Waveguide heterostructure for dispersion compensation in semiconductor laser
A waveguide heterostructure for a semiconductor laser with an active part, comprising an active region layer depending of the type of semiconductor used, which is sandwiched between an electrode layer and a substrate, usable for dispersion compensation in a semiconductor laser frequency comb setup, an optical frequency comb setup and a manufacturing method.
1. A waveguide heterostructure for a semiconductor laser with an active part, comprising an active region layer depending on the type of semiconductor used, which is sandwiched between an electrode layer and a substrate, usable for dispersion compensation in a semiconductor laser frequency comb setup,
wherein a passive part, comprising at least an intercladding layer and a passive part top cladding surrounding a passive core layer, the passive part being inserted into the sandwich between the substrate and the electrode layer in a direction of a growth axis on top of or below the active part, wherein the intercladding layer, the passive part top cladding and the passive core layer are semiconductors and the refractive indices of the active region layer and of the passive core layer are greater than the refractive indices of the intercladding layer and of the passive part top cladding,
wherein the active part and the passive part together form a coupled waveguide by coupling between a primary waveguide, whose core is the active region layer, and a secondary waveguide, whose core is the passive core layer, said coupling changing what would otherwise be respective uncoupled fundamental modes of the primary and secondary waveguides into an antisymmetric mode and a symmetric mode, the antisymmetric mode having a lower group velocity dispersion than that of the fundamental mode of the primary waveguide as well as having a larger overlap with the active region layer than that of the symmetric mode, so that the antisymmetric mode is selected for lasing.
2. The waveguide heterostructure according to claim 1 , wherein the active region layer is surrounded by an active part bottom cladding and an active part top cladding, wherein the refractive indices of the active part top and active part bottom claddings are greater than the refractive indices of the intercladding layer and of the passive part top cladding.
3. The waveguide heterostructure according to claim 2 , wherein the active region layer is built of an active layer of a quantum cascade laser.
4. The waveguide heterostructure according to claim 3 , wherein on top of the passive top cladding in the direction of the growth axis, averted the passive core layer, at least one additional passive part cladding is deposited, while at least one additional passive part cladding is placed underneath the intercladding layer, directly onto the active part top cladding.
5. The waveguide heterostructure according to claim 2 , wherein the active region layer is built of an active layer of a ridge waveguide quantum dot laser.
6. The waveguide heterostructure according to claim 5 , wherein between the substrate and the active part bottom cladding, averted the passive core layer, a bottom cladding is deposited, wherein the refractive index of the bottom cladding is less than the refractive indices of the active region layer, the passive core layer, the active part bottom cladding, and the active part top cladding.
7. The waveguide heterostructure according to claim 5 , wherein the width of the active part is greater than the width of the passive part.
8. The waveguide heterostructure according to claim 5 , wherein the height of the active region layer is less than half the height of the passive core layer.
9. The waveguide heterostructure according to claim 5 , wherein the composition of the waveguide heterostructure is chosen according to:
Layer
Material
passive top cladding
InP
passive core
InGaAs
passiv e bottom cladding
InP
active part top cladding
InGaAs
active part bottom cladding
InGaAs
substrate
InP.
10. The waveguide heterostructure according to claim 2 , wherein the active region layer is built of an active layer of an interband cascade laser.
11. The waveguide heterostructure according to claim 1 , wherein the active region layer is built of a quantum cascade structure, an interband cascade structure, a quantum well structure, a quantum dash structure, a quantum dot structure or any other possible structure providing gain in semiconductor lasers.
12. The waveguide heterostructure according to claim 1 , wherein the width of the active region layer is smaller than the width of the passive core layer in the direction perpendicular to the growth axis.
13. The waveguide heterostructure according to claim 1 , further comprising a lateral regrowth layer surrounding the active part laterally parallel to the active region layer and a further lateral regrowth layer surrounding the passive part laterally parallel to the passive core layer, wherein the lateral regrowth layer and the further lateral regrowth layer are stacked.
14. The waveguide heterostructure according to claim 1 , wherein the composition of the waveguide heterostructure is chosen according to:
Layer
Material
passive top cladding
Al 0.35 Ga 0.65 As
passive core layer
GaAs
intercladding layer
Al 0.35 Ga 0.65 As
active part top cladding
Al 0.15 Ga 0.85 As
active region layer
active part bottom cladding
Al 0.15 Ga 0.85 As
bottom cladding
Al 0.35 Ga 0.65 As
Substrate
GaAs.
15. The waveguide heterostructure according to claim 14 , wherein the additional cladding layer comprises doped indium phosphide.
16. The waveguide heterostructure according to claim 1 , wherein the distance between the centers of the active region layer and the passive core layer lies between 100 nm and 5 micron.
17. A semiconductor laser frequency comb setup, comprising at least one semiconductor laser with a waveguide heterostructure according to claim 1 .
18. A method of manufacturing a waveguide heterostructure for a semiconductor laser, the method comprising:
providing a waveguide heterostructure comprising:
an active part, comprising an active region layer depending on the type of semiconductor used, which is sandwiched between an electrode layer and a substrate, and
a passive part, comprising at least an intercladding layer and a passive part top cladding surrounding a passive core layer, the passive part being inserted into the sandwich between the substrate and the electrode layer in the direction of the growth axis on top of or below the active part,
wherein the intercladding layer, the passive part top cladding and the passive core layer are semiconductors and the refractive indices of the active region layer and of the passive core layer are greater than the refractive indices of the intercladding layer and of the passive part top cladding, and
wherein the active part and the passive part together form a dual-coupled waveguide by coupling between a primary waveguide, whose core is the active region layer, and a secondary waveguide, whose core is the passive core layer, said coupling changing respective uncoupled fundamental modes of the primary and secondary waveguides into an antisymmetric mode and a symmetric mode, the antisymmetric mode having a lower group velocity dispersion than the fundamental mode of the primary waveguide as well as having a larger overlap with the active region layer than the symmetric mode, so that the antisymmetric mode is selected for lasing.