IP Library › Granted Patent US 11,223,789
Granted Patent B2
US 11,223,789 · App. 16/693,483 · Granted Jan 11, 2022

Driving method of semiconductor device and electronic device

Inventor: Yoshiyuki Kurokawa (Kanagawa, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
H04N5/3745G01S7/4816G01S7/4863G01S17/02G01S17/89G01S17/894H01L27/1464H01L27/14609H01L27/14614H01L27/14621H01L27/14645H01L27/14649H01L27/14689H04N5/343H04N5/347H04N5/37457
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Quick Facts
Patent No.
US 11,223,789
App. No.
16/693,483
Filed
Nov 25, 2019
Granted
Jan 11, 2022
Kind
B2
Art Unit
2696
USPC
348/297
Abstract

A driving method of a semiconductor device that takes three-dimensional images with short duration is provided. In a first step, a light source starts to emit light, and first potential corresponding to the total amount of light received by a first photoelectric conversion element and a second photoelectric conversion element is written to a first charge accumulation region. In a second step, the light source stops emitting light and second potential corresponding to the total amount of light received by the first photoelectric conversion element and the second photoelectric conversion element is written to a second charge accumulation region. In a third step, first data corresponding to the potential written to the first charge accumulation region is read. In a fourth step, second data corresponding to the potential written to the second charge accumulation region is read.

Claims (34)

1. An image sensor comprising:

a pixel portion including a plurality of photodiodes, and a driving circuit configured to drive the pixel portion,

wherein the image sensor has a function of generating first image data, a function of holding the first image data, a function of reading the held first image data, a function of generating second image data, a function of holding the second image data, and a function of reading the second image data,

wherein the first image data corresponds to a charge amount generated in one of the plurality of photodiodes,

wherein the second image data corresponds to a charge amount generated in at least two of the plurality of photodiodes,

wherein one terminal of one of the plurality of photodiodes is electrically connected to one of a source and a drain of a first transistor and one of a source and a drain of a second transistor,

wherein the holding of the first image data or the holding of the second image data is performed using a capacitor and the first transistor electrically connected to the capacitor,

wherein the other terminal of the one of the plurality of photodiodes is electrically connected to a conductive layer,

wherein the other of the source and the drain of the second transistor is electrically connected to a first wiring via a contact plug without passing through any transistor,

wherein the one of the source and the drain of the second transistor is electrically connected to a second wiring via a contact plug without passing through any transistor,

wherein a photoelectric conversion region of each of the plurality of photodiodes is closer to a light incident side than the conductive layer, a channel formation region of the first transistor, which is included in the pixel portion, a channel formation region of the second transistor, which is included in the pixel portion, and a channel formation region of a third transistor, which is included in the driving circuit,

wherein the conductive layer and the second transistor overlap with each other,

wherein the second wiring and the gate electrode of the second transistor do not overlap with each other,

wherein the first wiring and the second wiring are positioned at different heights,

wherein the channel formation region of the first transistor and the channel formation region of the third transistor are positioned at different heights, and

wherein the plurality of photodiodes are provided in a semiconductor substrate.

2. The image sensor according to claim 1 ,

wherein the reading of the first image data or the second image data is performed after exposure to the pixel portion is ended.

3. The image sensor according to claim 1 , wherein the second transistor is provided in the semiconductor substrate.

4. The image sensor according to claim 2 , wherein the second transistor is provided in the semiconductor substrate.

5. An image sensor comprising:

a pixel portion including a first photodiode, a second photodiode, a first transistor electrically connected to one terminal of the first photodiode and one terminal of the second photodiode, and a second transistor electrically connected to the one terminal of the first photodiode; and

a driving circuit configured to drive the pixel portion,

wherein the other terminal of the first photodiode is electrically connected to a conductive layer,

wherein one of a source and a drain of the second transistor is electrically connected to a first wiring via a contact plug without passing through any transistor,

wherein the other of the source and the drain of the second transistor is electrically connected to a second wiring via a contact plug without passing through any transistor,

wherein a photoelectric conversion region of each of the first photodiode and the second photodiode is closer to a light incident side than the conductive layer, a channel formation region of the first transistor, which is included in the pixel portion, a channel formation region of the second transistor, which is included in the pixel portion, and a channel formation region of a third transistor, which is included in the driving circuit,

wherein the conductive layer and a gate electrode of the second transistor overlap with each other,

wherein the first wiring and the gate electrode of the second transistor do not overlap with each other,

wherein the first wiring and the second wiring are positioned at different heights,

wherein the second wiring and the conductive layer are positioned at the same height,

wherein the channel formation region of the first transistor and the channel formation region of the third transistor are positioned at different heights, and

wherein the first photodiode and the second photodiode are provided in a semiconductor substrate.

6. The image sensor according to claim 5 , wherein the second transistor is provided in the semiconductor substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 26, 2019
From: KUROKAWA, YOSHIYUKI
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 051113/0615 →
Priority Claims (1)
JP 2014-143256 · Jul 11, 2014 · national
Continuity (3)
Continuation 15642390 · Jul 6, 2017
Continuation 14790801 · Jul 2, 2015
Related Publication 20200099881A1 · Mar 26, 2020
Cited By (1)
US 12,641,834