High temperature face plate for deposition application
Embodiments of the disclosure relate to faceplates for a processing chamber. In one example, a faceplate includes a body having a plurality of apertures formed therethrough. A heating element is disposed within the body, and the heating element circumscribes the plurality of apertures. A support ring is disposed in the body. The support ring circumscribes the heating element. The support ring includes a main body and a cantilever extending radially inward from the main body. The cantilever contacts the body of the faceplate.
1. A faceplate for a processing chamber, comprising:
a body having a plurality of apertures formed therethrough;
a heating element disposed within the body, the heating element circumscribing the plurality of apertures; and
a support ring disposed in the body, the support ring circumscribing the heating element, the support ring including a main body and a cantilever extending radially inward from the main body, the cantilever contacting the body of the faceplate.
2. The faceplate of claim 1 , wherein the body comprises aluminum and the support ring comprises aluminum, aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, or stainless steel.
3. The faceplate of claim 1 , further wherein a gap is formed between a radially inward surface of the cantilever and the body of the faceplate.
4. The faceplate of claim 1 , further wherein a gap formed between a lower surface of the cantilever and the body of the faceplate.
5. The faceplate of claim 1 , further wherein a first gap is formed between a radially inward surface of the main body of the support ring and the body of the faceplate, and a second gap is formed between an upper surface of the main body and the body of the faceplate.
6. The faceplate of claim 5 , wherein the first gap and second gap are each within a range of about 0.1 mm to 5 mm.
7. The faceplate of claim 1 , wherein a thickness of the cantilever is within a range of about 8 mm to 20 mm.
8. The faceplate of claim 1 , wherein the body comprises a first extension and a second extensions each extending outward from an outer surface of the body, the first extension and the second extension together defining a recess for receiving the support ring.
9. The faceplate of claim 8 , each of the first extension and the second extension have a greater thickness at a radially outward edge thereof compared to a radially inward edge thereof.
10. The faceplate of claim 9 , wherein the radially outward edge of each of the first and second extensions is in contact with the support ring, and the radially inward edge of each of the first and second extensions is spaced apart from the support ring.
11. A faceplate for a processing chamber, comprising:
a body having a plurality of apertures formed therethrough, the body comprising a first extension and a second extension each extending outward from an outer surface of the body, the first extension and the second extension together defining a recess, each of the first extension and the second extension have a greater thickness at a radially outward edge thereof compared to a radially inward edge thereof;
a heating element disposed within the body, the heating element circumscribing the plurality of apertures, the heating element located radially inward of the first extension and the second extension; and
a support ring disposed in the recess of the body, the support ring comprising a main body and circumscribing the heating element, wherein the radially outward edge of each of the first and second extensions is in contact with the support ring, and the radially inward edge of each of the first and second extensions is spaced apart from the support ring.
12. The faceplate of claim 11 , wherein the body comprises aluminum and the support ring comprises aluminum, aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, or stainless steel.
13. The faceplate of claim 12 , wherein the support ring further comprises a cantilever extending radially inward from the main body.
14. The faceplate of claim 13 , further wherein a gap is formed between a radially inward surface of the cantilever and the body of the faceplate.
15. The faceplate of claim 14 , wherein the gap is within a range of about 0.1 mm to 5 mm.
16. The faceplate of claim 14 , further wherein a gap formed between a lower surface of the cantilever and the body of the faceplate.
17. The faceplate of claim 16 , wherein the gap is within a range of about 0.1 mm to 5 mm.
18. A process chamber, comprising:
a chamber body;
a substrate support disposed in the chamber body; and
a lid assembly disposed on the chamber body, the lid assembly comprising:
a faceplate comprising:
a body having a plurality of apertures formed therethrough;
a heating element disposed within the body, the heating element circumscribing the plurality of apertures; and
a support ring disposed in the body, the support ring circumscribing the heating element, the support ring including a main body and a cantilever extending radially inward from the main body, the cantilever contacting the body of the faceplate.
19. The faceplate of claim 18 , wherein the body comprises aluminum and the support ring comprises aluminum, aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, or stainless steel.
20. The faceplate of claim 18 , further wherein a gap is formed between a radially inward surface of the cantilever and the body of the faceplate.