IP Library Granted Patent US 11,267,729
Granted Patent B2
US 11,267,729 · App. 16/617,455 · Granted Mar 8, 2022

In-liquid plasma generation device and liquid treatment apparatus

Inventors: Akira Horikoshi (Kyoto, JP); Shohei Nakamura (Kyoto, JP); Shigeru Takatsuji (Kyoto, JP); Motohiro Kono (Kyoto, JP)
Assignee: SCREEN HOLDINGS CO., LTD.
C02F1/4608B01J19/087B01J2219/0877B01J2219/0894
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Quick Facts
Patent No.
US 11,267,729
App. No.
16/617,455
Granted
Mar 8, 2022
Kind
B2
Abstract

An in-liquid plasma generation device includes a housing which holds a liquid in an internal space, a gas supply tube which includes an opening in the internal space and discharges a gas into the liquid through the opening, a first electrode which has projecting part projecting into the internal space via the opening from inside of the gas supply tube, the projecting part including a conductor covered by a dielectric, a second electrode which surrounds the projecting part of the first electrode and includes a conductor isolated from the liquid by a dielectric, and a voltage applier which applies a voltage to between the first electrode and the second electrode. A space between the projecting part and the second electrode is a flow passage in which the gas discharged from the opening flows.

Claims (25)

1. An in-liquid plasma generation device, comprising:

a housing which holds a liquid in an internal space;

a gas supply tube which includes an opening in the internal space and discharges a gas into the liquid through the opening;

a first electrode which has projecting part projecting into the internal space via the opening from inside of the gas supply tube, the projecting part including a conductor covered by a dielectric;

a second electrode which surrounds the projecting part of the first electrode and includes a conductor isolated from the liquid by a dielectric; and

a voltage applier which applies a voltage to between the first electrode and the second electrode, wherein

the projecting part and the second electrode form a flow passage in which the gas discharged from the opening flows at a space therebetween.

2. The in-liquid plasma generation device according to claim 1 , wherein the opening is open upward, the projecting part projects upward from the opening and the conductor of the second electrode laterally surrounds the projecting part.

3. The in-liquid plasma generation device according to claim 2 , wherein in a plan view, the projecting part is located inside the opening and the second electrode surrounds the opening.

4. The in-liquid plasma generation device according to claim 1 , wherein in a side view, the projecting part and the second electrode at least partially overlap each other.

5. The in-liquid plasma generation device according to claim 1 , wherein the first electrode includes a rod-like body extending along a cylinder axis of the gas supply tube and a space between a side surface of the rod-like body and an inner side surface of the gas supply tube serves as the flow passage of the gas.

6. The in-liquid plasma generation device according to claim 1 , wherein

the housing includes a cylindrical body made of a dielectric, the gas supply tube is provided coaxially with the cylindrical body inside the cylindrical body, and the liquid is held in a space between an inner side surface of the cylindrical body and the gas supply tube.

7. The in-liquid plasma generation device according to claim 1 , wherein the housing includes a cylindrical body made of a dielectric and the second electrode is provided on an outer peripheral surface of the cylindrical body.

8. The in-liquid plasma generation device according to claim 6 , wherein the conductor of the second electrode is an annular conductor surrounding the outer peripheral surface of the cylindrical body.

9. The in-liquid plasma generation device according to claim 7 , wherein the conductor of the second electrode is an annular conductor surrounding the outer peripheral surface of the cylindrical body.

10. The in-liquid plasma generation device according to claim 1 , wherein the first electrode, the gas supply tube, the cylindrical body and the second electrode are arranged coaxially with a vertical axis.

11. The in-liquid plasma generation device according to claim 1 , wherein the housing includes:

an inlet for introducing the liquid into the internal space below the projecting part; and

an outlet for delivering the liquid to outside above the projecting part.

12. A liquid treatment apparatus for generating a treatment liquid containing an active species, comprising:

the in-liquid plasma generation device according to claim 11 ;

a liquid supplier which supplies the liquid to the inlet; and

a reservoir which stores the liquid delivered from the outlet.

13. The liquid treatment apparatus according to claim 12 , wherein the liquid supplier supplies the liquid stored in the reservoir to the inlet.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 28, 2020
From: HORIKOSHI, AKIRA; NAKAMURA, SHOHEI; TAKATSUJI, SHIGERU; KONO, MOTOHIRO
To: SCREEN HOLDINGS CO., LTD.
Reel/Frame 053330/0460 →
Priority Claims (2)
JP JP2017-108021 · May 31, 2017 · national
JP JP2018-097043 · May 21, 2018 · national
Continuity (1)
Related Publication 20200407247A1 · Dec 31, 2020