Substrate processing apparatus and substrate processing method

1. A substrate processing method of processing a substrate having a resist film made of a photosensitive material on one surface, including:

forming a resist pattern on the one surface of the substrate by performing development processing on the resist film by a development process; and

forming a reversal film having etch resistance higher than that of the resist film on the one surface of the substrate by a reversal film former to cover the resist pattern while regulating a temperature of the substrate in a certain range after the development processing is performed by the development processor, wherein the forming a reversal film includes,

regulating a temperature of a rinse liquid in the certain range,

regulating a temperature of a processing liquid made of a material of the reversal film in the certain range,

after the development processing, supplying the rinse liquid, the temperature of which has been regulated, to the one surface of the substrate to replace a development liquid with the rinse liquid and also to form a liquid layer of the rinse liquid on the resist pattern, and

supplying the processing liquid, the temperature of which has been regulated, to the one surface of the substrate with the liquid layer of the rinse liquid kept on the resist pattern, to replace the liquid layer of the rinse liquid with the processing liquid and also to form a liquid layer of the processing liquid on the resist pattern.

2. The substrate processing method according to claim 1 , further including:

forming the reversal film by drying the liquid layer of the processing liquid;

etching the reversal film by a certain thickness to expose an upper surface of the resist pattern; and

forming the etched reversal film as a reversal pattern by removing the resist pattern by etching.

3. The substrate processing method according to claim 1 , wherein

performing the development processing includes performing the development processing by forming a liquid layer of the development liquid on the resist film, and

the forming a liquid layer of the rinse liquid includes, after forming the liquid layer of the development liquid, supplying the rinse liquid, the temperature of which has been regulated, to the one surface of the substrate to replace the liquid layer of the development liquid with the rinse liquid and also to form the liquid layer of the rinse liquid on the resist pattern.

4. The substrate processing method according to claim 1 , wherein the forming a reversal film further includes, after forming the liquid layer of the development liquid, supplying the rinse liquid, the temperature of which has been regulated, to another surface opposite to the one surface of the substrate.

5. The substrate processing method according to claim 1 , wherein the supplying the processing liquid to the one surface of the substrate includes supplying the processing liquid to the one surface of the substrate with the liquid layer of the rinse liquid kept on the resist pattern and with the substrate rotated by a rotation holder.

6. The substrate processing method according to claim 5 , wherein the forming a reversal film further includes, before the processing liquid is supplied to the one surface of the substrate, regulating a rotation speed of the substrate rotated by the rotation holder such that a thickness of the liquid layer of the rinse liquid on the one surface of the substrate is reduced.

7. A substrate processing method of processing a substrate having a resist film made of a photosensitive material on one surface, including:

forming a resist pattern on the one surface of the substrate by performing development processing on the resist film using a development liquid; and

forming a reversal film having etch resistance higher than that of the resist film on the one surface of the substrate to cover the resist pattern while regulating a temperature of the substrate in a certain range after the development processing,

wherein the forming a reversal film includes

regulating a temperature of a processing liquid made of a material of the reversal film in the certain range, and

after the development processing, supplying the processing liquid, the temperature of which has been regulated, to the one surface of the substrate to replace the development liquid with the processing liquid and also to form a liquid layer of the processing liquid on the resist pattern.