Touch screen assembly and electronic device with improved light transmittance

1. A touch screen assembly, comprising:

a first thin film layer, a conductive layer, and a second thin film layer stacked together from bottom to top; and

a base wherein the first film layer is disposed on the base;

wherein a difference value of refractive index between the base and the conductive layer ranges from 0 to 0.6, the base comprising a substrate and doped materials in the substrate, the substrate is a glass cover or a substrate glass, and the doped materials comprise any one of niobium and lanthanum.

2. The touch screen assembly according to claim 1 , wherein a doping density of the doped materials ranges from 0.05% to 1%.

3. The touch screen assembly according to claim 1 , wherein a lead layer is further disposed on a periphery of the conductive layer.

4. The touch screen assembly according to claim 3 , wherein the conductive layer is composed of a plurality of rows of conductive glass patches, and the conductive glass patches are obtained by etching treatment of the conductive layer.

5. The touch screen assembly according to claim 4 , wherein the etching treatment comprises any one of yellow light etching and laser etching.

6. The touch screen assembly according to claim 1 , wherein the conductive layer is further provided with a functional layer on each of the upper and lower sides of the conductive layer, and the functional layer comprises one or more of a mixture of silicon oxide and aluminum oxide, a mixture of silicon oxide and boron oxide, silicon oxide and a mixture of phosphorus oxides.

7. An electronic device including: a housing and a touch screen assembly, the touch screen assembly being disposed on the housing, the touch screen assembly comprising:

a first thin film layer, a conductive layer, and a second thin film layer stacked together from bottom to top; and

a base wherein the first film layer is disposed on the base;

wherein a difference value of refractive index between the base and the conductive layer ranges from 0 to 0.6, the base comprising a substrate and doped materials in the substrate, the substrate is a glass cover or a substrate glass, and the doped materials comprise any one of niobium and lanthanum.

8. The electronic device according to claim 7 , wherein a doping density of the doped materials ranges from 0.05% to 1%.

9. The electronic device according to claim 7 , wherein a lead layer is further disposed on a periphery of the conductive layer.

10. The electronic device according to claim 9 , wherein the conductive layer is composed of a plurality of rows of conductive glass patches, and the conductive glass patches are obtained by etching treatment of the conductive layer.

11. The electronic device according to claim 10 , wherein the etching treatment comprises any one of yellow light etching and laser etching.

12. The electronic device according to claim 7 , wherein the conductive layer is further provided with a functional layer on each of the upper and lower sides of the conductive layer, and the functional layer comprises one or more of a mixture of silicon oxide and aluminum oxide, a mixture of silicon oxide and boron oxide, silicon oxide and a mixture of phosphorus oxides.

13. A touch screen assembly, comprising:

a first thin film layer, a conductive layer, and a second thin film layer stacked together from bottom to top; and

a base wherein the first film layer is disposed on the base;

wherein the base comprises a substrate and doped materials in the substrate, the substrate is a glass cover or a substrate glass, the doped materials comprise any one of niobium and lanthanum, a difference value of refractive index between the base and the conductive layer ranges from 0 to 0.6, the first thin film layer and the second thin film layer are composed of silicon dioxide, and the conductive layer is composed of indium tin oxide.