IP Library › Granted Patent US 11,015,264
Granted Patent B2
US 11,015,264 · App. 16/270,804 · Granted May 25, 2021

Diamond substrate, quantum device, quantum system, and method for manufacturing diamond substrate

Inventor: Tatsuo Shimizu (Shinagawa, JP)
Assignee: Kabushiki Kaisha Toshiba
C30B29/04C23C16/27C23C16/401C23C16/56C30B25/02C30B33/02
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Quick Facts
Patent No.
US 11,015,264
App. No.
16/270,804
Granted
May 25, 2021
Kind
B2
Abstract

A diamond substrate according to an embodiment includes a diamond layer including at least one first element selected from the group consisting of nitrogen (N), phosphorus (P), arsenic (As), antimony (Sb), and bismuth (Bi), the number of threefold coordinated atoms of the at least one first element in the diamond layer being larger than the number of fourfold coordinated atoms of the at least one first element in the diamond layer, a surface of the diamond layer having an off angle of 10 degrees or less with respect to a (111) face.

Claims (30)

1. A diamond substrate comprising:

a diamond layer including at least one first element selected from the group consisting of nitrogen (N), phosphorus (P), arsenic (As), antimony (Sb), and bismuth (Bi), the number of threefold coordinated atoms of the at least one first element in the diamond layer being larger than the number of fourfold coordinated atoms of the at least one first element in the diamond layer, a surface of the diamond layer having an off angle of 10 degrees or less with respect to a (111) face.

2. The diamond substrate according to claim 1 ,

wherein directions connecting the threefold coordinated atoms of the at least one first element and vacancies adjacent to the threefold coordinated atoms of the at least one first element are aligned with a [111] direction at a rate of 95% or more.

3. The diamond substrate according to claim 1 , further comprising:

an oxide layer provided on the surface of the diamond layer.

4. The diamond substrate according to claim 3 , further comprising:

a region located between the diamond layer and the oxide layer, the region including at least one second element selected from the group consisting of N, P, As, Sb and Bi.

5. The diamond substrate according to claim 4 ,

wherein a concentration distribution of the at least one second element in the diamond layer, the region, and the oxide layer has a peak in the region.

6. The diamond substrate according to claim 1 ,

wherein a concentration of the at least one first element in the diamond layer is equal to or greater than 1×10 18 cm −3 and equal to or less than 1×10 22 cm −3 .

7. A quantum device comprising the diamond substrate according to claim 1 .

8. A quantum system comprising the diamond substrate according to claim 1 .

9. The diamond substrate according to claim 1 ,

wherein a percentage of the threefold coordinated atoms of the at least one first element among the at least one first element included in the diamond layer is equal to or greater than 95%.

10. The diamond substrate according to claim 1 further comprising:

a base layer made of diamond, the diamond layer provided on the base layer.

11. A diamond substrate comprising:

a diamond layer including at least one first element selected from the group consisting of nitrogen (N), phosphorus (P), arsenic (As), antimony (Sb), and bismuth (Bi), the diamond layer having a first bonding structure and a second bonding structure, the first bonding structure having the at least one first element and hydrogen bonded to the at least one first element, the second bonding structure having the at least one first element and four carbon atoms bonded to the at least one first element, the number of first bonding structures being larger than the number of second bonding structures, a surface of the diamond layer having an off angle of 10 degrees or less with respect to a (111) face.

12. The diamond substrate according to claim 11 ,

wherein directions connecting the at least one first element and the hydrogen are aligned with a [111] direction at a rate of 95% or more.

13. The diamond substrate according to claim 11 , further comprising:

an oxide layer provided on the surface of the diamond layer.

14. The diamond substrate according to claim 13 , further comprising:

a region located between the diamond layer and the oxide layer, the region including at least one second element selected from the group consisting of N, P, As, Sb and Bi.

15. The diamond substrate according to claim 14 ,

wherein a concentration distribution of the at least one second element in the diamond layer, the region, and the oxide layer has a peak in the region.

16. The diamond substrate according to claim 7 ,

wherein a concentration of the at least one first element in the diamond layer is equal to or greater than 1×10 18 cm −3 and equal to or less than 1×10 22 cm −3 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 19, 2019
From: SHIMIZU, TATSUO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 048938/0166 →
Priority Claims (1)
JP JP2018-173111 · Sep 14, 2018 · national
Continuity (1)
Related Publication 20200087817A1 · Mar 19, 2020
Cited By (1)
US 12,553,959