Device and method for determining the concentration of a vapor
A device for determining the partial pressure or the concentration of a steam in a volume, includes a sensor body that can be oscillated. The temperature of the sensor body can be controlled to a temperature below the condensation temperature of the steam, and the oscillation frequency of the sensor body is influenced by a mass accumulation of the condensed steam on a surface of the sensor body. Means are provided for generating a gas flow from the sensor surface in the direction of the volume through a steam transport channel that adjoins a window to the volume. In order to increase the maximum service life of the sensor body, the means for generating a gas flow has a slit nozzle designed as an annular channel.
1. A device for determining a partial pressure or a concentration of a vapor in a volume ( 2 ), the device comprising:
a sensor body ( 5 ) configured to be brought into oscillation, the sensor body having a temperature that is controllable to a temperature below the condensation temperature of the vapor, and an oscillation frequency that is influenced by an accumulated mass formed by the vapor condensing on a sensor surface ( 6 ) of the sensor body ( 5 ), wherein a vapor transport channel ( 20 ) adjoins a window ( 3 ) to the volume ( 2 ), through which the vapor diffuses in a direction of transport (T) towards the sensor surface ( 6 ); and
an annular channel ( 16 ) that forms a wide slit nozzle through which a gas flow is generated, the gas flow flowing from the sensor surface ( 6 ) towards the vapor transport channel ( 20 ) in a direction counter to the direction of transport (T) of the diffusion of the vapor.
2. The device of claim 1 , wherein the annular channel ( 16 ) is provided in an immediate vicinity of the sensor body ( 5 ).
3. Device A for determining a partial pressure or a concentration of a vapor in a volume ( 2 ), the device comprising:
a sensor body ( 5 ) that is configured to be brought into oscillation, sensor body ( 5 ) having a temperature that is controllable to a temperature below a condensation temperature of the vapor, and an oscillation frequency that is influenced by an accumulated mass formed by the vapor condensing on a sensor surface ( 6 ) of the sensor body ( 5 );
a pipe stub ( 17 ) surrounding a vapor transport channel ( 20 ), wherein at a first end of the pipe stub ( 17 ), the pipe stub ( 17 ) adjoins a window ( 3 ) to the volume ( 2 ) and at a second end of the pipe stub ( 17 ), the pipe stub ( 17 ) is spaced apart from the sensor surface ( 6 ) by a gap; and
flow generating means configured to generate a gas flow that is fed through the gap and into the vapor transport channel ( 20 ).
4. The device of claim 1 , wherein the volume ( 2 ) is formed by a vapor transport line ( 1 ) through which the vapor is transported by means of a carrier gas.
5. The device of claim 1 , wherein the volume ( 2 ) is formed by a process chamber of a coating device.
6. A method for determining a partial pressure or a concentration of a vapor in a volume ( 2 ), the method comprising:
oscillating a sensor body ( 5 ) at an oscillation frequency;
controlling a temperature of the sensor body ( 5 ) to a temperature below a condensation temperature of the vapor;
diffusing, in a direction of transport (T), the vapor through a vapor transport channel ( 20 ) to reach a sensor surface ( 6 ) of the sensor body ( 5 )
condensing the vapor on the sensor surface ( 6 );
as a result of the vapor condensing on the sensor surface ( 6 ), forming an accumulated mass on the sensor surface, the accumulated mass influencing the oscillation frequency of the sensor body ( 5 );
feeding a gas flow in from an edge of the sensor surface ( 6 ) in a direction towards a center of the sensor surface ( 6 ); and
flowing the gas flow counter to the direction of transport (T) through the vapor transport channel ( 20 ) and into the volume ( 2 ).
7. The method of claim 6 , wherein the gas flow is fed through a gap between an edge of a pipe stub ( 17 ) bounding the vapor transport channel ( 20 ), and the edge of the sensor surface ( 6 ).
8. The method of claim 6 , wherein the volume ( 2 ) is formed by a vapor transport line ( 1 ), through which the vapor is transported by means of a carrier gas.
9. The method of claim 6 , wherein an average transport velocity of the vapor through the vapor transport channel ( 20 ) towards the sensor surface ( 6 ) is adjusted by adjusting a flow velocity of the gas flow.
10. The device of claim 2 , wherein the volume ( 2 ) is formed by a vapor transport line ( 1 ) through which the vapor is transported by means of a carrier gas.
11. The device of claim 2 , wherein the volume ( 2 ) is formed by a process chamber of a coating device.