Bottom conductive structure with a limited top contact area
A dielectric spacer is formed laterally adjacent to a bottom conductive structure. The dielectric spacer is configured to limit the area in which a subsequently formed top contact structure can contact the bottom conductive structure. In some embodiments, only a topmost surface of the bottom conductive structure is contacted by the top contact structure. In other embodiments, a topmost surface and an upper sidewall surface of the bottom conductive structure is contacted by the top contact structure.
1. A structure comprising:
a dielectric spacer located laterally adjacent to, and contacting, a sidewall of a bottom conductive structure;
a layer of dielectric material located laterally adjacent to, and above, the dielectric spacer; and
a top contact structure located on at least a topmost surface of the bottom conductive structure and a surface of the dielectric spacer, wherein the top contact structure is embedded in the layer of dielectric material.
2. The structure of claim 1 , wherein the bottom conductive structure is located on a surface of a substrate.
3. The structure of claim 2 , wherein the bottom conductive structure includes a single bottom conductive structure.
4. The structure of claim 2 , wherein the bottom conductive structure is a dual bottom conductive structure including a lower bottom conductive structure and an upper bottom conductive structure.
5. The structure of claim 4 , wherein the upper bottom conductive structure has a first critical dimension and the lower bottom conductive structure has a second critical dimension, wherein the first critical dimension is less than, or equal to, the second critical dimension.
6. The structure of claim 1 , wherein the bottom conductive structure is located on a surface of an electrically conductive structure that is embedded in a lower dielectric material layer.
7. The structure of claim 6 , wherein the bottom conductive structure includes a single bottom conductive structure.
8. The structure of claim 6 , wherein the bottom conductive structure is a dual bottom conductive structure including a lower bottom conductive structure and an upper bottom conductive structure.
9. The structure of claim 8 , wherein the upper bottom conductive structure has a first critical dimension and the lower bottom conductive structure has a second critical dimension, wherein the first critical dimension is less than, or equal to, the second critical dimension.
10. The structure of claim 1 , wherein the surface of the dielectric spacer that the top contact structure is present on is recessed, and wherein the top contact structure contacts an uppermost sidewall surface of the bottom conductive structure.
11. The structure of claim 1 , wherein the bottom conductive structure is composed of at least one electrically conductive metal-containing material or a stack of electrically conductive metal-containing materials.
12. The structure of claim 1 , wherein the bottom conductive structure is composed of elements of a ferroelectric memory (FE) stack, a resistive random access memory (ReRAM) stack, a magnetoresistive random access memory (MRAM) stack, or a phase change random access memory (PRAM) stack.
13. The structure of claim 1 , wherein the top contact structure has a topmost surface that is coplanar with a topmost surface of the layer of dielectric material.
14. A method of forming a semiconductor structure, the method comprising:
forming a dielectric spacer located laterally adjacent to, and contacting, a sidewall of a bottom conductive structure;
forming a layer of dielectric material laterally adjacent to, and above, the dielectric spacer, wherein the layer of dielectric material is also present above the bottom conductive structure;
forming a contact opening in the layer of dielectric material; and
forming a top contact structure in the contact opening formed in the layer of dielectric material, wherein the top contact structure contacts at least a topmost surface of the bottom conductive structure and a surface of the dielectric spacer.
15. The method of claim 14 , wherein the bottom conductive structure is located on a surface of a substrate or on a surface of an electrically conductive structure that is embedded in a lower dielectric material layer.
16. The method of claim 14 , wherein the bottom conductive structure includes a single bottom conductive structure.
17. The method of claim 14 , wherein the bottom conductive structure is a dual bottom conductive structure including a lower bottom conductive structure and an upper bottom conductive structure.
18. The method of claim 17 , wherein the upper bottom conductive structure has a first critical dimension and the lower bottom conductive structure has a second critical dimension, wherein the first critical dimension is less than, or equal to, the second critical dimension.
19. The method of claim 14 , wherein the dielectric spacer is recessed prior to forming the top contact structure in the contact opening present in the layer of dielectric material to physically expose an upper sidewall portion of the bottom conductive structure.
20. The method of claim 14 , wherein the bottom conductive structure is formed utilizing a subtractive etch process.