IP Library Granted Patent US 11,004,652
Granted Patent B2
US 11,004,652 · App. 16/642,231 · Granted May 11, 2021

Ion milling device

Inventors: Asako Kaneko (Tokyo, JP); Hisayuki Takasu (Tokyo, JP)
Assignee: Hitachi High-Tech Corporation
H01J37/20H01J37/08H01J37/09H01J37/28H01J37/31H01J2237/081H01J2237/20257
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Quick Facts
Patent No.
US 11,004,652
App. No.
16/642,231
Granted
May 11, 2021
Kind
B2
Abstract

An object of the present invention is to provide a technique for reducing a phenomenon in which fine particles derived from a sample and bounced off by ion beam irradiation are reattached to an ion milling surface. An ion milling device of the invention includes an ion source which emits an ion beam, a chamber, a sample table in which a sample is placed in the chamber, and a shielding plate placed on the sample, and by having a magnet disposed in the chamber, reattachment of fine particles derived from the sample can be reduced.

Claims (24)

1. An ion milling device, comprising:

a chamber;

a sample table made of a non-magnetic material and on which a sample is placed in the chamber;

a shielding plate placed on the sample; and

an ion source which is placed so as to face an upper surface of the sample table and emits an ion beam, wherein

a magnet holding plate made of a non-magnetic material in which a first magnet is detachably disposed on the upper surface of the sample table and the sample is placed on an upper surface of the magnet holding plate when the first magnet is disposed on the sample table.

2. The ion milling device according to claim 1 , wherein

a second magnet is disposed on a lateral side of the sample.

3. The ion milling device according to claim 2 , wherein

the first magnet is disposed on the sample table and the second magnet is disposed on the lateral side of the sample.

4. The ion milling device according to claim 1 , comprising

a holder for detachably holding the first magnet.

5. The ion milling device according to claim 2 , comprising:

a moving mechanism for the second magnet.

6. The ion milling device according to claim 1 , wherein

the first magnet is a permanent magnet.

7. The ion milling device according to claim 6 , wherein

the permanent magnet has a maximum magnetic force of about 300 gauss to 400 gauss.

8. The ion milling device according to claim 1 , wherein

the magnet holding plate has a cavity, and

an arrangement position of the first magnet can be adjusted in the cavity of the magnet holding plate.

9. The ion milling device according to claim 1 , wherein

the sample table has a magnet holder, and

the first magnet can be removed from below the sample table by removing the magnet holder of the sample table.

Assignments (2)
CHANGE OF NAME Recorded Feb 19, 2021
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 055345/0779 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2020
From: KANEKO, ASAKO; TAKASU, HISAYUKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 051952/0543 →
Continuity (1)
Related Publication 20200357602A1 · Nov 12, 2020