Passivation of nonlinear optical crystals
A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.
1. A method comprising:
providing a nonlinear optical (NLO) crystal comprising cesium lithium borate;
performing an annealing process on the NLO crystal by maintaining a temperature of the NLO crystal temperature between 300° C. and 350° C.; and
following the annealing process, passivating the NLO crystal with a passivating gas having a concentration of at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound at or near a selected concentration to achieve a selected passivation level within the NLO crystal to compensate for broken bonds within the NLO crystal caused by the annealing of the NLO crystal.
2. The method of claim 1 , wherein the passivating gas comprises:
a mixture of hydrogen, deuterium and an inert gas.
3. The method of claim 1 , wherein the passivating gas comprises:
at least one inert gas mixed with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound.
4. The method of claim 1 , wherein the performing an annealing process on the NLO crystal comprises:
maintaining a temperature of the NLO crystal between room temperature and a melting point of the NLO crystal.
5. The method of claim 1 , further comprising:
containing the NLO crystal within a crystal housing unit.
6. The method of claim 1 , further comprising:
transmitting a beam of light from a light source through the NLO crystal.
7. The method of claim 6 , further comprising:
transmitting the beam of light from the light source through the NLO crystal to generate deep ultraviolet light with the NLO crystal.
8. The method of claim 6 , further comprising:
shaping the beam of light from the light source with one or more beam shaping optics.
9. A method comprising:
providing an NLO crystal;
performing an annealing process on the NLO crystal by maintaining a temperature of the NLO crystal temperature between 300° C. and 350° C.; and
following the annealing process, passivating the NLO crystal with a passivating gas having a concentration of at least one of hydrogen, deuterium, a hydrogen-containing compound and a deuterium-containing compound at or near a selected concentration to achieve a selected passivation level within the NLO crystal to compensate for broken bonds within the NLO crystal caused by the annealing of the NLO crystal.
10. The method of claim 9 , wherein the passivating gas comprises:
a mixture of hydrogen, deuterium and an inert gas.
11. The method of claim 9 , wherein the passivating gas comprises:
at least one inert gas mixed with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound.
12. The method of claim 9 , wherein the performing an annealing process on the NLO crystal comprises:
performing an annealing process on the NLO crystal between room temperature and a melting point of the NLO crystal.
13. The method of claim 9 , further comprising:
containing the NLO crystal within a crystal housing unit.
14. The method of claim 9 , further comprising:
transmitting a beam of light from a light source through the NLO crystal.
15. The method of claim 14 , further comprising:
transmitting the beam of light from the light source through the NLO crystal to generate deep ultraviolet light with the NLO crystal.
16. The method of claim 14 , further comprising:
shaping the beam of light from the light source with one or more beam shaping optics.