Display substrate and manufacture method thereof, display panel

1. A display substrate, comprising:

a substrate, comprising a display region and a non-display region around the display region;

at least one protrusion on the substrate;

a passivation layer on the substrate; and

an encapsulation layer, disposed on a side of the passivation layer that is away from the substrate,

wherein the protrusion is in the non-display region,

the protrusion is between the substrate and the passivation layer, and at least a portion of the passivation layer covers the protrusion,

the substrate of the display region comprises a plurality of pixel regions, at least one organic light emitting member is disposed on the substrate of each of the pixel regions, and the organic light emitting member is between the passivation layer and the encapsulation layer.

2. The display substrate according to claim 1 , wherein

an orthographic projection of the protrusion on the substrate is within an orthographic projection of the encapsulation layer on the substrate.

3. A manufacture method of a display substrate according to claim 1 , comprising:

providing a substrate, the substrate comprising a display region and a non-display region around the display region; and

forming at least one protrusion on the substrate;

wherein the protrusion is formed in the non-display region.

4. The display substrate according to claim 1 , wherein the protrusion is disposed in an annular structure and surrounds the display region,

the protrusion is disposed in an integrated closed annular structure; or,

the protrusion is disposed to comprise at least two protrusion segments that are spaced apart from each other.

5. The display substrate according to claim 1 , further comprising:

a buffer layer, a gate insulating layer, an interlayer insulating layer, a passivation layer and a planarization layer on the substrate;

wherein at least a portion of the protrusion is configured to be in a same layer and made of a same material as the interlayer insulating layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the gate insulating layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the passivation layer;

an orthographic projection of the protrusion on the substrate is within an orthographic projection of the planarization layer on the substrate, and an orthographic projection of the protrusion on the substrate is within an orthographic projection of the buffer layer on the substrate.

6. The display substrate according to claim 1 , further comprising:

a buffer layer, a gate insulating layer, an interlayer insulating layer and a planarization layer on the substrate;

wherein at least a portion of the protrusion is configured to be in a same layer and made of a same material as the interlayer insulating layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the gate insulating layer;

an orthographic projection of the protrusion on the substrate is within an orthographic projection of the planarization layer on the substrate, and an orthographic projection of the protrusion on the substrate is within an orthographic projection of the buffer layer on the substrate.

7. A display panel, comprising the display substrate according to claim 1 .

8. The display substrate according to claim 1 , further comprising:

at least one of a buffer layer, a gate insulating layer, an interlayer insulating layer, a passivation layer and a planarization layer on the substrate,

wherein at least a portion of the protrusion is configured to be in a same layer and made of a same material as the interlayer insulating layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the gate insulating layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the buffer layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the passivation layer; and

an orthographic projection of the protrusion on the substrate is within an orthographic projection of the planarization layer on the substrate.

9. The display substrate according to claim 8 , wherein

a height of the protrusion is 0.2 μm-3 μm in a direction perpendicular to a plane on which the substrate is disposed;

a width of the protrusion is 3 μm-9 μm in a direction parallel to the plane on which the substrate is disposed; and

a spacing distance between two adjacent protrusions is 3 μm-10 μm in the direction parallel to the plane on which the substrate is disposed.

10. The display substrate according to claim 1 , further comprising:

at least one of an interlayer insulating layer, a gate insulating layer and a buffer layer between the passivation layer and the substrate,

wherein at least one protrusion is between the passivation layer and the interlayer insulating layer; and/or

at least one protrusion is between the interlayer insulating layer and the gate insulating layer; and/or

at least one protrusion is between the gate insulating layer and the buffer layer; and/or

at least one protrusion is between the buffer layer and the substrate,

wherein at least a portion of the protrusion is configured to be in a same layer and made of a same material as the interlayer insulating layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the gate insulating layer; and/or

at least a portion of the protrusion is configured to be in a same layer and made of a same material as the buffer layer.

11. The display substrate according to claim 10 , wherein

at least a portion of the protrusion is configured to comprise a stack layer of a first protrusion and a second protrusion;

wherein the first protrusion is configured to be in a same layer and made of a same material as at least one of the interlayer insulating layer, the gate insulating layer and the buffer layer, and the second protrusion is configured as a photoresist material.

12. The display substrate according to claim 10 , wherein

a height of the protrusion is 0.2 μm-3 μm in a direction perpendicular to a plane on which the substrate is disposed; and

a width of the protrusion is 3 μm-9 μm in a direction parallel to the plane on which the substrate is disposed.

13. The display substrate according to claim 10 , wherein on a same layer parallel to the plane on which the substrate is disposed,

the protrusion at least comprises a first protrusion portion and a second protrusion portion that are sequentially disposed around the display region, the first protrusion portion and the second protrusion portion are in a same layer, and the first protrusion portion is disposed inside the second protrusion portion,

wherein a spacing distance between the first protrusion and the second protrusion is 3 μm-10 μm in the direction parallel to the plane on which the substrate is disposed.

14. The display substrate according to claim 10 , wherein in the direction perpendicular to the plane on which the substrate is disposed,

the protrusion at least comprises a first protrusion layer and a second protrusion layer that are in different layers, and the first protrusion layer is between the second protrusion layer and the substrate,

wherein an orthographic projection of the first protrusion layer on the substrate is identical with an orthographic projection of the second protrusion layer on the substrate in a size and a position; or,

a portion of the orthographic projection of the first protrusion layer on the substrate is located outside the orthographic projection of the second protrusion layer on the substrate, and an other portion of the orthographic projection of the first protrusion layer on the substrate is located inside the orthographic projection of the second protrusion layer on the substrate.