Articles having vias with geometry attributes and methods for fabricating the same
Articles and semiconductor packages that incorporate glass-based substrates are disclosed, as well as methods of forming thereof. An article includes a glass-based substrate comprising first and second major surfaces spaced a distance from and parallel to each other, and a tapered via extending through the substrate. The tapered via includes a cross section that is symmetrical about a plane that is between and equidistant to the first and second major surfaces of the glass-based substrate and an interior wall with a first tapered region and a second tapered region positioned between the first major surface and the plane. The respective slopes of the first and second tapered regions are constant and the slope of the first tapered region is not equal to the slope of the second tapered region.
1. An article comprising:
a glass-based substrate comprising a first major surface, a second major surface spaced a distance from and parallel to the first major surface, and a tapered via extending through the substrate from the first major surface towards the second major surface, the tapered via comprising:
a cross section that is asymmetrical about a plane that is between and equidistant to the first major surface and the second major surface of the glass-based substrate; and
an interior wall comprising a first tapered region and a second tapered region positioned between the first major surface and the plane, wherein:
a slope of the first tapered region is constant,
a slope of the second tapered region is constant, and
the slope of the first tapered region is not equal to the slope of the second tapered region.
2. The article of claim 1 , wherein the tapered via comprises a through via or a blind via.
3. The article of claim 1 , wherein:
the slope of the first tapered region comprises a height to length ratio from 3:1 to 100:1; and
the slope of the second tapered region comprises a height to length ratio from 3:1 to 100:1.
4. The article of claim 1 , further comprising a transition area between the first tapered region and the second tapered region, wherein the transition area comprises an area that transitions from the slope of the first tapered region to the slope of the second tapered region such that a slope of a tangent line from the interior wall changes at least 5 degrees.
5. The article of claim 4 , wherein the transition area is a point or an extended region.
6. The article of claim 1 , wherein a slope at successive points along the interior wall is continuously changing.
7. The article of claim 1 , wherein:
the interior wall further comprises a third tapered region; and
a slope of the third tapered region is different from at least one of the slope of the first tapered region and the slope of the second tapered region.
8. The article of claim 1 , wherein the tapered via is filled with electrically conductive material.