Gate formation scheme for n-type and p-type transistors having separately tuned threshold voltages
Embodiments of the invention include a wafer having gate stacks over channel fins. The wafer includes a first channel fin in an n-type region of a substrate, a second channel fin in a p-type region of the substrate, and a gate dielectric over the substrate and the first and second channel fins. A work function metal stack is over the gate dielectric, the first channel fin in the n-type region, and the second channel fin in the p-type region. The work function metal stack over the gate dielectric and the first channel fin in the n-type region forms a first work function metal stack. The work function metal stack over the gate dielectric and the second fin in the p-type region forms a second work function metal stack. The first work function metal stack includes a shared layer of work function metal shared with the second work function metal stack.
1. A semiconductor wafer structure comprising a configuration of gate stacks over channel fins, the wafer structure comprising:
a first channel fin in a substrate;
a second channel fin in the substrate;
a gate dielectric over the substrate and the first and second channel fins;
a first work function metal stack over the gate dielectric; and the first channel fin;
a second work function metal stack over the gate dielectric and the second channel fin;
wherein the first work function metal stack comprises a first oxygen scavenger layer positioned between a first cap layer and a barrier layer;
wherein the second work function metal stack comprises a thinned region of the first oxygen scavenger layer positioned over the barrier layer;
a third work function metal stack over the first channel fin and the second channel fin to form an updated first work function metal stack over the first channel fin and an updated second work function metal stack over the second channel fin;
wherein the updated first work function metal stack comprises, the barrier layer, the first oxygen scavenger layer, the first cap layer and the third work function metal stack; and
wherein the updated second work function metal stack comprises the barrier layer, the thinned region of the first oxygen scavenger layer, and the third work function stack.
2. The structure of claim 1 , wherein the first oxygen scavenger layer modulates a work function of the updated first work function metal stack by scavenging oxygen from the gate dielectric.
3. The structure of claim 2 , wherein a threshold voltage of the updated first work function metal stack is different than a threshold voltage of the updated second work function metal stack.
4. The structure of claim 1 , wherein the barrier layer of the updated first work function metal stack comprises a layer of TiN.