Swirling flow generation device and deposition device
A swirling flow generation device includes a first pipe having a first pipe axis and through which gas passes, a second pipe having a second pipe axis in a direction different from the first pipe axis and communicates with downstream of the first pipe, and an airflow changing unit provided in the first pipe and having an opening eccentric from the first pipe axis. A swirling flow is formed in the second pipe as the center of the airflow passed through the opening flows into the second pipe at a position that is eccentric from the second pipe axis.
1. A deposition device comprising:
a swirling flow generation device including:
a first pipe having a first pipe axis and through which gas passes, an airflow of the first pipe containing a defibrated material,
a second pipe having a second pipe axis in a direction different from the first pipe axis and communicating with a region downstream of the first pipe, and
an airflow changing unit provided in the first pipe and having an opening eccentric from the first pipe axis, the airflow changing unit including a plate member installed so as to block a lumen of the first pipe, and the opening provided in the plate member; and
a drum installed downstream of the second pipe, having a plurality of through-holes on an outer peripheral portion, and rotating around a central axis, wherein
a downstream end portion of the second pipe communicates with an inside of the drum.
2. The deposition device according to claim 1 , wherein
when a cross-sectional area of a lumen of the first pipe is S 1 and a cross-sectional area of a lumen of the second pipe is S 2 , S 1 <S 2 is satisfied.
3. The deposition device according to claim 1 , wherein
when a cross-sectional area of a lumen of the first pipe is S 1 and an opening area of the opening is S 3 , S 1 /S 3 is 1.5 or more and 10 or less.
4. The deposition device according to claim 1 , wherein
when an inner diameter of the second pipe is d 2 and a distance from the opening to the second pipe axis is L, L/d 2 is 0.5 or more and 5 or less.
5. The deposition device according to claim 1 , wherein
the airflow changing unit includes a position adjusting mechanism that adjusts a position of the opening with respect to the first pipe axis.
6. The deposition device according to claim 1 , wherein
the airflow changing unit has a mounting portion configured to selectively mount a plurality of plate members having different conditions for the opening.
7. The deposition device according to claim 1 , wherein
the downstream end portion of the second pipe is coupled to an end surface of the drum, and
a rotation direction of the swirling flow and a rotation direction of the drum are the same.