Temperature and bias control of edge ring
Embodiments described herein provide methods and apparatus used to control a processing result profile proximate to a circumferential edge of a substrate during the plasma assisted processing thereof. In one embodiment a substrate support assembly features a first base plate and a second base plate circumscribing the first base plate. The first and second base plates each have one or more respective first and second cooling disposed therein. The substrate support assembly further features a substrate support disposed on and thermally coupled to the first base plate and a biasing ring disposed on and thermally coupled to the second base plate. Here, the substrate support and the biasing ring are each formed of a dielectric material. The substrate support assembly further includes an edge ring biasing electrode embedded the dielectric material of the biasing ring and an edge ring disposed on the biasing ring.
1. A substrate support assembly, comprising:
a base plate having one or more cooling channels disposed therein;
a substrate support disposed on and thermally coupled to the base plate;
a biasing ring circumscribing the substrate support, wherein the biasing ring is disposed on and is thermally coupled to the base plate, and the biasing ring is formed of a dielectric material;
an edge ring biasing electrode embedded in the dielectric material of the biasing ring;
an edge ring disposed on the biasing ring;
a first heater for heating the substrate support; and
a second heater for heating the edge ring.
2. The substrate support assembly of claim 1 , wherein the edge ring is thermally coupled to the biasing ring by a thermally conductive material interposed therebetween.
3. The substrate support assembly of claim 1 , wherein the substrate support and the biasing ring are thermally insulated from one another by an insulator ring disposed therebetween.
4. The substrate support assembly of claim 1 , wherein the second heater is disposed between the biasing ring and the base plate.
5. The substrate support assembly of claim 1 , wherein the second heater is embedded in the dielectric material of the biasing ring.
6. The substrate support assembly of claim 1 , wherein
the substrate support comprises a substrate biasing electrode that is electrically coupled to a first power supply, and
the edge ring biasing electrode is electrically coupled to a second power supply that is different from the first power supply.
7. A method of processing a substrate, comprising:
heating a substrate support of a substrate support assembly to a first temperature;
heating an edge ring circumscribing the substrate support to a second temperature;
positioning the substrate on the substrate support, wherein the substrate support assembly is disposed in a processing volume of a processing chamber and the substrate support assembly comprises:
a base plate having one or more cooling channels disposed therein;
a substrate support disposed on and thermally coupled to the base plate;
a biasing ring circumscribing the substrate support, wherein the biasing ring is disposed on and is thermally coupled to the base plate, and the biasing ring is formed of a dielectric material;
an edge ring biasing electrode embedded in the dielectric material of the biasing ring;
an edge ring disposed on the biasing ring;
a first heater for heating the substrate support; and
a second heater for heating the edge ring;
flowing a processing gas into the processing volume;
igniting and maintaining a plasma of the processing gas;
biasing the substrate to a first bias voltage; and
biasing the edge ring to a second bias voltage, wherein the second bias voltage is different from the first bias voltage.
8. The method of claim 7 , wherein the edge ring is in direct contact with the biasing ring and the method further includes applying a DC voltage to the edge ring biasing electrode or an edge ring chucking electrode to electrically clamp and thermally couple the edge ring to the biasing ring.
9. The method of claim 7 , wherein the edge ring is thermally coupled to the biasing ring by a thermally conductive material interposed therebetween.
10. The method of claim 7 , wherein the second heater is disposed between the biasing ring and the base plate.
11. The method of claim 7 , wherein the second heater is embedded in the dielectric material of the biasing ring.
12. The method of claim 7 , wherein the substrate support and the biasing ring are thermally isolated from one another by a vacuum provided to a space defined therebetween.
13. The method of claim 12 , wherein the biasing ring is thermally insulated from the substrate support by a second insulator ring interposed therebetween.
14. A processing chamber, comprising:
a substrate support assembly disposed in a processing volume of the processing chamber, the substrate support assembly comprising:
a base plate having one or more cooling channels disposed therein;
a substrate support disposed on and thermally coupled to the base plate;
a biasing ring circumscribing the substrate support, wherein the biasing ring is disposed on and is thermally coupled to the base plate, and the biasing ring is formed of a dielectric material;
an edge ring biasing electrode embedded in the dielectric material of the biasing ring;
an edge ring disposed on the biasing ring;
a first heater for heating the substrate support; and
a second heater for heating the edge ring; and
a non-transitory computer readable medium having instructions stored thereon for performing a method of processing a substrate when executed by a processor, the method comprising:
heating the substrate support to a first temperature;
heating the edge ring to a second temperature;
positioning the substrate on the substrate support;
flowing a processing gas into the processing volume;
igniting and maintaining a plasma of the processing gas;
biasing the substrate using a first bias voltage; and
biasing the edge ring using a second bias voltage that is different from the first bias voltage.
15. The processing chamber of claim 14 , wherein the edge ring is in direct contact with the biasing ring and the method further includes applying a DC voltage to the edge ring biasing electrode or an edge ring chucking electrode to electrically clamp and thermally couple the edge ring to the biasing ring.
16. The processing chamber of claim 14 , wherein the edge ring is thermally coupled to the biasing ring by a thermally conductive material interposed therebetween.
17. The processing chamber of claim 14 , wherein the substrate support and the biasing ring are thermally insulated from one another by an insulator ring disposed therebetween.
18. The processing chamber of claim 17 , wherein the second heater is disposed between the biasing ring and the base plate.
19. The processing chamber of claim 14 , wherein the second heater is embedded in the dielectric material of the biasing ring.
20. The processing chamber of claim 19 , wherein the substrate support assembly further comprises an electrically insulting plate disposed between the base plate and the substrate support and the base plate and the biasing ring.