IP Library Granted Patent US 11,274,971
Granted Patent B2
US 11,274,971 · App. 16/726,917 · Granted Mar 15, 2022

Temperature sensor

Inventors: Zhong Tang (Hangzhou, CN); Zheng Shi (Hangzhou, CN); Weiwei Pan (Hangzhou, CN); Zhenyan Huang (Hangzhou, CN)
Assignee: Semitronix Corporation
G01K7/01G01K15/005H03K19/08H03K19/173H03K19/20
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Quick Facts
Patent No.
US 11,274,971
App. No.
16/726,917
Granted
Mar 15, 2022
Kind
B2
Abstract

A temperature sensor includes a NAND gate and a plurality of delay units. The NAND gate includes a first and a second input terminals, and an output terminal. The first input terminal is configured to receive an external starting control signal. The plurality of delay units are connected in series. An input end of the first delay unit is connected to the output terminal of the NAND gate. An output end of the last delay unit is connected to the second input terminal of the NAND gate, thereby forming a ring oscillator structure. The temperature sensor can realize conversion of temperature-leakage-frequency based on the ring oscillator structure in a temperature range of −40˜125° C., thereby simplifying design complexity and achieves high accuracy.

Claims (73)

1. A temperature sensor comprising:

a NAND gate; and

K delay units;

wherein:

the NAND gate comprises a first and a second input terminals and an output terminal;

the first input terminal is coupled to an external starting control signal;

the K delay units are connected in series;

an input end of the first delay unit is connected to the output terminal of the NAND gate;

an output end of a last delay unit among the K delay units is connected to the second input terminal of the NAND gate;

K is an even number greater than 0;

each delay unit comprises n stage inverters in series, wherein n is an odd number greater than 1;

for each delay unit, an output end of a former stage inverter is connected with an input end of a latter stage inverter, each stage inverter is connected with a PMOS transistor and an NMOS transistor to control the each stage inverter in an on-state or an off-state, wherein the PMOS transistor and the NMOS transistor connected with an i-th stage inverter are referred to as M Pi and M Ni , respectively; and

a source end of the M Ni is connected to GND, a drain end of the M Ni is connected to the i-th stage inverter, a gate electrode of the M Ni is connected to a signal line V Ni , a drain end of the M Pi is connected to the i-th stage inverter, a source end of the M Pi is connected to a power supply, a gate electrode of the M Pi is connected to a signal line V Pi , and a substrate end of the M Pi is connected to a signal line V PB .

2. The temperature sensor of claim 1 , wherein every delay unit of the temperature sensor has a same number of inverters.

3. The temperature sensor of claim 2 , wherein gate electrodes of same stage NMOS transistors in the delay units are connected to one signal line, and the signal line V Ni with same value of i in all delay units are controlled with a same signal line.

4. The temperature sensor of claim 2 , wherein gate electrodes of same stage PMOS transistors in the delay units are connected to one signal line, and the signal lines V Pi with the same value of i in all delay units are controlled with a same signal line.

5. A method for supply voltage measurement with the temperature sensor of claim 1 , comprising controlling the temperature sensor in a voltage-mode and obtaining a supply voltage through measuring an output frequency of the temperature sensor;

wherein:

the voltage-mode refers to: controlling all the PMOS transistors and NMOS transistors in each delay unit of the temperature sensor to be in on-state.

6. A method for temperature measurement calibration with the temperature sensor of claim 1 , wherein in a voltage-mode, the method comprises measuring an output frequency of the temperature sensor to obtain the supply voltage, and the supply voltage is configured for calibration of temperature measurement in P-mode or N-mode.

7. A method for supplying voltage calibration with the temperature sensor of claim 1 , comprising:

obtaining temperature values in P-mode and N-mode respectively; and

calibrating voltage measurement in a voltage mode with the temperature values measured in the P-mode and/or the N-mode.

8. A method for process corner evaluation with the temperature sensor of claim 1 , comprising:

applying a known voltage to the temperature sensor;

control the temperature sensor in a voltage-mode; and

evaluating process corners through an output distribution of different chips.

9. A test system comprising the temperature sensor of claim 1 , wherein the temperature sensor is configured to monitor a temperature of the test system.

