Display panel and display device
View Patent ↗A display panel and a display device are provided. The display panel has an array substrate, a planarization layer, an anode layer, a light emitting device layer having light emitting device units, a plurality of pixel defining bodies, and a plurality of blocking walls disposed between the neighboring light emitting device units for blocking water and oxygen. Each of the blocking walls contacts with at least one of the planarization layer and the anode layer, and an upper surface of one of the blocking walls is not lower than an upper surface of one of the pixel defining bodies.
1. A display panel, comprising:
an array substrate;
a planarization layer disposed on the array substrate;
an anode layer disposed on the planarization layer;
a light emitting device layer disposed on the anode layer and comprising light emitting device units distributed at intervals;
a plurality of pixel defining bodies, each being disposed between the neighboring light emitting device units; and
a plurality of blocking walls, each being disposed between the neighboring light emitting device units for blocking water and oxygen, wherein the plurality of blocking walls comprise a first blocking wall and a second blocking wall disposed between the neighboring light emitting device units,
wherein each of the blocking walls contacts with at least one of the planarization layer and the anode layer, and an upper surface of one of the blocking walls is not lower than an upper surface of one of the pixel defining bodies, and
wherein the first blocking wall is disposed inside one of the pixel defining bodies, and the second blocking wall is disposed between one of the pixel defining bodies and one of the light emitting device units and covers a side surface of one of the pixel defining bodies.
2. The display panel according to claim 1 , wherein fabricating material of the blocking walls comprises an inorganic material.
3. The display panel according to claim 1 , further comprising a cathode layer covering the pixel defining bodies, the blocking walls, and the light emitting device layer.
4. The display panel according to claim 1 , wherein fabricating material of the planarization layer and the blocking walls both comprise silicon nitride, and the planarization layer and the blocking walls are fabricated in a same mask process.
5. A display device, comprising a touch layer and a display panel, wherein the display panel comprises:
an array substrate;
a planarization layer disposed on the array substrate;
an anode layer disposed on the planarization layer;
a light emitting device layer disposed on the anode layer and comprising light emitting device units distributed at intervals;
a plurality of pixel defining bodies, each being disposed between the neighboring light emitting device units; and
a plurality of blocking walls, each being disposed between the neighboring light emitting device units for blocking water and oxygen, wherein the plurality of blocking walls comprise a first blocking wall and a second blocking wall disposed between the neighboring light emitting device units,
wherein each of the blocking walls contacts with at least one of the planarization layer and the anode layer, and an upper surface of one of the blocking walls is not lower than an upper surface of one of the pixel defining bodies, and
wherein the first blocking wall is disposed inside one of the pixel defining bodies, and the second blocking wall is disposed between one of the pixel defining bodies, and one of the light emitting device units and covers a side surface of one of the pixel defining bodies.
6. The display device according to claim 5 , wherein fabricating material of the blocking walls comprises an inorganic material.
7. The display device according to claim 5 , wherein the display panel further comprises a cathode layer covering the pixel defining bodies, the blocking walls, and the light emitting device layer.
8. The display device according to claim 5 , wherein fabricating material of the planarization layer and the blocking walls both comprise silicon nitride, and the planarization layer and the blocking walls are fabricated in a same mask process.