tuning ring is formed from a conductive material.
11. The process kit of claim 9 , wherein the first ring component comprises:
a stepped surface formed therein.
12. The process kit of claim 11 , wherein the second ring component comprises:
a stepped surface formed therein, wherein the stepped surface of the second ring component interfaces with the stepped surface of the first ring component.
13. The process kit of claim 9 , wherein the actuating mechanism comprises:
a lift pin having a first end and a second end, the first end of the lift pin contacting the bottom surface of the adjustable tuning ring, the second end of the lift pin in communication with a lift mechanism.
14. The process kit of claim 9 , wherein the actuating mechanism is configured to move up and down a plasma sheath formed between a plasma and the ring while maintaining a plasma sheath thickness nearly constant by raising and lowering the second ring component.
15. The process kit of claim 9 , wherein the adjustable tuning ring comprises:
an annular body having the top surface and the bottom surface of the adjustable tuning ring;
a cavity formed in the bottom surface of the annular body; and
an access orifice formed in the annular body, the access orifice extending from the top surface of the annular body into the cavity.
16. The process kit of claim 15 , wherein the cavity has a first diameter and the access orifice has a second diameter, the first diameter being larger than the second diameter, and the actuating mechanism is a screw disposed at least partially in the cavity, the screw configured to be rotated through the access orifice to actuate the adjustable tuning ring.
17. A method of processing a substrate, comprising:
positioning the substrate on a substrate support disposed in a substrate processing chamber;
forming a plasma above the substrate;
directing ions in a first direction; and
adjusting a height of a ring component of an edge ring by actuating an adjustable tuning ring interfaced with the ring component to direct one or more ions above the substrate support in a second direction that is different than the first direction.
18. The method of claim 17 , wherein the adjusting the height of the ring component moves a plasma sheath formed between the plasma and the edge ring while maintaining a plasma sheath thickness nearly constant.
19. The method of claim 17 , wherein the actuating the adjustable tuning ring comprises raising or lowering one or more lift pins in contact with a bottom surface of the adjustable tuning ring.
20. The method of claim 17 , wherein the adjustable tuning ring comprises a cavity formed in a bottom surface of the adjustable tuning ring and an access orifice formed in the adjustable tuning ring, the access orifice extending from a top surface of the adjustable tuning ring into the cavity, and the actuating the adjustable tuning ring comprises rotating a screw disposed at least partially in the cavity.