Semiconductor devices and methods of forming the same
A semiconductor device is provided. The semiconductor device includes a semiconductor fin over a substrate, and a gate structure along sidewalls and the top surface of the semiconductor fin. The gate structure covers the first portion of the semiconductor fin. The semiconductor device also includes a source/drain feature adjacent to the gate structure. The semiconductor device further includes a source/drain contact connected to the source/drain feature. The source/drain contact extends downwards to a position that is lower than the top surface of the first portion of the semiconductor fin.
1. A semiconductor device, comprising:
a semiconductor fin over a substrate;
a gate structure along sidewalls and a top surface of the semiconductor fin, wherein the gate structure covers a first portion of the semiconductor fin;
a source/drain feature adjacent to the gate structure; and
a source/drain contact connected to the source/drain feature, wherein the source/drain contact extends downwards to a position that is lower than a top surface of the first portion of the semiconductor fin,
wherein a thickness of the source/drain feature below a bottommost surface of the source/drain contact is in a range from 1 nm to 10 nm.
2. The semiconductor device as claimed in claim 1 , wherein a portion of the source/drain contact that is lower than the top surface of the first portion of the semiconductor fin is disposed within the source/drain feature.
3. The semiconductor device as claimed in claim 1 , wherein the source/drain feature has a concave cross-sectional shape.
4. The semiconductor device as claimed in claim 1 , wherein an uppermost surface of the source/drain feature is level with the top surface of the first portion of the semiconductor fin.
5. The semiconductor device as claimed in claim 1 , wherein the source/drain feature is a doped region having a doping concentration of 10 19 cm −3 and about 10 21 cm −3 .
6. The semiconductor device as claimed in claim 1 , wherein a distance between a lowermost bottom of the source/drain contact and a bottom surface of the semiconductor fin is equal to or less than 10 nm.
7. The semiconductor device as claimed in claim 1 , wherein the source/drain contact comprises:
a lower portion directly on a concave upper surface of the source/drain feature; and
an upper portion disposed on the lower portion and electrically connected to the lower portion.
8. The semiconductor device as claimed in claim 7 , wherein a width of the lower portion is smaller than a width of the upper portion.
9. The semiconductor device as claimed in claim 7 , wherein a width of the lower portion is larger than a width of the upper portion.
10. The semiconductor device as claimed in claim 1 , wherein the semiconductor fin comprises nanowires or nanosheets.
11. The semiconductor device as claimed in claim 1 , wherein a thickness of the source/drain feature is in a range from 1 nm to 10 nm along a bottom and sides of the source/drain feature.