Multi-layer protective coating
Methods and apparatus for preparing a protective coating are described. In one example aspect, an apparatus for preparing a protective coating includes a chamber, a substrate positioned within the chamber configured to hold at least a target object, an inlet pipe configured to direct a monomer vapor into the chamber, and one or more electrodes configured to perform a chemical vapor deposition process to produce a multi-layer coating. The chemical vapor deposition process comprises multiple cycles, each cycle comprising a pretreatment phase and a coating phase to produce a layer of the multi-layer coating.
1. An apparatus for preparing a protective coating, comprising:
a chamber;
a movable substrate positioned within the chamber configured to hold at least a target object;
a motor coupled to the movable substrate configured to drive a movement of the movable substrate;
an inlet pipe configured to direct a monomer vapor into the chamber;
one or more electrodes each positioned substantially perpendicular to the movable substrate to enclose the movable substrate; and
a controller coupled to the one or more electrodes, wherein the controller is structurally and/or programmably configured to control the one or more electrodes to perform a chemical vapor deposition process to produce a multi-layer coating, wherein the chemical vapor deposition process comprises multiple cycles, each cycle comprising a pretreatment phase and a coating phase to produce a layer of the multi-layer coating,
wherein the controller is configured to control one or more electrodes to, for a first cycle of the multiple cycles,
apply, in the pretreatment phase, a first type of a discharge at a first power level to for a first time duration, and
apply, in the coating phase, a second type of a discharge at a second power level for a second time duration to produce a first layer of coating having a first density, the second power level being lower than the first power level, and
wherein the controller is further configured to adjust at least one of the second type of the discharge or the second power level in a second cycle of the multiple cycles to produce a second layer having a different density.
2. The apparatus of claim 1 , wherein the one or more electrodes are further configured to adjust the second time duration in a third cycle of the multiple cycles to produce a third layer having a different thickness.
3. The apparatus of claim 1 , wherein the one or more electrodes are configured to adjust the first power level in the pretreatment phase in each cycle based on a surface characteristic of the target object or a previous layer of the multi-layer coating.
4. The apparatus of claim 1 , wherein the one or more electrodes are configured to adjust, based on a protection requirement, at least one of the first type of discharge, the second type of discharge, the first power level, the second power level, the first time duration, or the second time durations, the protection requirement including at least one of water-resistance, moisture-resistance, fugus-resistance, thermal-resistance, or corrosion-resistance.
5. The apparatus of claim 1 , wherein the discharge applied in the chemical deposition process comprises a radio frequency discharge, a microwave discharge, an intermediate frequency discharge, a high frequency discharge, or a spark discharge.
6. The apparatus of claim 1 , wherein the first type of discharge comprises a continuous discharge, and wherein the first type of discharge is applied at a power level in a range of 120 to 400 W and for a time duration between 60 to 900 seconds in the pretreatment phase.
7. The apparatus of claim 1 , wherein the second type of discharge comprises a continuous discharge.
8. The apparatus of claim 1 , wherein the second type of discharge comprises a pulse discharge that has a duty cycle between 1/800 and 1, wherein the pulse discharge is applied at a pulse frequency between 1 to 100 Hz.
9. The apparatus of claim 1 , wherein the second discharge includes a periodic alternating discharge applied at an alternating frequency is between 1 to 1000 Hz.
10. The apparatus of claim 1 , further comprising:
an exhaust pipe configured to reduce a pressure in the chamber at between 10 to 200 millitorr.
11. The apparatus of claim 1 , further comprising:
a second inlet pipe configured to direct an inert gas into the chamber.
12. The apparatus of claim 1 , wherein the monomer vapor includes a mixture of two monofunctional unsaturated fluorocarbon resins and two polyfunctional unsaturated hydrocarbon derivatives.
13. The apparatus of claim 1 , wherein the target object comprises at least a sensor, a circuit board, a mobile phone, a display screen, or a hearing aid.
14. The apparatus of claim 1 , wherein the one or more electrodes are circular.