IP Library › Granted Patent US 11,195,087
Granted Patent B2
US 11,195,087 · App. 15/850,145 · Granted Dec 7, 2021

Synapse array of a neuromorphic device including a synapse array having a plurality of ferroelectricity field effect transistors

Inventor: Hyung-Dong Lee (Hwaseong-si, KR)
Assignee: SK HYNIX INC.
G06N3/063G06N3/04H01L27/1156H01L27/1159H01L27/11521H01L27/11587H01L29/40111H01L29/516H01L29/6684G06N3/049H01L29/4238H01L29/42364H01L29/78391
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Quick Facts
Patent No.
US 11,195,087
App. No.
15/850,145
Granted
Dec 7, 2021
Kind
B2
Abstract

A neuromorphic device having a synapse array is provided. The synapse array of the neuromorphic device may include an input neuron; an output neuron; and a synapse. The synapse may include a plurality of ferroelectric field effect transistors electrically connected to each other in parallel.

Claims (51)

1. A synapse array of a neuromorphic device comprising:

a plurality of input neurons;

a plurality of output neurons;

a plurality of gating controllers; and

a plurality of synapses,

wherein:

the plurality of synapses comprises a first synapse, a second synapse and a third synapse arrayed in a first direction;

each of the first to third synapses comprises a first ferroelectric field effect transistor, a second ferroelectric field effect transistor, and a third ferroelectric field effect transistor arrayed in a second direction, which is perpendicular to the first direction;

the first to third ferroelectric field effect transistors of the first synapse are electrically connected to each other in parallel, the first to third ferroelectric field effect transistors of the second synapse are electrically connected to each other in parallel and the first to third ferroelectric field effect transistors of the third synapse are electrically connected to each other in parallel;

each of the first ferroelectric field effect transistors, the second ferroelectric field effect transistors and the third ferroelectric field effect transistors comprises a gate insulating layer, a ferroelectric film, and a gate electrode; and

the gate electrode of the first ferroelectric field effect transistor of the first synapse, the gate electrode of the first ferroelectric field effect transistor of the second synapse and the gate electrode of the first ferroelectric field effect transistor of the third synapse are electrically connected to each other.

2. The synapse array of the neuromorphic device of claim 1 ,

wherein:

the ferroelectric films of the first ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other; and

the gate electrodes of the first ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other.

3. The synapse array of the neuromorphic device of claim 1 ,

wherein:

the ferroelectric films of the first, second and third ferroelectric field effect transistors in a synapse are line shapes that extend in the second direction to directly connect with each other;

the gate electrodes of the first ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other.

4. The synapse array of the neuromorphic device of claim 1 ,

wherein:

each of the gate insulating layers has a plate shape that extends in the first direction and the second direction to directly connect with each other;

each of the ferroelectric films has a plate shape that extends in the first direction and the second direction to directly connect with each other; and

the gate electrodes of the first ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other.

5. The synapse array of the neuromorphic device of claim 1 ,

wherein each of the first ferroelectric field effect transistors, the second ferroelectric field effect transistors, and the third ferroelectric field effect transistors includes a drain electrode electrically connected to the input neurons.

6. The synapse array of the neuromorphic device of claim 1 ,

wherein each of the first ferroelectric field effect transistors, the second ferroelectric field effect transistors, and the third ferroelectric field effect transistors includes a source electrode electrically connected to the output neurons.

7. The synapse array of the neuromorphic device of claim 1 , wherein each of the gate electrodes of the first ferroelectric field effect transistors, the second ferroelectric field effect transistors, and the third ferroelectric field effect transistors is electrically connected to the gating controllers.

8. A synapse array of a neuromorphic device comprising:

an input neuron;

an output neuron;

a plurality of gating controllers; and

a synapse,

wherein:

the synapse comprises a ferroelectric field effect transistor having a common gate insulating layer, a common floating gate electrode, a plurality of individual ferroelectric films, and a plurality of individual control gate electrodes,

the plurality of individual ferroelectric films and the plurality of individual control gate electrodes share the common floating gate electrode, and

the plurality of gating controllers are electrically connected to the plurality of individual control gate electrodes, respectively.

9. The synapse array of the neuromorphic device of claim 8 ,

wherein the ferroelectric field effect transistor includes a drain electrode electrically connected to the input neuron and

a source electrode electrically connected to the output neuron.

10. The synapse array of the neuromorphic device of claim 2 , wherein:

the ferroelectric films of the second ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other;

the ferroelectric films of the third ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other;

the gate electrodes of the second ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other; and

the gate electrodes of the third ferroelectric field effect transistors of the first, second and third synapses are line shapes that extend in the first direction to directly connect with each other.

11. The synapse array of the neuromorphic device of claim 1 , wherein channel sizes of the first, second and third ferroelectric field effect transistors vary according to polarization voltages of the respective ferroelectric films.

12. The synapse array of the neuromorphic device of claim 8 , wherein the plurality of individual ferroelectric films and the plurality of individual control gate electrodes are line shapes extending in a same direction.

13. The synapse array of the neuromorphic device of claim 8 , wherein the plurality of individual ferroelectric films and the plurality of individual control gate electrodes are line shapes extending in directions perpendicular to each other.

14. The synapse array of the neuromorphic device of claim 8 , wherein the common gate insulating layer and the plurality of individual ferroelectric films have a plate shape, and the plurality of individual control gate electrodes are line shapes.

15. The synapse array of the neuromorphic device of claim 8 , wherein channel size of the ferroelectric field effect transistor varies according to polarization voltages of the individual ferroelectric films.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 21, 2017
From: LEE, HYUNG-DONG
To: SK HYNIX INC.
Reel/Frame 044938/0739 →
Priority Claims (1)
KR 10-2017-0069563 · Jun 5, 2017 · national
Continuity (1)
Related Publication 20180349762A1 · Dec 6, 2018
Cited By (2)
US 12,277,961 US 12,740,101