Parameter-stable misregistration measurement amelioration in semiconductor devices

1. A parameter-stable misregistration measurement amelioration method comprising:

providing a wafer, comprising a plurality of multilayered semiconductor devices formed thereon, selected from a batch of wafers intended to be identical;

using a misregistration metrology tool to measure misregistration at multiple sites between at least a first layer and a second layer of said wafer, using a plurality of sets of measurement parameters, thereby generating measured misregistration data for each of said sets of measurement parameters; and

identifying and removing a parameter-dependent portion and a mean error portion from said measured misregistration data for said wafer for each of said sets of measurement parameters, thereby generating ameliorated parameter-stable ameliorated misregistration data for said wafer.

2. The parameter-stable misregistration measurement amelioration method of claim 1 , wherein said sets of measurement parameters comprise at least multiple wavelengths of light used in misregistration measurement.

3. The parameter-stable misregistration measurement amelioration method of claim 1 , wherein said identifying said parameter-dependent portion and said mean error portion comprises:

identifying a parameter-dependent portion for said measured misregistration data for each of said sets of measurement parameters;

identifying at least one principal component of said parameter-dependent portion of said misregistration data for each of said sets of measurement parameters;

identifying a weighting coefficient for said at least one principal component of said parameter-dependent portion of said measured misregistration data for each of said sets of parameters; and

identifying at least one mean error portion, each of said mean error portions corresponding to each of said at least one principal component of said parameter-dependent portion of said measured misregistration data for each of said sets of measurement parameters.

4. The parameter-stable misregistration measurement amelioration method of claim 3 , wherein said at least one principal component of said parameter-dependent portion of said misregistration data for each of said sets of measurement parameters is identified using principal component analysis.

5. The parameter-stable misregistration measurement amelioration method of claim 1 , further comprising using said parameter-dependent portion and said mean error portion to identify and remove a parameter-dependent portion and a mean error portion from measured misregistration data for at least one additional wafer selected from said batch of wafers intended to be identical, for each of said sets of measurement parameters, thereby generating ameliorated parameter-stable ameliorated misregistration data for said at least one additional wafer.

6. The parameter-stable misregistration measurement amelioration method of claim 1 , wherein said misregistration metrology tool is an imaging misregistration metrology tool or a scatterometry misregistration metrology tool.

7. The parameter-stable misregistration measurement amelioration method of claim 1 , wherein said mean error portions are identified using a reference misregistration value.

8. The parameter-stable misregistration measurement amelioration method of claim 7 , wherein said reference misregistration value is generated by using a reference misregistration metrology tool to measure said wafer.

9. The parameter-stable misregistration measurement amelioration method of claim 8 , wherein said reference misregistration tool is an electron beam misregistration metrology tool.

10. The parameter-stable misregistration measurement amelioration method of claim 1 , wherein said sets of measurement parameters comprise at least one of:

a focus variability in misregistration measurement;

a numerical aperture used in misregistration measurement;

an angle of incidence of light used in misregistration measurement; or

a polarization of light used in misregistration measurement.

11. A parameter-stable misregistration measurement amelioration system comprising:

a misregistration metrology tool operative to measure misregistration at multiple sites between at least a first layer and a second layer of a wafer, comprising a plurality of multilayered semiconductor devices formed thereon, selected from a batch of wafers intended to be identical, using a plurality of sets of measurement parameters, thereby generating measured misregistration data for each of said parameters; and

a misregistration data analyzer operative to:

identify and remove a parameter-dependent portion and a mean error portion from said measured misregistration data for said wafer for each of said sets of measurement parameters, thereby generating ameliorated parameter-stable ameliorated misregistration data for said wafer.

12. The parameter-stable misregistration measurement amelioration system of claim 11 , wherein said sets of measurement parameters comprise at least multiple wavelengths of light used in misregistration measurement.

13. The parameter-stable misregistration measurement amelioration system of claim 11 , wherein said misregistration data analyzer is further operative to:

identify a parameter-dependent portion for said measured misregistration data for each of said sets of measurement parameters;

identify at least one principal component of said parameter-dependent portion of said misregistration data for each of said sets of measurement parameters;

identify a weighting coefficient for said at least one principal component of said parameter-dependent portion for said measured misregistration data for each of said sets of measurement parameters; and

identify at least one mean error portion, each of said at least one mean error portion corresponding to each of said at least one principal components of said parameter-dependent portion of said measured misregistration data for each of said sets of measurement parameters.

14. The parameter-stable misregistration measurement amelioration system of claim 13 , wherein said at least one principal component of said parameter-dependent portion of said misregistration data for each of said sets of measurement parameters is identified using principal component analysis.

15. The parameter-stable misregistration measurement amelioration system of claim 11 , wherein said analyzer is further operative to use said parameter-dependent portion and said mean error portion to identify and remove a parameter-dependent portion and a mean error portion from said measured misregistration data for at least one additional wafer selected from said batch of wafers intended to be identical, for each of said sets of measurement parameters, thereby generating ameliorated parameter-stable ameliorated misregistration data for said at least one additional wafer.

16. The parameter-stable misregistration measurement amelioration system of claim 11 , wherein said misregistration metrology tool is an imaging misregistration metrology tool or a scatterometry misregistration metrology tool.

17. The parameter-stable misregistration measurement amelioration system of claim 11 , wherein said mean error portions are identified using a reference misregistration value.

18. The parameter-stable misregistration measurement amelioration system of claim 17 , wherein said reference misregistration value is generated by using a reference misregistration metrology tool to measure said wafer.

19. The parameter-stable misregistration measurement amelioration system of claim 18 , wherein said reference misregistration tool is an electron beam misregistration metrology tool.

20. The parameter-stable misregistration measurement amelioration system of claim 11 , wherein said sets of measurement parameters comprise at least one of:

a focus variability in misregistration measurement;

a numerical aperture used in misregistration measurement;

an angle of incidence of light used in misregistration measurement; or

a polarization of light used in misregistration measurement.