Semiconductor device and semiconductor device fabrication method
A semiconductor device, including a semiconductor element, and a first wiring member and a second wiring member bonded to each other and being electrically connected to the semiconductor element. The first wiring member has an irradiation area for receiving irradiation of a laser beam. The semiconductor device also includes a protection member disposed on an area of the second wiring member opposite the irradiation area of the first wiring member, the protection member having a melting point higher than a melting point of at least one of the first wiring member and the second wiring member including the area on which the protection member is disposed.
1. A semiconductor device comprising:
a semiconductor element;
a first wiring member and a second wiring member bonded to each other and being electrically connected to the semiconductor element, the first wiring member having an irradiation area for receiving irradiation of a laser beam; and
a protection member disposed on an area of the second wiring member opposite the irradiation area of the first wiring member, the protection member having a melting point higher than a melting point of at least one of the first wiring member and the second wiring member including the area on which the protection member is disposed.
2. The semiconductor device according to claim 1 , wherein:
the second wiring member is bonded to the first wiring member at a bonding plane;
the irradiation area is on a first principal plane of the first wiring member opposite the bonding plane; and
the area on which the protection member is disposed is on a second principal plane of the second wiring member opposite the bonding plane.
3. The semiconductor device according to claim 2 , wherein one or more wiring members are laminated between the first wiring member and the second wiring member.
4. The semiconductor device according to claim 1 , wherein:
the second wiring member is bonded to the first wiring member at a bonding plane;
the irradiation area of the first wiring member is on one end portion of the first wiring member corresponding to one end portion of the second wiring member perpendicular to the bonding plane; and
the area on which the protection member is disposed is on another end portion of the second wiring member opposite the irradiation area.
5. The semiconductor device according to claim 1 , wherein the protection member is made of cobalt, titanium, platinum, chromium, molybdenum, tantalum, tungsten, niobium, an alloy containing at least one of cobalt, titanium, platinum, chromium, molybdenum, tantalum, tungsten, and niobium, or a ceramic material.
6. The semiconductor device according to claim 5 , wherein the ceramic material is aluminum oxide, zirconium oxide, silicon oxide, silicon carbide, boron carbide, tungsten carbide, tantalum carbide, aluminum nitride, silicon nitride, titanium nitride, or tantalum nitride.
7. The semiconductor device according to claim 1 , wherein the protection member is disposed on the first wiring member and the second wiring member bonded together, with a bonding member therebetween.
8. The semiconductor device according to claim 1 , wherein the first wiring member and the second wiring member are made of copper, aluminum, an alloy containing at least one of copper and aluminum, or stainless steel.
9. The semiconductor device according to claim 1 , wherein a difference in melting point between the at least one of the first wiring member and the second wiring member and the protection member is 500° C. or more.
10. A semiconductor device fabrication method comprising:
preparing a semiconductor element, a first wiring member, a second wiring member, and a protection member having a melting point higher than a melting point of the second wiring member;
before placing the first wiring member over the second wiring member and irradiating a laser beam thereto, ascertaining an irradiation area on the first wiring member for receiving the irradiation, and a protection area on the second wiring member, and disposing the protection member on the protection area;
electrically connecting the semiconductor element and at least one of the first wiring member and the second wiring member;
placing the first wiring member over the second wiring member, the protection area of the second wiring member opposite to the irradiation area of the first wiring member; and
irradiating the irradiation area with the laser beam.
11. The semiconductor device fabrication method according to claim 10 , wherein the protection area of the second wiring member is reachable by the laser beam irradiated at the irradiation area of the first wiring member.