Purged viewport for quartz dome in epitaxy reactor
Embodiments described herein generally relate to an in-situ metrology system that can constantly provide an uninterrupted optical access to a substrate disposed within a process chamber. In one embodiment, a metrology system for a substrate processing chamber is provided. The metrology system includes a sensor view pipe coupling to a quartz dome of a substrate processing chamber, a flange extending radially from an outer surface of the sensor view pipe, and a viewport window disposed on the flange, the viewport window having spectral ranges chosen for an optical sensor that is disposed on or adjacent to the viewport window.
1. An apparatus, comprising:
a chamber defining a process volume therein and comprising at least one quartz element;
a substrate support disposed within the process volume;
a viewport window comprising a first longitudinal axis; and
a sensor view pipe having a second longitudinal axis extending between the quartz element and the viewport window, the first longitudinal axis and second longitudinal axis forming an angle between about 91° and 100°.
2. The apparatus of claim 1 , wherein the chamber has one or more openings.
3. The apparatus of claim 2 , wherein a first end of the sensor view pipe is coupled to the opening and a second end of the sensor view pipe is coupled to a flange.
4. The apparatus of claim 3 , wherein the flange has a top surface positioned at an angle between about 91° and 100° with respect to an upper surface of the substrate support.
5. The apparatus of claim 3 , further comprising:
a viewport window disposed on the flange.
6. The apparatus of claim 1 , further comprising:
a purge gas tube coupled to the sensor view pipe, wherein the purge gas tube is in fluid communication with an inert gas source.
7. The apparatus of claim 1 , wherein the sensor view pipe is comprised of an upper section and a lower section, the upper section having a first inner diameter and the lower section having a second inner diameter larger than the first inner diameter.
8. The apparatus of claim 7 , wherein the upper section and the lower section are two individual components welded together.
9. The apparatus of claim 1 , wherein:
the quartz element comprises at least one of:
an upper dome; and
a lower dome opposing the upper dome, and wherein the sensor view pipe extends between and optical sensor and the upper dome; and
the chamber further comprises:
a sidewall disposed between the upper dome and the lower dome;
wherein the viewport window disposed over the sensor view pipe; and
a radiation source disposed below the lower dome.
10. The apparatus of claim 9 , wherein the upper dome has one or more openings, and a first end of the sensor view pipe is coupled to the opening and a second end of the sensor view pipe is coupled to a flange.
11. The apparatus of claim 10 , wherein a longitudinal axis of the flange is at an angle of about 91° to about 100° with respect to a longitudinal axis of the sensor view pipe.
12. The apparatus of claim 10 , wherein the sensor view pipe is comprised of an upper section and a lower section, the upper section having a first inner diameter and the lower section having a second inner diameter larger than the first inner diameter.
13. The apparatus of claim 9 , further comprising:
a purge gas tube coupled to the sensor view pipe, wherein the purge gas tube is in fluid communication with an inert gas source.
14. The apparatus of claim 9 , further comprising:
a reflector plate disposed over the upper dome, the reflector plate having a plurality of perforations; and
a cover plate disposed over the reflector plate, wherein the sensor view pipe is extended upwardly through the perforation of the reflector plate and over the cover plate.
15. The apparatus of claim 14 , wherein the reflector plate is a split design that can be separated into two halves along a split line.