Nanostructure
A composition of matter comprising at least one nanostructure grown epitaxially on an optionally doped β-Ga 2 O 3 substrate, wherein said nanostructure comprises at least one group III-V compound.
1. A composition of matter comprising at least one nanostructure grown epitaxially on a doped or undoped β-Ga 2 O 3 substrate,
wherein said nanostructure comprises at least one group III-V compound;
wherein said nanostructure grows from a (−201) or (100) β-Ga 2 O 3 substrate plane; and
wherein said nanostructure is grown in the absence of a catalyst.
2. The composition of matter of claim 1 , wherein said at least one nanostructure is p-type doped.
3. The composition of matter of claim 1 , wherein said at least one nanostructure comprises a radial or axial heterostructure.
4. The composition of matter of claim 1 , wherein:
the at least one nanostructure comprises at least one core semiconductor nanostructure;
a semiconductor shell surrounding said core nanostructure, said shell comprising at least one group III-V compound; wherein
said core semiconductor nanostructure is doped forming an n-type or p-type semiconductor; and wherein
said shell is doped forming a p-type semiconductor or an n-type semiconductor opposite to said core; and
an outer conducting coating surrounding at least a part of said shell to form an electrode contact.
5. The composition of matter of claim 1 , wherein said semiconductor nanostructure is doped forming axial n-type and p-type semiconductor regions.
6. The composition of matter of claim 1 , wherein the nanostructure comprises a group III-N compound.
7. The composition of matter of claim 1 , wherein the nanostructure comprises GaN, AlN, AlGaN, InGaN, or AlInGaN.
8. The composition of matter of claim 1 , wherein said nanostructure is a nanowire or nanopyramid.
9. The composition of matter of claim 8 , wherein said nanowire is no more than 400 nm in diameter and has a length of up to 5 microns.
10. The composition of matter of claim 1 , wherein said substrate comprises a plurality of nanowires and wherein said plurality of nanowires are substantially parallel.
11. The composition of matter of claim 1 , further comprising a doped or undoped group III-V buffer layer positioned between the substrate and the nanostructure.
12. The composition of matter of claim 11 , wherein said buffer layer is doped or undoped GaN.
13. The composition of matter of claim 1 , further comprising a hole patterned mask comprising a plurality of holes on the substrate and wherein said nanostructures grow through the plurality of holes of said mask.
14. The composition of matter of claim 1 , further comprising a hole patterned mask comprising a plurality of holes on the substrate, a doped or undoped group III-V compound buffer layer present in the plurality of holes of said mask, and wherein said nanostructures grow from said buffer layer through the plurality of holes of said mask.
15. The composition of matter of claim 1 , wherein the substrate comprises a doped or undoped group III-V compound buffer layer comprising a doped or undoped GaN buffer layer and a doped or undoped β-Ga 2 O 3 layer.
16. The composition of matter of claim 1 , wherein said substrate comprises a hole patterned mask layer comprising a plurality of holes through which said at least one nanostructure is grown,
and wherein a bottom of the plurality of holes of the hole patterned mask layer adjacent to the substrate is coated in a doped or undoped group III-V compound buffer.
17. A device, comprising the composition of claim 1 .