Solid-state imaging device and electronic apparatus
Provided is a solid-state imaging device including a first substrate that includes a pixel unit, a first semiconductor substrate, and a first multi-layered wiring layer stacked, a second substrate that includes circuit, a second semiconductor substrate, and a second multi-layered wiring layer stacked, the circuit having a predetermined function, a third substrate that includes a circuit, a third semiconductor substrate, and a third multi-layered wiring layer. The first substrate and the second substrate being bonded together such that the first multi-layered wiring layer is opposite to the second semiconductor substrate, and a first coupling structure for electrically coupling the circuit of the first substrate with the circuit of the second substrate, the first coupling structure is on bonding surfaces of the first substrate and the second substrate, and includes an electrode junction structure in which electrodes on the respective bonding surfaces are joined to each other in direct contact.
1. A solid-state imaging device, comprising:
a first substrate including:
a first semiconductor substrate;
a first electrode on a bonding surface of the first substrate;
a first circuit; and
a first multi-layered wiring layer on the first semiconductor substrate, wherein
the first semiconductor substrate includes a pixel unit, and
the pixel unit includes a plurality of pixels;
a second substrate including:
a second semiconductor substrate;
a second electrode on a first bonding surface of the second substrate; and
a second multi-layered wiring layer on the second semiconductor substrate, wherein
the second semiconductor substrate includes a second circuit, and
the second circuit is configured to execute a first function;
a third substrate including:
a third semiconductor substrate; and
a third multi-layered wiring layer on the third semiconductor substrate, wherein
the third semiconductor substrate includes a third circuit,
the third circuit is configured to execute a second function,
the first substrate is on the second substrate,
the second substrate is on the third substrate,
the first substrate is bonded to the second substrate, and
the first multi-layered wiring layer is opposite to the second semiconductor substrate;
a first coupling structure configured to electrically couple the first circuit of the first substrate to the second circuit of the second substrate, wherein
the first coupling structure is on each of the bonding surface of the first substrate and the first bonding surface of the second substrate,
the first coupling structure includes a first electrode junction structure,
the first electrode junction structure includes the first electrode in direct contact with the second electrode; and
a second coupling structure configured to electrically couple the second circuit to the third circuit, wherein
the second coupling structure includes a first opening from a back surface side of the first substrate to the third multi-layered wiring layer,
the first opening is in the first semiconductor substrate of the first substrate, the first multi-layered wiring layer of the first substrate, and the second substrate, and
the first opening exposes a first wiring line in the third multi-layered wiring layer.
2. The solid-state imaging device according to claim 1 , wherein
the second coupling structure further includes a second opening from the back surface side of the first substrate to the second multi-layered wiring layer, and
the second opening exposes wiring line in the second multi-layered wiring layer.
3. The solid-state imaging device according to claim 2 , wherein
the wiring line in the second multi-layered wiring layer includes a first pad,
the first wiring line in the third multi-layered wiring layer includes a second pad, and
each of the first pad and the second pad is configured to function as an input/output (I/O) unit.
4. The solid-state imaging device according to claim 2 , further comprising:
a first pad on a back surface of the first substrate;
a second pad on the back surface of the first substrate; and
a film that includes an electrically-conductive material, wherein
the film is on each of an inner wall of the first opening and an inner wall of the second opening,
the exposed wiring line in the second multi-layered wiring layer is electrically coupled to the first pad by the electrically-conductive material, and
the exposed first wiring line in the third multi-layered wiring layer is electrically coupled to the second pad by the electrically-conductive material.
5. The solid-state imaging device according to claim 4 , wherein
the wiring line in the second multi-layered wiring layer and the first wiring line in the third multi-layered wiring layer are electrically coupled to the same pad by the electrically-conductive material.
6. The solid-state imaging device according to claim 4 , wherein
the first pad is different from the second pad.
7. The solid-state imaging device according to claim 1 , wherein
the second substrate is bonded to the third substrate,
the second multi-layered wiring layer is opposite to the third multi-layered wiring layer,
the second coupling structure further includes a via,
each of the second substrate and the third substrate further includes the via, and
the via is configured to electrically couple wiring line in the second multi-layered wiring layer with a second wiring line in the third multi-layered wiring layer.
8. The solid-state imaging device according to claim 7 , further comprising a film on an inner wall of the first opening, wherein
the film includes an electrically-conductive material,
the via has a specific structure,
the specific structure includes a first through hole and a second through hole,
each of the first through hole and the second through hole includes the electrically-conductive material,
the first through hole exposes the wiring line in the second multi-layered wiring layer,
the second through hole exposes the second wiring line in the third multi-layered wiring layer, and
the second through hole is different from the first through hole.
