IP Library › Granted Patent US 11,190,160
Granted Patent B2
US 11,190,160 · App. 16/764,279 · Granted Nov 30, 2021

Frequency multiplexer

Inventors: Xiaodong Wang (Anhui, CN); Chengjie Zuo (Anhui, CN); Jun He (Anhui, CN)
Assignee: ANHUI ANUKI TECHNOLOGIES CO., LTD.
H03H7/0115H01F27/2804H01P1/213H01F2017/0026H01F2027/2809
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Quick Facts
Patent No.
US 11,190,160
App. No.
16/764,279
Granted
Nov 30, 2021
Kind
B2
Abstract

Provided is a frequency multiplexer. The frequency multiplexer includes a stacked structure. The stacked structure includes at least one insulating layer and a plurality of metal layers arranged alternately along a stacked direction. The stacked structure forms at least one first inductive element and at least one capacitive element. At least two of the plurality of metal layers are provided with respective first patterned metal structures. The first patterned metal structures in the at least two of the plurality of metal layers are electrically connected to form a first multilayer planar spiral coil structure. The first multilayer planar spiral coil structure constitutes the first inductive element.

Claims (14)

1. A frequency multiplexer, comprising:

a stacked structure, wherein the stacked structure comprises at least one insulating layer and a plurality of metal layers arranged alternately along a stacked direction in the order of one metal layer and one insulating layer, and the stacked structure forms at least one first inductive element and at least one capacitive element;

wherein at least two of the plurality of metal layers are provided with respective first patterned metal structures, the first patterned metal structures in the at least two of the plurality of metal layers are electrically connected to form a first multilayer planar spiral coil structure, and the first multilayer planar spiral coil structure constitutes the first inductive element;

wherein the stacked structure further forms at least one second inductive element;

at least two of the plurality of metal layers are provided with respective second patterned metal structures, the second patterned metal structures in the at least two of the plurality of metal layers are electrically connected to form a second spiral coil structure, and the second spiral coil structure constitutes the second inductive element;

an axial direction of the first multilayer planar spiral coil structure intersects with an axial direction of the second spiral coil structure.

2. The frequency multiplexer of claim 1 , wherein the first multilayer planar spiral coil structure comprises a plurality of first monolayer planar spiral coil structures along the axial direction of the first multilayer planar spiral coil structure, and a thickness of a first dielectric structure between two adjacent first monolayer planar spiral coil structures is greater than a thickness of each first monolayer planar spiral coil structure.

3. The frequency multiplexer of claim 1 , wherein the first multilayer planar spiral coil structure comprises a plurality of first monolayer planar spiral coil structures along the axial direction of the first multilayer planar spiral coil structure, and the first multilayer planar spiral coil structure forms a structure comprising at least one coil.

4. The frequency multiplexer of claim 1 , wherein the axial direction of the first multilayer planar spiral coil structure is perpendicular to the axial direction of the second spiral coil structure.

5. The frequency multiplexer of claim 1 , wherein the first inductive element is configured in a first branch of the frequency multiplexer, and the second inductive element is configured in a second branch of the frequency multiplexer.

6. The frequency multiplexer of claim 1 , wherein the second spiral coil structure is a multilayer spiral coil structure.

7. The frequency multiplexer of claim 6 , wherein the second spiral coil structure comprises a plurality of second monolayer planar spiral coil structures along the axial direction of the second spiral coil structure, and a thickness of a second dielectric structure between two adjacent second monolayer planar spiral coil structures is greater than a thickness of each second monolayer planar spiral coil structure.

8. The frequency multiplexer of claim 1 , wherein the stacked structure further forms at least one third inductive element, a third patterned metal structure in one of the plurality of metal layers forms a third monolayer planar spiral coil structure, and the third monolayer planar spiral coil structure constitutes the at least one third inductive element.

9. The frequency multiplexer of claim 1 , wherein the at least one capacitive element is formed of overlapping parts of fourth patterned metal structures in two adjacent metal layers of the plurality of metal layers along a direction perpendicular to a plane of the stacked structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 14, 2020
From: WANG, XIAODONG; ZUO, CHENGJIE; HE, JUN
To: ANHUI ANUKI TECHNOLOGIES CO., LTD.
Reel/Frame 052666/0801 →
Priority Claims (2)
CN 201811367716.X · Nov 16, 2018 · national
CN 201821907531.9 · Nov 16, 2018 · national
Continuity (1)
Related Publication 20210226601A1 · Jul 22, 2021