Stretchable electronics and methods of making the same
A stretchable and transparent electronic structure may generally include a stretchable elastomer layer; optionally, a metal adhesion layer on top of the stretchable elastomer layer; a metal alloying layer on top of the metal adhesion layer; and a liquid metal, wherein the structure is colorless and transparent when viewed under visible light. Methods of making the stretchable and transparent electronic structure are also described.
1. A stretchable and transparent electronic structure comprising a plurality of laser patterned biphasic metallic grid lines having a thickness up to 600 nanometers and a width up to 6 micrometers, the structure comprising:
a stretchable elastomer layer;
a metal alloying layer on top of the stretchable elastomer layer; and
a liquid metal,
wherein the structure is colorless and transparent when viewed under visible light.
2. The structure according to claim 1 , wherein the metal alloying layer is at least one of copper, gold, and silver.
3. The structure according to claim 1 , wherein the liquid metal is a metal alloy consisting essentially of gallium, indium, and copper and, optionally, tin.
4. The structure according to claim 1 , wherein the liquid metal comprises a conductive material that is liquid at a temperature from −20° C. to 40° C.
5. The structure according to claim 1 , comprising a metal adhesion layer intermediate the stretchable elastomer layer and metal alloying layer.
6. The structure according to claim 5 , wherein the metal alloying layer comprises copper, the metal adhesion layer comprises chromium, and the liquid metal comprises gallium and indium.
7. The structure according to claim 1 , wherein the stretchable elastomer layer comprises one of a stretchable silicone layer and a stretchable fluoropolymer layer.
8. The structure according to claim 1 , wherein the structure is invisible to the human eye when viewed.
9. The structure according to claim 1 comprising a biphasic metal coating comprising conductive grid lines on less than 15% of total surface area of the top of the stretchable elastomer layer and at least 85% void spaces of total surface area of the top of the stretchable elastomer layer, and wherein the void spaces between each of the grid lines have a width up to 10 micrometers and a pitch up to 100 micrometers.
10. The structure according to claim 1 comprising a plurality of laser patterned biphasic metallic grid lines having a width less than 5 micrometers and the structure comprising at least 80% transmittance.
11. The structure according to claim 10 , wherein the biphasic metallic grid lines have a width up to 4.5 micrometers.
12. The structure according to claim 1 , wherein the structure comprises at least 80% transmittance from 400-800 nanometers, a sheet resistance less than 10 Ohm/square, a volumetric resistivity less than 10 −5 Ohm-meters, a Young's modulus from 0.01-10 MPa, and a strain limit less than 50%.
13. The structure according to claim 1 , wherein the biphasic metallic grid lines have a pitch from 10-100 micrometers.