IP Library › Granted Patent US 11,177,789
Granted Patent B2
US 11,177,789 · App. 15/996,790 · Granted Nov 16, 2021

Acoustic wave device and method of manufacturing the same

Inventors: Seung Wook Park (Suwon-si, KR); Jae Hyun Jung (Suwon-si, KR); Seong Hun Na (Suwon-si, KR)
Assignee: Samsung Electro-Mechanics Co., Ltd.
H03H9/10H03H3/007H03H3/02H03H3/08H03H9/02984H03H9/059H03H9/0523H03H9/1014H03H9/1071H03H9/46
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Quick Facts
Patent No.
US 11,177,789
App. No.
15/996,790
Granted
Nov 16, 2021
Kind
B2
Abstract

An acoustic wave device includes a substrate, a support portion and a protective member. The substrate has an acoustic wave generator formed on a surface thereof. The support portion is disposed on the surface of the substrate, and includes an accommodating space configured to accommodate the acoustic wave generator. The protective member is coupled to the support portion and disposed to be spaced apart from the acoustic wave generator by a predetermined interval. The protective member is disposed in a seating groove formed in the support portion.

Claims (38)

1. An acoustic wave device, comprising:

a substrate having an acoustic wave generator formed on a surface thereof;

a support portion disposed on the surface of the substrate, and comprising an accommodating space configured to accommodate the acoustic wave generator; and

a protective member coupled to the support portion, and spaced apart from the acoustic wave generator by an interval,

wherein the protective member is disposed in a seating groove having a ledge formed in the support portion.

2. The acoustic wave device of claim 1 , wherein the seating groove is continuously formed along an inner wall of the support portion forming the accommodating space.

3. The acoustic wave device of claim 2 , wherein the seating groove is formed in a groove having a step contour along an edge of the inner wall of the support portion.

4. The acoustic wave device of claim 1 , wherein an outer surface of the protective member is disposed to be lower or higher than an outer surface of the support portion.

5. The acoustic wave device of claim 1 , further comprising an encapsulating portion covering a surface formed by the protective member and the support portion.

6. The acoustic wave device of claim 5 , wherein the encapsulating portion is formed of an insulator.

7. The acoustic wave device of claim 5 , further comprising an airtight layer disposed between the encapsulating portion and the surface formed by the protective member, wherein the airtight layer is configured to prevent moisture or foreign materials from entering the acoustic wave generator.

8. The acoustic wave device of claim 7 , wherein the airtight layer extends to a side surface of the support portion.

9. The acoustic wave device of claim 8 , wherein the airtight layer is formed of an inorganic insulating film or a thin film.

10. The acoustic wave device of claim 5 , further comprising an airtight layer disposed along a surface formed by the support portion and the encapsulating portion, and configured to prevent moisture or foreign materials from entering the acoustic wave generator.

11. The acoustic wave device of claim 1 , wherein the seating groove has an L-shaped contour.

12. A method of manufacturing an acoustic wave device, comprising:

preparing a substrate having an acoustic wave generator formed on one surface thereof;

forming a support portion and a protective member along a circumference of the acoustic wave generator on a surface of the substrate, wherein the protective member is partially embedded in a seating groove having a ledge formed in the support portion; and

forming an encapsulating portion encapsulating the support portion and the protective member.

13. The method of claim 12 , wherein the forming of the support portion and the protective member comprises:

preparing the protective member on a carrier substrate;

disposing the support portion along an edge of the protective member;

transferring the protective member and the support portion to one surface of the substrate; and

removing the carrier substrate.

14. The method of claim 13 , wherein the preparing the protective member on the carrier substrate comprises:

forming a metal layer on the carrier substrate;

forming a first pattern by forming and patterning a first mask layer on the metal layer; and

filling a conductive material in the first pattern.

15. The method of claim 14 , further comprising, before the forming of the encapsulating portion, forming an airtight layer along surfaces of the support portion and the protective member.

16. The method of claim 13 , wherein the forming of the support portion further comprises forming an opening in the support portion.

17. The method of claim 16 , further comprising, after the forming of the support portion and the protective member, forming a connection conductor by filling a conductive material in the opening.

18. An acoustic wave device, comprising:

a support portion disposed on a substrate, and having a through hole configured to accommodate an acoustic wave generator;

a seating groove having a ledge defined on an inner upper surface contour of the through hole on the support portion; and

a protective member disposed over the through hole, and seated in the seating groove.

19. The acoustic wave device of claim 18 , further comprising an airtight layer disposed between an encapsulating layer and upper surfaces of the support portion and the protective member.

20. The acoustic wave device of claim 19 , wherein the upper surfaces of the support portion and the protective member are on different planes.

21. The acoustic wave device of claim 19 , wherein the upper surfaces of the support portion and the protective member are on a same plane.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 22, 2018
From: PARK, SEUNG WOOK; JUNG, JAE HYUN; NA, SEONG HUN
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 046174/0347 →
Priority Claims (1)
KR 10-2017-0148767 · Nov 9, 2017 · national
Continuity (1)
Related Publication 20190140616A1 · May 9, 2019