Magnetoresistance effect element including a crystallized Heusler alloy

1. A magnetoresistance effect element comprising:

a first ferromagnetic layer;

a second ferromagnetic layer; and

a non-magnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer,

wherein at least one of the first ferromagnetic layer and the second ferromagnetic layer includes a first layer and a second layer in order from the side closer to the non-magnetic layer,

wherein the first layer contains a crystallized Co Heusler alloy,

wherein at least a part of the second layer is crystallized and the second layer contains a ferromagnetic element, elemental boron, and an additive element, and

wherein the additive element is any element selected from a group consisting of Ti, V, Cr, Cu, Zn, Zr, Mo, Ru, Pd, Ta, W, Ir, Pt, and Au.

2. The magnetoresistance effect element according to claim 1 ,

wherein both the first ferromagnetic layer and the second ferromagnetic layer include the first layer and the second layer.

3. The magnetoresistance effect element according to claim 1 ,

wherein the Co Heusler alloy is represented by CoYZ or Co 2 YZ in stoichiometric composition, and

wherein the Co Heusler alloy has a Co compositional proportion smaller than that of the stoichiometric composition.

4. The magnetoresistance effect element according to claim 2 ,

wherein the Co Heusler alloy is represented by CoYZ or Co 2 YZ in stoichiometric composition, and

wherein the Co Heusler alloy has a Co compositional proportion smaller than that of the stoichiometric composition.

5. The magnetoresistance effect element according to claim 1 ,

wherein the second layer is made of crystallized CoFeB-A, and

wherein the content of Fe is larger than the content of Co in the second layer.

6. The magnetoresistance effect element according to claim 1 ,

wherein the content of the additive element is larger than the content of boron in the second layer.

7. The magnetoresistance effect element according to claim 1 ,

wherein the first layer and the second layer are lattice-matched.

8. The magnetoresistance effect element according to claim 1 , further comprising:

a boron absorbing layer in contact with a surface of the second layer on a side far from the non-magnetic layer,

wherein the boron absorbing layer contains any element selected from a group consisting of Ti, V, Cr, Cu, Zn, Zr, Mo, Ru, Pd, Ta, W, Ir, Pt, and Au.

9. The magnetoresistance effect element according to claim 1 ,

wherein the Co Heusler alloy is an L 2 1 structure or a B 2 structure.

10. The magnetoresistance effect element according to claim 1 ,

wherein the Co Heusler alloy is represented by Co 2 Y α Z β ,

wherein Y is one or more elements selected from a group consisting of Fe, Mn, and Cr, and

wherein Z is one or more elements selected from a group consisting of Si, Al, Ga, and Ge and α+β>2 is satisfied.

11. The magnetoresistance effect element according to claim 1 , further comprising:

a buffer layer provided at least one between the first ferromagnetic layer and the non-magnetic layer and between the second ferromagnetic layer and the non-magnetic layer, and

the buffer layer includes a NiAl alloy or Ni.

12. The magnetoresistance effect element according to claim 11 ,

wherein the thickness of the buffer layer is 0.63 nm or less.

13. The magnetoresistance effect element according to claim 1 ,

wherein the non-magnetic layer is a metal or alloy containing any element selected from a group consisting of Cu, Au, Ag, Al, and Cr.

14. The magnetoresistance effect element according to claim 1 , further comprising:

a substrate,

wherein the substrate is a base on which the first ferromagnetic layer, the second ferromagnetic layer, and the non-magnetic layer are laminated, and

wherein the substrate is amorphous.