10. The test system of claim 9 , further comprising a device or chip undergoing heat management.

11. The test system of claim 9 , further comprising a device or chip undergoing supply voltage measurement.

12. The test system of claim 9 , further comprising a device or chip for evaluating process corners.

13. A method for temperature measurement with a temperature sensor,

the temperature sensor comprising:

a NAND gate; and

K delay units;

wherein:

the NAND gate comprises a first and a second input terminals and an output terminal;

the first input terminal is coupled to an external starting control signal;

the K delay units are connected in series;

an input end of the first delay unit is connected to the output terminal of the NAND gate;

an output end of a last delay unit among the K delay units is connected to the second input terminal of the NAND gate;

K is an even number greater than 0;

each delay unit comprises n stage inverters in series, wherein n is an odd number greater than 1;

each stage inverter is connected with a PMOS transistor and an NMOS transistor to control the each stage inverter in an on-state or an off-state; and

the method comprising:

an output frequency of the temperature sensor in P-mode or N-mode is measured to obtain a temperature value; wherein:

the P-mode refers to: for the temperature sensor, the NMOS transistors in each delay unit are in on-state, one of the PMOS transistors in each delay unit is in off-state, and the other PMOS transistors in each delay unit are in on-state; and

the N-mode refers to: for the temperature sensor, the PMOS transistors in each delay unit are in on-state, and one of the NMOS transistors in each delay unit is in off-state, and the other NMOS transistors in each delay unit are in on-state.

14. The method for temperature measurement of claim 4 , wherein inverters of the K delay units functioning in leakage states are same stage inverters.

15. The method for temperature measurement of claim 13 , wherein a measuring procedure of the P-mode further comprises:

P1, for each delay unit of the temperature sensor, control all the NMOS transistors in on-state, one of the PMOS transistors M Pi in off-state, and the other PMOS transistors in on-state, then measure the temperature value T Pi through the temperature sensor;

P2, repeat the P1 step with traversing the value of variable i, and a corresponding temperature value T Pi is obtained respectively, i is an integer and i∈[1, n];

P3, take an average value of the temperature value T Pi as a final value of temperature.

16. The method for temperature measurement of claim 13 , wherein a measuring procedure of N-mode further comprises:

N1, for each delay unit of the temperature sensor, control all the PMOS transistors in on-state, one of the NMOS transistors M Ni in off-state, and the other NMOS transistors in on-state, then measure the temperature value T Ni through the temperature sensor;

N2, repeat the N1 step with traversing the value of variable i, and the corresponding temperature value T Ni can be obtained respectively, i is an integer and i∈[1, n];

N3, take an average value of the temperature value T Ni as a final value of temperature.

17. An apparatus comprising a temperature sensor, wherein

the temperature sensor comprises:

a NAND gate; and

K delay units;

wherein:

the NAND gate comprises a first and a second input terminals and an output terminal;

the first input terminal is coupled to an external starting control signal;

the K delay units are connected in series;

an input end of the first delay unit is connected to the output terminal of the NAND gate;

an output end of a last delay unit among the K delay units is connected to the second input terminal of the NAND gate;

K is an even number greater than 0;

each delay unit comprises n stage inverters in series, wherein n is an odd number greater than 1;

each stage inverter is connected with a PMOS transistor and an NMOS transistor to control the each stage inverter in an on-state or an off-state; and

the temperature sensor is configured to realize conversion from temperature to current based on a relationship between leakage current of MOS transistors and temperature, and further realize conversion from current to frequency based on a ring oscillator structure, so as to realize digital output of temperature measurement.

18. The apparatus of claim 17 , wherein the temperature sensor is configured to function in a temperature range of −40˜125° C. and under a digital power supply of less than 1V, having an accuracy of better than 2° C.

19. The apparatus of claim 17 , wherein the temperature sensor is an all-digital, reconfigurable temperature sensor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 25, 2019
From: TANG, ZHONG; SHI, ZHENG; PAN, WEIWEI; HUANG, ZHENYAN
To: SEMITRONIX CORPORATION
Reel/Frame 051364/0742 →
Priority Claims (1)
CN 201811601285.9 · Dec 26, 2018 · national
Continuity (1)
Related Publication 20200209070A1 · Jul 2, 2020