Display device
A display device includes a polycrystalline semiconductor including a channel, a first electrode, and a second electrode of a driving transistor, a first gate insulating layer, a gate electrode of a driving transistor, a first electrode of a boost capacitor, a second gate insulating layer, a first interlayer insulating layer, an oxide semiconductor including a channel, a first electrode, and a second electrode of a second transistor, a channel, a first electrode, and a second electrode of a third transistor, and a second electrode of a boost capacitor, a third gate insulating layer disposed on the oxide semiconductor, a gate electrode of the second transistor overlapping the channel of the second transistor, a gate electrode of the third transistor overlapping the channel of the third transistor, and a second interlayer insulating layer disposed on the gate electrode of the second transistor and the gate electrode of the third transistor.
1. A display device comprising:
a polycrystalline semiconductor including a channel, a first electrode, and a second electrode of a driving transistor disposed on a substrate;
a first gate insulating layer disposed on the polycrystalline semiconductor;
a gate electrode of the driving transistor disposed on the first gate insulating layer and overlapping a channel of the driving transistor;
a first electrode of a boost capacitor disposed on the first gate insulating layer;
a second gate insulating layer disposed on the gate electrode of the driving transistor and the first electrode of the boost capacitor;
a first interlayer insulating layer disposed on the second gate insulating layer;
an oxide semiconductor disposed on the first interlayer insulating layer, and including:
a channel, a first electrode, and a second electrode of a second transistor;
a channel, a first electrode, and a second electrode of a third transistor; and
a second electrode of a boost capacitor;
a third gate insulating layer disposed on the oxide semiconductor;
a gate electrode of the second transistor disposed on the third gate insulating layer, and overlapping the channel of the second transistor;
a gate electrode of the third transistor disposed on the third gate insulating layer, and overlapping the channel of the third transistor; and
a second interlayer insulating layer disposed on the gate electrode of the second transistor and the gate electrode of the third transistor, wherein
a hydrogen concentration of the first interlayer insulating layer, the third gate insulating layer, and the second interlayer insulating layer is lower than a hydrogen concentration of the first gate insulating layer and the second gate insulating layer, and the first electrode and the second electrode of the second transistor of the oxide semiconductor, the first electrode and the second electrode of the third transistor, and the second electrode of the boost capacitor are doped with at least one selected from the group consisting of boron, phosphorus, argon, xenon, and krypton.
2. The display device of claim 1 , wherein
the third gate insulating layer is disposed on a top surface of the oxide semiconductor and the first interlayer insulating layer.
3. The display device of claim 2 , wherein the third gate insulating layer is disposed on a substantially entire surface of the top surface of the oxide semiconductor and the first interlayer insulating layer.
4. The display device of claim 3 , wherein
the third gate insulating layer covers the top surface and a side surface of the oxide semiconductor.
5. The display device of claim 1 , wherein
a hydrogen concentration of the first interlayer insulating layer is less than about 1.0E +21 atoms/cm 3 .
6. The display device of claim 1 , wherein
a hydrogen concentration of the third gate insulating layer is less than about 1.14E +21 atoms/cm 3 .
7. The display device of claim 1 , wherein
a hydrogen concentration of the second interlayer insulating layer is less than about 1.0E +22 atoms/cm 3 .
8. The display device of claim 1 , wherein
a doping concentration of a source region and a drain region of the oxide semiconductor is equal to or greater than about 5E +18 cm −3 .
9. A display device comprising:
a light emitting diode electrically connected between a driving voltage line for applying a driving voltage and a common voltage line for applying a common voltage;
a driving transistor electrically connected between the driving voltage line and the light emitting diode;
a second transistor electrically connected between a first electrode of the driving transistor electrically connected to the driving voltage line and a data line for applying a data voltage;
a third transistor electrically connected between a second electrode of the driving transistor electrically connected to the light emitting diode and a gate electrode of the driving transistor;
a fourth transistor electrically connected between the gate electrode of the driving transistor and a first initialization voltage line for applying a first initialization voltage;
a storage capacitor electrically connected between the driving voltage line and the gate electrode of the driving transistor; and
a boost capacitor electrically connected between a gate electrode of the second transistor and the gate electrode of the driving transistor.
10. The display device of claim 9 , wherein
the gate electrode of the second transistor is electrically connected to a scan line for applying a scan signal,
a gate electrode of the third transistor is electrically connected to an inverted scan line for applying an inverted scan signal, and
a voltage with an opposite polarity to a voltage applied to the scan line is applied to the inverted scan line, wherein the voltage with the opposite polarity and the voltage applied to the scan line are simultaneously applied.
11. The display device of claim 9 , wherein
the driving transistor and the second transistor include a polycrystalline semiconductor,
the third transistor and the fourth transistor include an oxide semiconductor, and
at least part of the oxide semiconductor is doped with at least one selected from the group consisting of boron, phosphorus, argon, xenon, and krypton.
12. The display device of claim 11 , wherein
the driving transistor and the second transistor are p-type transistors, and
the third transistor and the fourth transistor are n-type transistors.
13. The display device of claim 11 , wherein
the boost capacitor includes an electrode electrically connected to the gate electrode of the driving transistor, and
the electrode of the boost capacitor is doped with at least one selected from the group consisting of boron, phosphorus, argon, xenon, and krypton.
14. The display device of claim 11 , further comprising:
a fifth transistor electrically connected between the driving voltage line and the first electrode of the driving transistor;
a sixth transistor electrically connected between the first electrode of the driving transistor and the light emitting diode; and
a seventh transistor electrically connected between a second initialization voltage line for applying a second initialization voltage and the light emitting diode.
15. A display device comprising:
a polycrystalline semiconductor disposed on a substrate;
a first gate insulating layer disposed on the polycrystalline semiconductor;
a driving gate electrode disposed on the first gate insulating layer;
a second gate insulating layer disposed on the driving gate electrode;
a first interlayer insulating layer disposed on the second gate insulating layer;
an oxide semiconductor disposed on the first interlayer insulating layer;
a third gate insulating layer disposed on the oxide semiconductor;
a switching gate electrode disposed on the third gate insulating layer; and
a second interlayer insulating layer disposed on the switching gate electrode, wherein
a hydrogen concentration of the first interlayer insulating layer, the third gate insulating layer, and the second interlayer insulating layer is lower than a hydrogen concentration of the first gate insulating layer and the second gate insulating layer,
the oxide semiconductor includes a channel, a source region, and a drain region, and
the source region and the drain region of the oxide semiconductor are doped with at least one selected from the group consisting of boron, phosphorus, argon, xenon, and krypton.
16. The display device of claim 15 , wherein
the third gate insulating layer is disposed on a substantially entire surface of a top surface of the oxide semiconductor and the first interlayer insulating layer, and
the third gate insulating layer covers the channel of the oxide semiconductor, and a top surface and a side surface of the source region and the drain region of the oxide semiconductor.
17. The display device of claim 15 , wherein
a hydrogen concentration of the first interlayer insulating layer is less than about 1.0E +21 atoms/cm 3 .
18. The display device of claim 15 , wherein
a hydrogen concentration of the third gate insulating layer is less than about 1.14E +21 atoms/cm 3 .
19. The display device of claim 15 , wherein
a hydrogen concentration of the second interlayer insulating layer is less than about 1.0E +22 atoms/cm 3 .
20. The display device of claim 15 , wherein
a doping concentration of the source region and the drain region of the oxide semiconductor is equal to or greater than about 5E +18 cm −3 .