IP Library Granted Patent US 11,019,759
Granted Patent B2
US 11,019,759 · App. 16/089,793 · Granted May 25, 2021

Electromagnetic wave shielding material

Inventor: Koichiro Tanaka (Ibaraki, JP)
Assignee: JX Nippon Mining & Metals Corporation
H05K9/0088B32B7/025B32B15/08B32B15/085B32B15/088B32B15/095B32B15/20B32B2250/40B32B2250/42B32B2307/202B32B2307/212B32B2307/732B32B2457/00B32B2605/08
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Quick Facts
Patent No.
US 11,019,759
App. No.
16/089,793
Granted
May 25, 2021
Kind
B2
Abstract

Provided is an electromagnetic shielding material that has good magnetic field shielding properties against a low-frequency electromagnetic field of 1 MHz or less, lightweight and also excellent formability. The electromagnetic shielding material has a structure in which at least two metal foils are closely laminated via at least one resin layer, wherein at least one resin forming the at least one resin layer has no yield point at 150° C.; wherein all of combinations of the at least two metal foils and the at least one resin layer forming the electromagnetic shielding material satisfy the following equation (A): σ M ×d M ×d R ≥3×10 −3 ,  Equation (A): wherein the electromagnetic shielding material satisfies the following equation (B): ∑ i a = 1 ⁢ ( d Ra + f Ra ) ∑ j b = 1 ⁢ ( d Mb + f Mb ) ≥ 0.8 Equation ⁢ ⁢ ( B ) and wherein all the metal foils from the first foil to the j th foil satisfy the following equation (C): {( d Rb1 ×f Rb1 ) ( d Rb2 ×f Rb2 )}/( d Mb ×f Mb )≥0.8.  Equation (C):

Claims (64)

1. An electromagnetic shielding material comprising a structure in which at least two metal foils are closely laminated via at least one resin layer, wherein at least one resin forming the at least one resin layer has no yield point at 150° C.;

wherein all of combinations of the metal foils and the at least one resin layer forming the electromagnetic shielding material satisfy the following equation (A):

σ M ×d M ×d R ≥3×10 −3 ,  Equation (A):

in which:

σ M represents a conductivity of metal foil at 20° C. (S/m);

d M represents a thickness of metal foil (m); and

d R represents a thickness of resin layer (m);

wherein the electromagnetic shielding material satisfies the following equation (B):

i

a

=

1

(

d

Ra

+

f

Ra

)

j

b

=

1

(

d

Mb

+

f

Mb

)

0.8

Equation

(

B

)

in which:

i represents the number of the at least one resin layer forming the electromagnetic shielding material;

j represents the number of the metal foils forming the electromagnetic shielding material;

d Ra represents a thickness of the a th resin layer (μm);

f Ra represents a stress (MPa) of the a th resin layer at 150° C. and 4% tensile strain;

d Mb represents a thickness of the b th metal foil (μm); and

f Mb represents a stress (MPa) of the b th metal foil at 150° C. and 4% tensile strain; and

wherein when the number of the metal foils forming the electromagnetic shielding material is defined as j, all the metal foils from the first foil to the j th foil satisfy the following equation (C):

{( d Rb1 ×f Rb1 )+( d Rb2 ×f Rb2 )}/( d Mb ×f Mb )≥0.8  Equation (C):

in which:

b represents an integer from 1 to j;

d Rb1 represents a thickness (μm) of a resin layer adjacent to one surface of the b th metal foil;

f Rb1 represents a stress (MPa) of the resin layer adjacent to one surface of the b th metal foil, at 150° C. and 4% tensile strain;

d Rb2 represents a thickness (μm) of a resin layer adjacent to another surface of the b th metal foil;

f Rb2 represents a stress (MPa) of the resin layer adjacent to another surface of the b th metal foil, at 150° C. and 4% tensile strain;

d Mb represents a thickness (μm) of the b th metal foil;

f Mb represents a stress (MPa) of the b th metal foil, at 150° C. and 4% tensile strain.

2. The electromagnetic shielding material according to claim 1 , wherein each metal foil forming the electromagnetic shielding material has a conductivity of 1.0×10 6 S/m or more at 20° C.

3. The electromagnetic shielding material according to claim 1 , wherein each metal foil forming the electromagnetic shielding material has a thickness of from 4 μm to 50 μm.

4. The electromagnetic shielding material according to claim 1 , wherein each resin layer forming the electromagnetic shielding material has a relative dielectric constant of from 2.0 to 10.0 at 20° C.

5. The electromagnetic shielding material according to claim 1 , wherein each resin layer forming the electromagnetic shielding material has a thickness of from 4 μm to 500 μm.

6. The electromagnetic shielding material according to claim 1 , wherein the at least two metal foils and the at least one resin layer forming the electromagnetic shielding material are closely laminated by thermocompression bonding.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 9, 2018
From: TANAKA, KOICHIRO
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 047102/0018 →
Priority Claims (1)
JP JP2016-073350 · Mar 31, 2016 · national
Continuity (1)
Related Publication 20200315073A1 · Oct 1, 2020