IP Library Granted Patent US 11,262,648
Granted Patent B2
US 11,262,648 · App. 16/940,590 · Granted Mar 1, 2022

Pellicle for photomask and method of fabricating the same

Inventors: Mun Ja Kim (Hwaseong-si, KR); Changyoung Jeong (Yongin-si, KR)
Assignee: Samsung Electronics Co., Ltd.
G03F1/62
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Quick Facts
Patent No.
US 11,262,648
App. No.
16/940,590
Granted
Mar 1, 2022
Kind
B2
Abstract

A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane incudes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.

Claims (26)

1. A method of fabricating a pellicle for a photomask, the method comprising:

providing a pellicle membrane; and

transcribing the pellicle membrane onto a frame,

wherein providing the pellicle membrane includes,

forming a base layer having a first surface and a second surface facing the first surface,

coating a first carbon-containing material on the first surface of the base layer, and

performing a first heat treatment process at a first process temperature to form a first recovery layer that is bonded to the base layer,

wherein the first carbon-containing material includes a catecholamine.

2. The method of claim 1 , wherein providing the pellicle membrane further includes:

forming a support layer;

providing the support layer on the second surface of the base layer; and

performing a second heat treatment process at a second process temperature to bond the support layer to the base layer.

3. The method of claim 2 , wherein

the first process temperature is between 900 and 2,000° C., and

the second process temperature is between 100 and 300° C.

4. The method of claim 1 , wherein

the base layer includes one of graphene, graphite, or both graphene and graphite, and

a content of SP3 covalent bonds between carbon atoms contained in the first recovery layer greater than a content of SP3 covalent bonds between carbon atoms contained in the base layer.

5. The method of claim 1 , wherein forming the base layer includes providing vapor of a second carbon-containing material to deposit carbon atoms on a catalytic metal substrate.

6. The method of claim 1 , wherein the base layer includes a first pinhole on the first surface,

wherein coating the first carbon-containing material includes filling the first pinhole with the first carbon-containing material.

7. The method of claim 6 , wherein the base layer further includes a second pinhole on the second surface,

wherein providing the pellicle membrane further includes,

coating a third carbon-containing material on the second surface of the base layer to fill the second pinhole with the third carbon-containing material, and

performing a heat treatment process to form a second recovery layer bonded to the base layer,

wherein the third carbon-containing material includes a catecholamine.

Priority Claims (1)
KR 10-2018-0069205 · Jun 15, 2018 · national
Continuity (2)
Division 16214781 · Dec 10, 2018
Related Publication 20200355995A1 · Nov 12, 2020