Electron gun and electron beam application device
In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation source 301 is provided with respect to an electron gun including: an electron source 101 ; an extraction electrode 102 configured to extract electrons from the electron source 101 ; an acceleration electrode 103 configured to accelerate the electrons extracted from the electron source 101 ; and a first coil 104 and a first magnetic path 201 having an opening on an electron source side, the first coil 104 and the first magnetic path 201 forming a control lens configured to converge an electron beam emitted from the acceleration electrode 103 . The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source 101 , generated by the first coil 104 and the first magnetic path 201.
1. An electron gun, comprising:
an electron source;
an extraction electrode configured to extract electrons from the electron source;
an acceleration electrode configured to accelerate the electrons extracted from the electron source;
a first coil and a first magnetic path having an opening on an electron source side, the first coil and the first magnetic path forming a control lens configured to converge an electron beam emitted from the acceleration electrode; and
a magnetic field generation source configured to cancel a magnetic field, at an installation position of the electron source, generated by the first coil and the first magnetic path.
2. The electron gun according to claim 1 , wherein
the magnetic field generation source is disposed closer to the electron source than the first coil and the first magnetic path.
3. The electron gun according to claim 2 , wherein
the magnetic field generation source includes a second coil and a second magnetic path, and
a diameter of the second coil is set larger than a diameter of the first coil.
4. The electron gun according to claim 3 , wherein
a product of the number of coil turns of the second coil and a current passing through the coil is smaller than a product of the number of coil turns of the first coil and a current passing through the coil.
5. The electron gun according to claim 2 , wherein
the magnetic field generation source is a permanent magnet.
6. The electron gun according to claim 1 , further comprising:
an intermediate electrode disposed between the extraction electrode and the acceleration electrode, wherein
a voltage V mid applied to the intermediate electrode satisfies Equation 1
V
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V
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V
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wherein the electron source is used as a reference potential, V ext is a voltage applied to the extraction electrode, V acc is a voltage applied to the acceleration electrode, d 1 is a distance between the extraction electrode and the intermediate electrode and d 2 is a distance between the intermediate electrode and the acceleration electrode.
7. An electron beam application device, comprising:
the electron gun according to claim 1 ;
an aperture configured to limit an electron beam emitted from the electron gun;
a deflector configured to scan a sample with the electron beam;
an objective lens configured to converge the electron beam on the sample; and
a detector configured to detect electrons generated from the sample irradiated with the electron beam.
8. An electron beam application device, comprising:
the electron gun according to claim 1 ;
an aperture configured to limit an electron beam emitted from the electron gun;
a deflector configured to scan a sample with the electron beam;
an objective lens configured to converge the electron beam on the sample; and
an energy analyzer configured to measure an energy distribution of electrons generated from the sample irradiated with the electron beam.
9. An electron beam application device, comprising:
the electron gun according to claim 1 ;
an aperture configured to limit an electron beam emitted from the electron gun;
a deflector configured to scan a sample with the electron beam;
an objective lens configured to converge the electron beam on the sample; and
a detector disposed two-dimensionally and configured to measure an interference pattern of electrons generated from the sample irradiated with the electron beam.