Control method of movable body, exposure method, device manufacturing method, movable body apparatus, and exposure apparatus
In a beam irradiation apparatus in which a movable body holds an object, a mark detection system detects a first mark on the movable body while moving the movable body in a first direction and changing an irradiation position of a measurement beam in the first direction, the mark detection system detects a second mark while moving the movable body in the first direction and changing the irradiation position of the measurement beam in the first direction, a controller controls a position of the movable body in a second direction intersecting the first direction during a time period between the detection of the first mark and the detection of the second mark, and the controller controls the movement of the movable body to adjust a positional relation between the object on the movable body and a processing beam, based on results of the detection of the first and second marks.
1. A measurement device, comprising:
an irradiation system, an objective lens and a beam receiving system,
the irradiation system irradiating, with a measurement beam via the objective lens, a grating mark provided at an object that is moved in a first direction while moving the measurement beam in the first direction with respect to the grating mark,
the objective lens being capable of facing the object that is moved in the first direction, and
the beam receiving system receiving, from the grating mark, a diffraction beam of the measurement beam via the objective lens.
2. The measurement device according to claim 1 , wherein
the measurement beam is transmitted through a center portion of the objective lens and is irradiated on the grating mark.
3. The measurement device according to claim 2 , wherein
the measurement beam transmitted through the center portion of the objective lens is irradiated on the grating mark from a second direction intersecting the first direction.
4. The measurement device according to claim 2 , wherein
the diffraction beam received from the grating mark is bent by a peripheral area of the objective lens toward the beam receiving system.
5. The measurement device according to claim 1 , wherein
the measurement beam that is moved in the first direction is incident on one side of the objective lens and is emitted from an other side of the objective lens, and
the diffraction beam received from the grating mark is incident on the other side of the objective lens.
6. The measurement device according to claim 1 , further comprising:
a control system that controls a moving velocity of the measurement beam.
7. The measurement device according to claim 6 , wherein
the control system further controls a movement velocity of the object that is moved.
8. The measurement device according to claim 1 , further comprising:
a calculation system that obtains positional information of the grating mark based on the diffraction beam received by the beam receiving system.
9. An exposure apparatus, comprising:
the measurement device according to claim 8 ;
a position control device that controls a position of the object based on the positional information obtained by the calculation system; and
a pattern formation device that forms a predetermined pattern on the object by irradiating the object with an energy beam.
10. A measurement method of measuring positional information of a grating mark provided at an object, the method comprising:
moving, in a first direction, the object below an objective lens including an objective optical element capable of facing the object;
irradiating, with a measurement beam via the objective lens, the grating mark of the object that is moved in the first direction while moving the measurement beam in the first direction with respect to the grating mark; and
receiving from the grating mark a diffraction beam of the measurement beam with a beam receiving system via the objective lens.
11. The measurement method according to claim 10 , wherein
the measurement beam that is moved in the first direction is transmitted through a center portion of the objective lens and is irradiated on the grating mark.
12. The measurement method according to claim 11 , wherein
the measurement beam transmitted through the center portion of the objective lens is irradiated on the grating mark from a second direction intersecting the first direction.
13. The measurement method according to claim 11 , wherein
the diffraction beam received from the grating mark is bent by a peripheral area of the objective lens toward the beam receiving system.
14. The measurement method according to claim 10 , wherein
the measurement beam that is moved in the first direction is incident on one side of the objective lens and is emitted from an other side of the objective lens, and
the diffraction beam received from the grating mark is incident on the other side of the objective lens.
15. The measurement method according to claim 10 , further comprising:
controlling a moving velocity of the measurement beam while moving the measurement beam in the first direction.
16. The measurement method according to claim 15 , further comprising:
controlling a movement velocity of the object that is moved.
17. The measurement method according to claim 10 , further comprising:
obtaining positional information of the grating mark based on the diffraction beam received by the beam receiving system.