IP Library › Granted Patent US 11,003,197
Granted Patent B2
US 11,003,197 · App. 16/645,128 · Granted May 11, 2021

Flow rate control device

Inventors: Takahiro Kawamoto (Hino, JP); Takuo Shimada (Hino, JP); Shinji Tobimatsu (Hino, JP); Tetsuaki Sekine (Hino, JP)
Assignee: TOFLO CORPORATION
G05D7/0635F16K37/0041G05D7/0652
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Quick Facts
Patent No.
US 11,003,197
App. No.
16/645,128
Granted
May 11, 2021
Kind
B2
Abstract

An object is to provide a flow rate control device that can suppress a manufacturing cost and greatly reduce burdens of setting and maintenance. A flow rate control device 11 of the invention is comprised with a flow rate adjusting valve 21 that is installed in a flow path 13 , a flow rate measurement part 41 that measures a flow rate of a fluid flowing through the flow path 13 , a controller 61 that controls opening degrees of the flow rate adjusting valve 21 based on a measurement result of the flow rate measurement part 41 , and a pressure deficiency detecting function that detects pressure deficiency when a limit sensor 246 (an opening detecting sensor) that detects the opening of the flow rate adjusting valve 21 detects the opening degrees are full. With the structure, it becomes possible, compared with a conventional system to detect a pressure deficiency using a pressure sensor, to suppress a manufacturing cost and greatly reduce burdens of setting and maintenance and to notify of pressure deficiency at a necessary timing in an early stage before an abnormality occurs due to a flow rate decrease.

Claims (14)

1. A flow rate control device, comprising:

a flow rate adjusting valve that is installed in a flow path, wherein the flow rate adjusting valve has an opening through which a fluid flows,

a flow rate measurement part that measures a flow rate of the fluid flowing through the flow path,

a controller that controls opening degrees of the flow rate adjusting valve based on a measurement result of the flow rate measurement part, and

a pressure deficiency detecting function that detects pressure deficiency when an opening detecting sensor that detects the opening degrees of the flow rate adjusting valve detects the opening are fully opened.

2. The flow rate control device according to claim 1 , further comprising:

a valve life notifying function that notifies of a life end of the flow rate adjusting valve when an accumulated operation amount of the flow rate adjusting valve has reached a predetermined setting value.

3. The flow rate control device according to claim 1 , further comprising:

an internal leak notifying function that notifies of a leak of a liquid inside the flow rate adjusting valve when a flow amount is a predetermined setting value or greater even though the opening of the flow rate adjusting valve has been fully closed.

4. The flow rate control device according to claim 2 , further comprising:

an internal leak notifying function that notifies of a leak of a liquid inside the flow rate adjusting valve when a flow amount is a predetermined setting value or greater even though the opening of the flow rate adjusting valve has been fully closed.

5. The flow rate control device according to claim 1 , further comprising

a flowmeter life notifying function that notifies of a life end of the flow rate measurement part when an accumulated rotation number of an impeller in the flow rate measurement part has reached a predetermined setting value.

6. The flow rate control device according to claim 1 , further comprising: an LED that emits light in a pattern corresponding to each of individual functions of the pressure deficiency detecting function, a valve life notifying function, an internal leak notifying function, and a flowmeter life notifying function.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 6, 2020
From: KAWAMOTO, TAKAHIRO; SHIMADA, TAKUO; TOBIMATSU, SHINJI; SEKINE, TETSUAKI
To: TOFLO CORPORATION
Reel/Frame 052038/0173 →
Continuity (1)
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