PERC-like contact to CdTe solar cells
Methods for forming electrical contacts with CdTe layers, methods for forming photovoltaic devices, methods for passivating a CdTe surface, and photovoltaic devices are described.
1. A method of forming a contact on a CdTe surface, the method comprising:
contacting a CdTe surface with a precursor solution comprising a passivating precursor and an electrically conductive or semiconducting nanomaterial to form a coated surface;
annealing the coated surface to form an interface layer comprising a passivating material on the CdTe surface; and
depositing an electrical contact on the interface layer, wherein the electrical contact is electrically connected to the CdTe surface through the electrically conductive or semiconducting nanomaterial.
2. The method of claim 1 , wherein the electrical contact is electrically connected to the CdTe surface only through the electrically conductive or semiconductor nanomaterial.
3. The method of claim 1 , wherein the passivating precursor comprises aluminum or magnesium.
4. The method of claim 1 , wherein the passivating precursor comprises aluminum acetylacetonate (Al(acac) 3 ) or aluminum nitrate nonahydrate.
5. The method of claim 1 , wherein the precursor solution is prepared by mixing a SWCNT solution comprising single-walled carbon nanotubes (SWCNTs) and hydroxypropyl cellulose with a Al(acac) 3 solution comprising Al(acac) 3 .
6. The method of claim 5 , wherein equal volumes of the SWCNT solution and the Al(acac) 3 solution are mixed to prepare the precursor solution.
7. The method of claim 1 , wherein the passivating material comprises an oxide, a nitride, a silicide, a nitride, a fluoride, a carbide, or amorphous silicon.
8. The method of claim 1 , wherein the passivating material comprises Al 2 O 3, MgO, SiO 2 , or CuAlO x .
9. The method of claim 1 , wherein the electrically conductive or semiconducting nanomaterial comprises single-walled carbon nanotubes (SWCNTs), metal filaments, or Te nanowires.
10. The method of claim 1 , wherein the annealing is conducted in air.
11. The method of claim 1 , wherein the annealing is conducted at a temperature ranging from about 220° C. to about 350° C.
12. The method of claim 1 , wherein the annealing is conducted for a time period ranging from about 1 minute to about 20 minutes.
13. The method of claim 1 , wherein the interface layer comprises CuAlO x or Al 2 O 3 with SWCNTs therein.