IP Library Granted Patent US 11,062,752
Granted Patent B2
US 11,062,752 · App. 16/246,358 · Granted Jul 13, 2021

Spin orbit torque memory devices and methods of fabrication

Inventors: Tofizur Rahman (Portland, OR); James Pellegren (Portland, OR); Angeline Smith (Hillsboro, OR); Christopher Wiegand (Portland, OR); Noriyuki Sato (Hillsboro, OR); Tanay Gosavi (Hillsboro, OR); Sasikanth Manipatruni (Portland, OR); Kaan Oguz (Portland, OR); Kevin O'Brien (Portland, OR); Benjamin Buford (Hillsboro, OR); Ian Young (Portland, OR)
Assignee: Intel Corporation
G11C11/161H01L27/228H01L43/12H01L43/02H01L43/08H01L43/10
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,062,752
App. No.
16/246,358
Granted
Jul 13, 2021
Kind
B2
Abstract

A perpendicular spin orbit torque memory device includes a first electrode having tungsten and at least one of nitrogen or oxygen and a material layer stack on a portion of the first electrode. The material layer stack includes a free magnet, a fixed magnet above the first magnet, a tunnel barrier between the free magnet and the fixed magnet and a second electrode coupled with the fixed magnet.

Claims (14)

1. A perpendicular spin orbit memory device, comprising:

a first electrode, comprising a material selected from a group consisting of tungsten, nitrogen and tantalum, wherein the first electrode comprises greater than 95 atomic percent of beta phase tungsten and wherein the first electrode comprises at least four times more tantalum than nitrogen; and

a material layer stack on a portion of the first electrode, the material layer stack comprising:

a first magnet having a free magnetization;

a second magnet above the first magnet;

a layer between the first magnet and the second magnet; and

a second electrode coupled with the second magnet.

2. The perpendicular spin orbit memory device of claim 1 , wherein the first electrode has a thickness between 3 nm and 12 nm.

3. The perpendicular spin orbit memory device of claim 1 , wherein the first electrode further comprises oxygen.

4. The perpendicular spin orbit memory device of claim 1 , wherein the first electrode has a thickness between 3 nm and 15 nm.

5. The perpendicular spin orbit memory device of claim 1 , wherein the first electrode has a first portion under the material layer stack having a first thickness and a second portion laterally adjacent to the first portion having a second thickness, and wherein the first thickness is greater than the second thickness.

6. The perpendicular spin orbit memory device of claim 5 , wherein the first thickness is between 1 nm and 3 nm greater than the second thickness.

7. The perpendicular spin orbit memory device of claim 5 , wherein the first thickness is at least 5 nm.

8. The perpendicular spin orbit memory device of claim 1 , wherein the first magnet and the second magnet comprises at least one of cobalt, iron or boron and the layer between the first magnet and the second magnet comprises oxygen and magnesium.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 27, 2020
From: RAHMAN, TOFIZUR; PELLEGREN, JAMES; SMITH, ANGELINE; WIEGAND, CHRISTOPHER; SATO, NORIYUKI; GOSAVI, TANAY; MANIPATRUNI, SASIKANTH; OGUZ, KAAN; O'BRIEN, KEVIN; BUFORD, BENJAMIN; YOUNG, IAN
To: INTEL CORPORATION
Reel/Frame 051632/0929 →
Continuity (1)
Related Publication 20200227104A1 · Jul 16, 2020