9. The solid-state imaging device according to claim 7 , further comprising a film on an inner wall of the first opening, wherein
the film includes an electrically-conductive material,
the via has a specific structure,
the specific structure includes one of a first through hole or a second through hole,
the one of the first through hole or the second through hole includes the electrically-conductive material,
the first through hole is in contact with the wiring line in the second multi-layered wiring layer and exposes the second wiring line in the third multi-layered wiring layer, and
the second through hole is in contact with the second wiring line in the third multi-layered wiring layer and exposes the wiring line in the second multi-layered wiring layer.
10. The solid-state imaging device according to claim 1 , further comprising a third coupling structure configured to electrically couple the first circuit of the first substrate with the third circuit of the third substrate, wherein
the second substrate is bonded to the third substrate,
the second multi-layered wiring layer is opposite to the third multi-layered wiring layer,
the third coupling structure includes a via from a back surface side of the third substrate to the first multi-layered wiring layer, and
the via is configured to electrically couple a wiring line in the first multi-layered wiring layer with a second wiring line in the third multi-layered wiring layer.
11. The solid-state imaging device according to claim 10 , further comprising a film on an inner wall of the first opening, wherein
the film includes an electrically-conductive material,
the via has a specific structure,
the specific structure includes a first through hole and a second through hole,
each of the first through hole and the second through hole includes the electrically-conductive material,
the first through hole exposes the wiring line in the first multi-layered wiring layer,
the second through hole exposes the second wiring line in the third multi-layered wiring layer, and
the second through hole is different from the first through hole.
12. The solid-state imaging device according to claim 10 , further comprising a film on an inner wall of the first opening, wherein
the film includes an electrically-conductive material,
the via has a specific structure that includes a through hole,
the through hole includes the electrically-conductive material,
the through hole is in contact with the second wiring line in the third multi-layered wiring layer, and
the through hole exposes the wiring line in the first multi-layered wiring layer.
13. The solid-state imaging device according to claim 12 , wherein the via is electrically coupled to a wiring line in the second multi-layered wiring layer.
14. The solid-state imaging device according to claim 1 , wherein
the second substrate further includes a third electrode on a second bonding surface of the second substrate,
the third substrate further includes a fourth electrode on a bonding surface of the third substrate,
the second coupling structure is on each of the second bonding surface of the second substrate and the bonding surface of the third substrate,
the second coupling structure includes a second electrode junction structure, and
the second electrode junction structure includes the third electrode in direct contact with the fourth electrode.
15. The solid-state imaging device according to claim 1 , wherein
the pixel unit is configured to acquire a pixel signal
each of the second substrate and the third substrate includes one of a logic circuit or a memory circuit,
the logic circuit is configured to execute a plurality of signal processes related to an operation of the solid-state imaging device, and
the memory circuit is configured to temporarily hold the pixel signal acquired by the pixel unit.
16. The solid-state imaging device according to claim 1 , wherein
each pixel of the plurality of pixels is configured to acquire a pixel signal,
the second substrate further includes a pixel signal processing circuit,
the pixel signal processing circuit is configured to execute analog-to-digital that (AD) conversion on the pixel signal, and
the first coupling structure is configured to transmit the pixel signal from each pixel of the plurality of pixels to the pixel signal processing circuit.
17. An electronic apparatus, comprising:
a solid-state imaging device configured to electronically shoot an image of an object, wherein
the solid-state imaging device includes:
a first substrate including:
a first semiconductor substrate;
a first electrode on a bonding surface of the first substrate;
a first circuit; and
a first multi-layered wiring layer on the first semiconductor substrate, wherein
the first semiconductor substrate includes a pixel unit, and
the pixel unit includes a plurality of pixels;
a second substrate including:
a second semiconductor substrate;
a second electrode on a bonding surface of the second substrate; and
a second multi-layered wiring layer on the second semiconductor substrate, wherein
the second semiconductor substrate includes a second circuit, and
the second circuit is configured to execute a first function;
a third substrate including:
a third semiconductor substrate; and
a third multi-layered wiring layer on the third semiconductor substrate, wherein
the third semiconductor substrate includes a third circuit,
the third circuit is configured to execute a second function,
the first substrate is on the second substrate,
the second substrate is on the third substrate,
the first substrate is bonded to the second substrate, and
the first multi-layered wiring layer is opposite to the second semiconductor substrate;
a first coupling structure configured to electrically couple the first circuit of the first substrate to the second circuit of the second substrate, wherein
the first coupling structure is on each of the bonding surface of the first substrate and the bonding surface of the second substrate,
the first coupling structure includes an electrode junction structure, and
the electrode junction structure includes the first electrode in direct contact with the second electrode; and
a second coupling structure configured to electrically couple the second circuit to the third circuit, wherein
the second coupling structure includes an opening from a back surface side of the first substrate to the third multi-layered wiring layer,
the opening is in the first semiconductor substrate of the first substrate, the first multi-layered wiring layer of the first substrate, and the second substrate, and
the opening exposes a wiring line in the third multi-layered wiring layer.