Storage device, electronic component, and electronic device
A novel storage device is provided. The storage device includes a first wiring, a second wiring, and a first memory cell. The first memory cell includes a first transistor and a first magnetic tunnel junction device. One of a source or a drain of the first transistor is electrically connected to a first wiring. The other of the source or the drain of the first transistor is electrically connected to one terminal of the first magnetic tunnel junction device. Another terminal of the first magnetic tunnel junction device is electrically connected to the second wiring. The first transistor includes an oxide semiconductor in its channel formation region.
1. A storage device comprising:
a first wiring;
a second wiring; and
a first memory cell,
wherein the first memory cell includes a first transistor and a first magnetic tunnel junction device,
wherein one of a source and a drain of the first transistor is electrically connected to the first wiring,
wherein the other of the source and the drain of the first transistor is electrically connected to one terminal of the first magnetic tunnel junction device,
wherein another terminal of the first magnetic tunnel junction device is electrically connected to the second wiring,
wherein the first transistor includes an oxide semiconductor in its channel formation region, and
wherein the first transistor includes a back gate electrode.
2. A storage device comprising:
a first wiring;
a second wiring;
a first memory cell; and
a sense amplifier circuit,
wherein the first memory cell includes a first transistor and a first magnetic tunnel junction device,
wherein one of a source and a drain of the first transistor is electrically connected to the first wiring,
wherein the other of the source and the drain of the first transistor is electrically connected to one terminal of the first magnetic tunnel junction device,
wherein another terminal of the first magnetic tunnel junction device is electrically connected to the second wiring,
wherein the first transistor includes an oxide semiconductor in its channel formation region,
wherein the sense amplifier circuit includes a second transistor constituting a CMOS-type SRAM cell,
wherein the sense amplifier circuit is electrically connected to the first wiring or the second wiring, and
wherein the second transistor includes silicon in its channel formation region.
3. The storage device according to claim 2 , further comprising a precharge circuit,
wherein the precharge circuit includes a third transistor having a function of precharging the first wiring, and
wherein the third transistor includes silicon in its channel formation region.
4. The storage device according to claim 1 , wherein the first magnetic tunnel junction device includes a stacked-layer structure of a flexible layer, an insulating layer, and a fixed layer.
5. The storage device according to claim 1 , further comprising a second memory cell,
wherein the second memory cell includes a fourth transistor and a second magnetic tunnel junction device,
wherein the fourth transistor includes an oxide semiconductor in its channel formation region,
wherein the first transistor and the fourth transistor are provided in different layers, and
wherein the first magnetic tunnel junction device and the second magnetic tunnel junction device are provided in the same layer.
6. An electronic component incorporating the storage device according to claim 1 .
7. An electronic device incorporating the electronic component according to claim 6 .