Conductive film manufacturing method
Provided is a method for manufacturing a conductive film, including forming a coating of a composition that contains conductivity-imparting particles and photo-sintering the coating, wherein, prior to the photo-sintering of the coating, the coating is compressed in the thickness direction thereof. It is preferable that the coating be compressed at a temperature at which a binding agent contained in the composition shows a storage modulus of 100 MPa or less. It is also preferable that the coating be compressed so that the compression rate in the thickness direction is from 25% to 80%. It is preferable that, in the photo-sintering step, the light irradiation be performed through irradiation with pulsed light.
1. A method for manufacturing a conductive film, comprising:
forming a coating of a composition that contains conductivity-imparting particles and a binding agent; and
photo-sintering the coating,
wherein, prior to the photo-sintering of the coating, the coating is compressed in a thickness direction thereof, and
wherein the coating is compressed at a temperature at which the binding agent contained in the composition shows a storage modulus of 100 MPa or less.
2. The method according to claim 1 ,
wherein the binding agent is a polyamide resin or a cellulose-based material.
3. The method according to claim 2 ,
wherein the coating is compressed so that a compression rate in the thickness direction is from 25% to 80%.
4. The method according to claim 1 ,
wherein the coating is compressed so that a compression rate in the thickness direction is from 25% to 80%.