IP Library Granted Patent US 11,038,099
Granted Patent B2
US 11,038,099 · App. 16/349,575 · Granted Jun 15, 2021

Perpendicular magnetoelectric spin orbit logic

Inventors: Sasikanth Manipatruni (Hillsboro, OR); Dmitri E. Nikonov (Beaverton, OR); Ian A. Young (Portland, OR)
Assignee: Intel Corporation
H01L43/10G11C11/161H01L27/228H01L43/14H03K19/18H03K19/185
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Quick Facts
Patent No.
US 11,038,099
App. No.
16/349,575
Granted
Jun 15, 2021
Kind
B2
Abstract

An apparatus is provided which comprises: a first magnet with perpendicular magnetic anisotropy (PMA); a stack of layers, a portion of which is adjacent to the first magnet, wherein the stack of layers is to provide an inverse Rashba-Bychkov effect; a second magnet with PMA; a magnetoelectric layer adjacent to the second magnet; and a conductor coupled to at least a portion of the stack of layers and the magnetoelectric layer.

Claims (45)

1. An apparatus comprising:

a first magnet with perpendicular magnetic anisotropy (PMA);

a stack of layers, a portion of which is adjacent to the first magnet, wherein the stack of layers is to provide an inverse Rashba-Bychkov effect;

a second magnet with PMA;

a layer comprising magnetoelectric material, wherein the layer is adjacent to the second magnet; and

a conductor coupled to at least a portion of the stack of layers and the layer.

2. The apparatus of claim 1 , wherein the layer comprises magnetoelectric perovskites having output out-of-plane remnant magnetization.

3. The apparatus of claim 2 , wherein the magnetoelectric perovskites comprise a material which includes one or more of: B, Fe, La, or Ce.

4. The apparatus of claim 2 , wherein the layer comprises magnetoelectric oxides having out-of-plane magnetism without ferroelectricity, and wherein the layer comprises a material which includes one or more of: Cr or B.

5. The apparatus of claim 1 , wherein the stack of materials comprise two-dimensional materials (2D materials) with spin orbit interaction, wherein the 2D materials include one or more of: Mo, S, W, Se, Graphene, and wherein the 2D materials include an absorbent which includes one or more of: Cu, Ag, Pt, Bi, Fr, or H absorbents.

6. The apparatus of claim 1 , wherein the first and second magnets comprise dopants which include one or more of: W, O, Ce, Al, Li, Mg, Na, Cr, Co, Dy, Er, Eu, Gd, Fe, Nd, K, Pr, Sm, Tb, Tm, or V.

7. The apparatus of claim 1 , wherein the first and second magnets comprise one or a combination of materials which include one or more of: a Heusler alloy, Co, Fe, Ni, Gd, B, Ge, Ga, permalloy, or Yttrium Iron Garnet (YIG).

8. The apparatus of claim 7 , wherein the Heusler alloy comprises one or more of: Cu, Mn, Al, In, Sn, Ni, Sb, Ga, Co, Ge, Pd, Fe, V, or Ru.

9. The apparatus of claim 1 , wherein the first and second magnets comprise a stack of materials, wherein the materials for the stack include one or more of: Co and Pt; Co and Pd; Co and Ni; MgO, CoFeB, Ta, CoFeB, and MgO; MgO, CoFeB, W, CoFeB, and MgO; MgO, CoFeB, V, CoFeB, and MgO; MgO, CoFeB, Mo, CoFeB, and MgO; Mn x Ga y ; Materials with L1 0 symmetry; or materials with tetragonal crystal structure.

10. The apparatus of claim 1 , wherein the first and second magnets comprise a single layer of one or more material, and wherein the single layer comprises Mn and Ga.

11. The apparatus of claim 1 , wherein the conductor comprises a material which includes one or more of: Cu, Ag, Al, or Au.

12. The apparatus of claim 1 , wherein the layer is a first layer, wherein the apparatus comprises a second layer between the stack of layers and the first magnet, and wherein the second layer comprises Ag.

13. The apparatus of claim 1 comprises a transistor coupled to the first magnet.

14. The apparatus of claim 1 , wherein a portion of the stack of the layers is coupled to ground, wherein the first magnet is coupled to a negative supply, and wherein the second magnet is coupled to ground.

15. The apparatus of claim 1 , wherein a portion of the stack of the layers is coupled to ground, wherein the first magnet is coupled to a positive supply, and wherein the second magnet is coupled to ground.

16. The apparatus of claim 1 , wherein the stack of layers comprise ROCh 2 , where R includes one or more of: La, Ce, Pr, Nd, Sr, Sc, Ga, Al, or In, and where Ch is a chalcogenide which includes one or more of: S, Se, or Te.

17. A system comprising: a memory; a processor coupled to the memory, the processor including an apparatus which comprises:

a first magnet with perpendicular magnetic anisotropy (PMA);

a stack of layers, a portion of which is adjacent to the first magnet, wherein the stack of layers is to provide an inverse Rashba-Bychkov effect;

a second magnet with PMA;

a layer with magnetoelectric material, wherein the layer is adjacent to the second magnet;

a conductor coupled to at least a portion of the stack of layers and the layer; and

a wireless interface to allow the processor to communicate with another device.

18. The system of claim 17 , wherein the layer comprises magnetoelectric perovskites having output out-of-plane remnant magnetization, and wherein the magnetoelectric perovskites comprise a material which includes one or more of: B, Fe, La, or Ce.

19. The system of claim 17 , wherein the layer comprises magnetoelectric oxides having out-of-plane magnetism without ferroelectricity, and wherein the layer comprises a material which includes one or more of: Cr or B.

20. A method comprising:

forming a first magnet with perpendicular magnetic anisotropy (PMA);

fabricating a stack of layers, a portion of which is adjacent to the first magnet, wherein the stack of layers is to provide an inverse Rashba-Bychkov effect;

forming a second magnet with PMA;

forming a layer with magnetoelectric material, wherein the layer is adjacent to the second magnet; and

coupling a conductor to at least a portion of the stack of layers and the layer.

21. The method of claim 20 comprises:

fabricating a transistor and coupling it to the first magnet;

coupling a portion of the stack of the layers to a ground;

coupling the first magnet to a negative supply; and

coupling the second magnet to the ground.

22. The method of claim 20 comprises:

coupling a portion of the stack of the layers to a ground;

coupling the first magnet to a positive supply; and

coupling the second magnet to the ground.

Continuity (1)
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