Sensor device and etching apparatus having the same
An etching apparatus includes a reaction chamber having an internal space, a fixing chuck disposed in the reaction chamber, an electrostatic chuck disposed on the fixing chuck and on which a wafer is placed, a focus ring surrounding the electrostatic chuck, and a sensor device configured to be transferred into or out of the reaction chamber and placed on the electrostatic chuck. The sensor device includes a body having a plate shape, and a sensor disposed on an upper surface of the body which senses whether the focus ring is worn.
1. An etching apparatus, comprising:
a reaction chamber having an internal space;
a fixing chuck disposed in the reaction chamber;
an electrostatic chuck disposed on the fixing chuck and on which a wafer is placed;
a focus ring surrounding the electrostatic chuck; and
a sensor device configured to be transferred into and out of the reaction chamber and placed on the electrostatic chuck,
wherein the sensor device comprises:
a body having a plate shape;
a sensor disposed on an upper surface of the body which senses whether the focus ring is worn; and
a light source disposed on an upper surface of the sensor,
wherein the sensor device is disposed on an upper surface of the electrostatic chuck, the light source emits light toward the focus ring in a lateral direction, and the sensor provides a sensing signal, which senses whether the focus ring is worn, toward the focus ring in the lateral direction.
2. The etching apparatus according to claim 1 , further comprising:
an elevating member contacting the focus ring which raises and lowers the focus ring.
3. The etching apparatus according to claim 2 , wherein a minimum driving unit of the elevating member is about 0.1 mm or less.
4. The etching apparatus according to claim 1 , wherein the sensor is disposed on an edge portion of the upper surface of the body.
5. The etching apparatus according to claim 4 , wherein the sensor is spaced about 4 cm to about 8 cm apart from the focus ring.
6. The etching apparatus according to claim 1 , wherein the sensor is one of a plurality of sensors disposed in a circumferential direction, and the sensor is a vision sensor or an image sensor.
7. The etching apparatus according to claim 6 , wherein a resolution of the sensor is about 0.1 mm or less.
8. The etching apparatus according to claim 1 , further comprising:
a plurality of recognition bands formed on an inner surface of the reaction chamber and opposing the sensor.
9. The etching apparatus according to claim 1 , further comprising:
a plurality of recognition bands formed on an inner surface of the focus ring.
10. The etching apparatus according to claim 1 , wherein the sensor device further comprises a lift pin sensing sensor which senses a state of a lift pin provided on the electrostatic chuck.
11. The etching apparatus according to claim 1 , wherein the sensor device further comprises a gravity sensor which senses a gradient of the body, and which is disposed in a central portion of the body.
12. The etching apparatus according to claim 1 , wherein the sensor device further comprises a wireless transceiver mounted on the body.
13. The etching apparatus according to claim 12 , wherein the wireless transceiver is in communication with the sensor and a controller.
14. The etching apparatus according to claim 13 , further comprising:
an elevating member contacting the focus ring which raises and lowers the focus ring,
wherein the controller raises and lowers the elevating member depending on an amount of wear of the focus ring sensed by the sensor.
15. The etching apparatus according to claim 1 , wherein the sensor device further comprises a calibrated sight disposed in front of the sensor.
16. An etching apparatus, comprising:
a reaction chamber having an internal space;
a fixing chuck disposed in the reaction chamber;
an electrostatic chuck disposed on the fixing chuck and on which a wafer or a sensor device is placed;
a focus ring disposed on an edge of the electrostatic chuck;
a sensor device configured to be transferred into and out of the reaction chamber; and
an elevating member which raises and lowers the focus ring,
wherein the sensor device comprises:
a body having a shape corresponding to a shape of the wafer;
a sensor installed on the body which obtains an image of the focus ring; and
a light source disposed on an upper surface of the sensor,
wherein the sensor device is disposed on an upper surface of the electrostatic chuck, the light source emits light toward the focus ring in a lateral direction, and the sensor obtains the image of the focus ring from the lateral direction.
17. The etching apparatus according to claim 16 , further comprising:
a controller connected to the sensor device and the elevating member, wherein the controller raises and lowers the elevating member depending on a signal received from the sensor device.
18. The etching apparatus according to claim 17 , wherein the controller calculates an amount of change in a thickness of the focus ring.