IP Library › Granted Patent US 11,145,633
Granted Patent B2
US 11,145,633 · App. 16/795,523 · Granted Oct 12, 2021

Semiconductor package and manufacturing method thereof

Inventors: Wei-Yu Chen (New Taipei, TW); An-Jhih Su (Taoyuan, TW); Li-Hsien Huang (Hsinchu County, TW); Tien-Chung Yang (Hsinchu, TW); Ming-Shih Yeh (Hsinchu County, TW)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
H01L25/105H01L21/4857H01L21/568H01L23/3128H01L23/49822H01L24/05H01L24/16H01L25/50H01L2224/0401H01L2224/16235
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Quick Facts
Patent No.
US 11,145,633
App. No.
16/795,523
Granted
Oct 12, 2021
Kind
B2
Abstract

A semiconductor package and a manufacturing method thereof are provided. The semiconductor package includes a semiconductor die an insulating encapsulation laterally covering the semiconductor die. The semiconductor die includes a semiconductor substrate, a plurality of conductive pads distributed over the semiconductor substrate, a plurality of conductive vias disposed on and electrically connected to the conductive pads, and a dielectric layer disposed over the semiconductor substrate and spaced the conductive vias apart from one another. A sidewall of the dielectric layer extends along sidewalls of the conductive vias, the conductive vias are recessed from a top surface of the dielectric layer, and a sloped surface of the dielectric layer is connected to the top surface of the dielectric layer and the sidewall of the dielectric layer.

Claims (35)

1. A semiconductor package, comprising:

a semiconductor die comprising:

a semiconductor substrate;

a plurality of conductive pads distributed over the semiconductor substrate;

a plurality of conductive vias disposed on and electrically connected to the conductive pads; and

a dielectric layer disposed over the semiconductor substrate and spacing the conductive vias apart from one another, a sidewall of the dielectric layer extending along sidewalls of the conductive vias, the conductive vias being recessed from a top surface of the dielectric layer, and a sloped surface of the dielectric layer connected to the top surface of the dielectric layer and the sidewall of the dielectric layer; and

an insulating encapsulation laterally covering the semiconductor die.

2. The semiconductor package of claim 1 , wherein a top surface of one of the conductive vias of the semiconductor die is at an intersection of the sloped surface and the sidewall of the dielectric layer of the semiconductor die.

3. The semiconductor package of claim 1 , wherein one of the conductive vias comprises a top surface facing away the semiconductor substrate and intersecting with the sloped surface of the dielectric layer.

4. The semiconductor package of claim 1 , wherein one of the conductive vias comprises a top surface facing away the semiconductor substrate and intersecting with the sidewall of the dielectric layer.

5. The semiconductor package of claim 1 , further comprising:

a redistribution structure disposed on the insulating encapsulation and the semiconductor die, and a portion of the redistribution structure extending beyond the top surface of the dielectric layer of the semiconductor die to be in contact with the conductive vias of the semiconductor die.

6. The semiconductor package of claim 5 , wherein a patterned dielectric layer of the redistribution structure covers the top surface and the sloped surface of the dielectric layer of the semiconductor die to be in contact with a first portion of the conductive vias of the semiconductor die.

7. The semiconductor package of claim 6 , wherein a portion of a patterned conductive layer of the redistribution structure is laterally covered by the patterned dielectric layer of the redistribution structure and extends to be in contact with a second portion of the conductive vias of the semiconductor die that is surrounded by the first portion.

8. A semiconductor package, comprising:

a semiconductor die comprising:

a semiconductor substrate comprising a first surface and a second surface opposite to each other;

a plurality of conductive vias distributed over the first surface of the semiconductor substrate; and

a dielectric layer disposed over the first surface of the semiconductor substrate and separating the conductive vias from one another, wherein first surfaces of the conductive vias are between a first surface of the dielectric layer and the second surface of the semiconductor substrate, and the first surface of the semiconductor substrate, the first surfaces of the conductive vias, and the first surface of the dielectric layer face a same direction;

an insulating encapsulation laterally covering the semiconductor die; and

a redistribution structure disposed on the first surfaces of the conductive vias and the first surface of the dielectric layer of the semiconductor die, and extending to the insulating encapsulation.

9. The semiconductor package of claim 8 , wherein a second surface of the dielectric layer of the semiconductor die connected to the first surface of the dielectric layer is inclined toward the first surfaces of the conductive vias of the semiconductor die.

10. The semiconductor package of claim 9 , wherein an angle between the second surface of the dielectric layer of the semiconductor die and the first surfaces of the conductive vias is an obtuse angle.

11. The semiconductor package of claim 9 , wherein the second surface of the dielectric layer of the semiconductor die intersects with at least one of the first surfaces of the conductive vias of the semiconductor die.

12. The semiconductor package of claim 9 , wherein the second surface of the dielectric layer of the semiconductor die connects the first surface of the dielectric layer to a third surface of the dielectric layer, and the third surface of the dielectric layer intersects with at least one of the first surfaces of the conductive vias of the semiconductor die.

13. The semiconductor package of claim 8 , wherein a width of the first surface of the dielectric layer between adjacent ones of the conductive vias is less than a shortest lateral distance between the adjacent ones of the conductive vias.

14. The semiconductor package of claim 1 , wherein an angle between a top surface of one of the conductive vias of the semiconductor die and the sloped surface of the dielectric layer of the semiconductor die is an obtuse angle.

15. The semiconductor package of claim 1 , wherein a width of the top surface of the dielectric layer between adjacent ones of the conductive vias is less than a shortest lateral distance between the adjacent ones of the conductive vias.

16. The semiconductor package of claim 5 , further comprising:

a plurality of conductive terminals disposed on the redistribution structure and electrically coupled to the semiconductor die through the redistribution structure.

17. The semiconductor package of claim 8 , wherein a portion of the redistribution structure extending beyond the first surface of the dielectric layer of the semiconductor die to be in contact with the conductive vias of the semiconductor die.

18. The semiconductor package of claim 8 , wherein the redistribution structure comprises a patterned dielectric layer, the dielectric layer of the semiconductor die comprises a sloped surface connected to the first surface of the dielectric layer, and the patterned dielectric layer covers the first surface of the dielectric layer and the sloped surface of the dielectric layer.

19. The semiconductor package of claim 18 , wherein the redistribution structure further comprises a patterned conductive layer, and the patterned conductive layer is laterally covered by the patterned dielectric layer and is in direct contact with the conductive vias of the semiconductor die.

20. The semiconductor package of claim 8 , further comprising:

a plurality of conductive terminals disposed on the redistribution structure and electrically coupled to the semiconductor die through the redistribution structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 21, 2020
From: CHEN, WEI-YU; SU, AN-JHIH; HUANG, LI-HSIEN; YANG, TIEN-CHUNG; YEH, MING-SHIH
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 051883/0323 →
Continuity (2)
Provisional Application 62893153 · Aug 28, 2019
Related Publication 20210066263A1 · Mar 4, 2021