AlInGaAs/InGaAsP/InP edge emitting semiconductor laser including multiple monolithic laser diodes

1. An edge emitting semiconductor laser containing multiple monolithic laser diodes, using aluminum indium gallium arsenide phosphide AlInGaAs/InGaAsP/InP material system, emitting in long wavelengths (1250 nm to 1720 nm), wherein

the monolithic laser diodes are connected one to another by one or more tunnel junctions; and

each monolithic laser diode comprises an active region with barriers and no more than three quantum wells constructed from various ratios of aluminum, gallium, indium and arsenic.

2. The device as claimed in 1 , wherein the Aluminum Indium gallium Arsenide quantum wells being sized between 5 nm and 10 nm, wherein the active region is placed between two confining layers of opposite conductive doping where p-doped confining layers start with a concentration of 5e16 cm-3 −25%/+50% and increase to a final concentration of 1e17 cm-3, −25%+50%, and an interface layer that immediately follows the p-doped confining layers has a fixed doping concentration which is between the final doping concentration of the confining layers and 1e18 cm-3, +300%.

3. The device as claimed in claim 1 , further comprising an InP substrate and cladding layers in each monolithic laser diode with doping concentrations between 1e17 cm-3 and 6e17 cm-3.

4. The device as claimed in claim 3 , wherein the p-doped cladding layer of each monolithic laser diode is doped with zinc.

5. The device as claimed in claim 3 , wherein each monolithic laser diode comprising an aluminum indium arsenide layer between the active region and at least one of the cladding layers.

6. The device as claimed in claim 3 , wherein the doping of the aluminum indium arsenide layer in each monolithic laser diode is zinc and its concentration is equal or less than 1e18 cm-3.

7. The device as claimed in claim 1 , wherein the number of the monolithic laser diodes is two, three or four and each monolithic laser diode contains graded index confining layers.

8. The device as claimed in claim 1 , wherein a P-type aluminum indium gallium arsenide waveguide layer is equal or less than 1e17 cm-3, in one or two or all monolithic laser diodes.

9. The device as claimed in claim 1 , wherein a P-type aluminum indium gallium arsenide cladding layer doping concentration is equal or less than 1e18 cm-3 for one, two or all monolithic laser diodes.

10. The device as claimed in claim 1 , wherein an N-type aluminum indium gallium arsenide waveguide layer doping concentration is equal or less than 1e17 cm-3 for one, two or all monolithic laser diodes.

11. The device as claimed in claim 1 , wherein an N-type aluminum indium gallium arsenide cladding layers doping is equal or less than 5e17 cm-3, in one, two or all monolithic laser diodes.

12. The device as claimed in claim 1 , comprising a ridge waveguide structure on the top monolithic laser that supports multiple spatial modes in each monolithic laser diode.

13. The device as claimed in claim 1 , comprising a groove etched from the top p-type indium gallium arsenide contact layer through the active area.

14. The device as claimed in claim 13 , wherein the depth of the groove is between 2 micrometers and 10 micrometer and walls forming the groove are tilted at an angle between 45 degrees and 80 degrees.

15. The device as claimed in claim 1 , with aperture width is between 2 and 350 micrometer and the cavity length is between 0.5 mm and 4 mm.

16. The device as claimed in claim 1 , wherein light emits in the spectral range of 1250 micrometers and 1720 micrometers.

17. An edge emitting semiconductor laser grown on indium phosphide substrate containing multiple monolithic laser diodes, in which the monolithic laser diodes are connected to each other with a tunnel junction, wherein each monolithic laser diode comprises an active region with barriers and quantum wells constructed from various ratios of aluminum, gallium, indium and arsenic wherein the quantum well structures of the multiple active areas differ from one to another in terms of their layer thicknesses and/or their material compositions such that at least two emission areas have different emission wavelengths by at least 5 nm.

18. An edge emitting semiconductor laser grown on indium phosphide substrate containing multiple monolithic laser diodes, in which the monolithic laser diodes are connected to each other with a tunnel junction, wherein each monolithic laser diode comprises an active region with barriers and quantum wells constructed from various ratios of aluminum, gallium, indium and arsenic wherein the quantum well structures of the multiple active areas are the same or differ from one to another in terms of their layer thicknesses and/or their material compositions such that all emission areas have the same emission wavelengths within 5 nm.

19. The device as claimed in claim 18 , wherein the photoluminescence emission difference between one monolithic laser diode to another one is less than 5 nm.

20. The device as claimed in claim 18 , wherein each monolithic laser diode compromise aluminum indium gallium arsenide barriers with thicknesses between 5 nanometers and 10 nanometers.

21. The device as claimed in claim 18 , wherein the monolithic laser diodes are connected to one another by tunnel junctions and the tunnel junctions have a thickness of 50 nm or less.

22. The device as claimed in claim 18 , wherein the tunnel junction comprising two indium gallium arsenide layers, P-type and N-type.

23. The device as claimed in claim 18 , wherein the tunnel junction P-type indium gallium arsenide layer is doped with Carbon or Zinc with doping concentration higher than 5e18 cm-3 and less than 1e20 cm-3.

24. The device as claimed in claim 18 , wherein the tunnel junction N-type indium gallium arsenide layer is doped with Silicon or Tellerium with doping concentration higher than 5e18 cm-3 and less than 1e20 cm-3.

25. The device as claimed in claim 18 , wherein the tunnel junction P-type indium gallium arsenide layer thickness is less than 50 nm and N-type indium gallium arsenide layer thickness is less than 50 nm.