IP Library › Granted Patent US 11,016,039
Granted Patent B2
US 11,016,039 · App. 16/149,423 · Granted May 25, 2021

Measurement processing device, measurement processing method, measurement processing program, and method for manufacturing structure

Inventors: Nobukatsu Machii (Yokohama, JP); Fuminori Hayano (Tokyo, JP); Akitoshi Kawai (Yokohama, JP)
Assignee: Nikon Corporation
G01N23/04G01B15/04G01N23/046G01N2223/304G01N2223/306G01N2223/646
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Quick Facts
Patent No.
US 11,016,039
App. No.
16/149,423
Granted
May 25, 2021
Kind
B2
Abstract

A measurement processing device used for an x-ray inspection apparatus that detects an x-ray passing through a specimen with a detection unit to sequentially inspect a plurality of specimens on the basis of an acquired transmission image, includes a setting unit that sets a region to be inspected on a portion of the specimen; a determination unit that determines the non-defectiveness of the region to be inspected by using a transmission image of the x-ray that passed through the region to be inspected; a correction unit that performs a correction on the region to be inspected on the basis of a determination result by the determination unit; and a display control unit that displays the corrected region to be inspected corrected by the correction unit.

Claims (42)

1. A measurement processing method, comprising:

setting an evaluation region of a specimen;

calculating, for each of a plurality of lattice grids, a plurality of different non-defective factors regarding the specimen from shape information acquired based upon a transmission image of x-ray that has transmitted the specimen; and

determining non-defectiveness of the evaluation region based upon the calculated plurality of different non-defectiveness factors for each of the plurality of lattice grids.

2. The measurement processing method according to claim 1 , wherein

the non-defectiveness of the evaluation region is based upon a possibility of a defect to be occurred in the specimen.

3. The measurement processing method according to claim 1 , wherein

the non-defectiveness factor is a factor based upon an internal defect of the specimen.

4. The measurement processing method according to claim 1 , wherein

the non-defectiveness factor is ratio of an internal defect per unit volume.

5. The measurement processing method according to claim 1 , wherein

the non-defectiveness factor is distance between an internal defect and a surface of the specimen.

6. The measurement processing method according to claim 1 , wherein

the non-defectiveness factor is based upon the shape information acquired based upon transmission images of x-ray that has transmitted a plurality of specimens.

7. The measurement processing method according to claim 1 , wherein

evaluating the non-defectiveness of the evaluation region by weighting the calculated plurality of different non-defectiveness factors.

8. The measurement processing method according to claim 1 , further comprising

displaying the non-defectiveness of the evaluation region in correspondence with a display of the evaluation region.

9. The measurement processing method according to claim 1 , further comprising

correcting the evaluation region based upon the non-defectiveness of the evaluation region.

10. The measurement processing method according to claim 1 , wherein

the evaluation region is set in a site of the specimen.

11. The measurement processing method according to claim 1 , wherein

the evaluation region is set based upon a function of the site of the specimen.

12. The measurement processing method according to claim 1 , further comprising

storing history data regarding determination results of the non-defectiveness.

13. The measurement processing method according to claim 1 , further comprising:

setting the non-defectiveness of the lattice grid based upon the calculated plurality of different non-defective factors for the same lattice grid;

calculating an average of the non-defectiveness in the same lattice grid, a standard deviation of the non-defectiveness in the same lattice grid or a ratio of change in time of the non-defectiveness in the same lattice grid as an evaluation coefficient; and

changing the evaluation region when the evaluation coefficient is determined to be greater than or equal to a threshold.

14. A measurement processing device, comprising:

a calculation unit that calculates, for each of a plurality of lattice grids, a plurality of different non-defective factors regarding a specimen from shape information acquired based upon a transmission image of x-ray that has transmitted the specimen; and

a determination unit that determines non-defectiveness of an evaluation region based upon the calculated plurality of different non-defectiveness factors for each of the plurality of lattice grids.

15. A method for manufacturing structures, comprising:

creating design information regarding the shape of a structure;

creating the structure on the basis of the design information;

acquiring shape information by measuring the shape of the created structure by using the measurement processing device according to claim 14 ; and

comparing the acquired shape information and the design information.

16. An x-ray inspection apparatus, comprising:

a setting unit that sets an evaluation region on a partial region of a specimen;

a calculation unit that calculates, for each of a plurality of lattice grids, a plurality of different non-defective factors regarding the specimen from shape information acquired based upon a transmission image of x-ray that has transmitted the specimen; and

a determination unit that determines non-defectiveness of the evaluation region based upon the calculated plurality of different non-defectiveness factors for each of the plurality of lattice grids.

Continuity (2)
Division 15507999
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