Direct graphene transfer and graphene-based devices
A method of forming a functionalized device substrate is provided that includes the steps of: forming a graphene layer on a growth substrate; applying a polyimide layer to a glass, glass-ceramic or ceramic substrate, wherein a coupling agent couples the polyimide layer to the said substrate; coupling the polyimide layer to the graphene layer on the growth substrate; and peeling the growth substrate from the graphene layer.
1. A method of forming a functionalized device substrate, comprising the steps of:
forming a conductive layer on a growth substrate;
applying a polymeric layer to a device substrate wherein the polymeric layer comprises a polyimide layer and, wherein a coupling agent couples the polymeric layer to the device substrate;
coupling the polymeric layer to the conductive layer on the growth substrate; and
peeling the growth substrate from the conductive layer.
2. The method of claim 1 , wherein the conductive layer comprises a graphene layer.
3. The method of claim 2 , wherein the step of forming the conductive layer comprises:
forming a graphene layer on the growth substrate, the growth substrate comprising one or more of copper, nickel, silicon carbide, germanium, silver, iron, stainless steel, sapphire, platinum, iridium, ruthenium, cobalt and a copper-nickel alloy.
4. The method of claim 1 , wherein the coupling agent comprises an aminosilane.
5. The method of claim 1 , wherein the device substrate comprises one or more of an aluminosilicate and a borosilicate glass.
6. The method of claim 1 , wherein the applying step further comprises:
heating the polymeric layer, coupling agent and device substrate to a temperature in the range from about 90° C. to about 130° C.
7. A method of forming a functionalized device substrate, comprising the steps of:
forming a graphene layer on a growth substrate;
applying a polyimide layer to a glass, glass-ceramic or ceramic substrate, wherein a coupling agent couples the polyimide layer to the glass, glass-ceramic or ceramic substrate;
coupling the polyimide layer to the graphene layer on the growth substrate; and
peeling the growth substrate from the graphene layer.
8. The method of claim 7 , wherein the step of applying the polyimide layer further comprises the step of:
mixing the coupling agent and a precursor of the polyimide and coating the glass, glass-ceramic or ceramic substrate with the coupling agent, the precursor and the polyimide layer.
9. The method of claim 7 , wherein the step of applying the polyimide layer further comprises:
applying the coupling agent to the glass, glass-ceramic or ceramic substrate; and
applying the polyimide layer to the coupling agent.
10. The method of claim 7 , wherein the applying the polyimide layer step is conducted with a spin coating process.
11. The method of claim 7 , wherein the step of coupling the polyimide layer to the graphene layer further comprises:
heating the polyimide layer at a temperature of from about 90° C. to about 180° C.
12. The method of claim 7 , wherein the step of coupling the polyimide layer to the graphene layer further comprises:
heating the polyimide layer to a temperature of from about 100° C. to about 150° C.
13. The method of claim 7 , wherein the step of coupling the polyimide layer to the graphene layer further comprises the step of:
pressing the polyimide layer to the graphene layer at a pressure of about 250 psi.
14. The method of claim 7 , wherein the step of coupling the polyimide layer to the graphene layer further comprises:
pressing the polyimide layer to the graphene layer at a pressure of from about 100 psi to about 350 psi.