IP Library › Granted Patent US 11,276,665
Granted Patent B2
US 11,276,665 · App. 16/546,600 · Granted Mar 15, 2022

Laser reflow apparatus and method for electronic components with micron-class thickness

Inventors: Nam Seong Kim (Anyang-si, KR); Jae Joon Choi (Gwangju-si, KR)
Assignee: LASERSSEL CO., LTD.
H01L24/81B23K1/0056B23K3/00B23K26/0608B23K26/073B23K26/354H01L22/26H01L24/75H01L2224/7592H01L2224/75263H01L2224/81224H01L2224/81815H01L2224/81908
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Quick Facts
Patent No.
US 11,276,665
App. No.
16/546,600
Granted
Mar 15, 2022
Kind
B2
Abstract

Provided is a laser reflow apparatus for reflowing electronic components on a substrate disposed on a stage, the apparatus including: a laser emission unit comprised of a plurality of laser modules for emitting a laser beam having a flat top output profile in at least one section of the substrate on which the electronic components are disposed; a camera unit comprising at least one camera module for capturing a reflowing process of the electronic components performed by the laser beam; and a laser output control unit configured to generate a control signal for independently controlling the respective laser modules of the laser emission unit based on a signal output from the camera unit and apply the control signal to the laser emission unit.

Claims (17)

1. A laser reflow apparatus for reflowing electronic components on a substrate disposed on a stage, the apparatus comprising:

a laser emission unit comprised of a plurality of laser modules for emitting a laser beam having a flat top output profile in at least one section of the substrate on which the electronic components are disposed; and

a camera unit comprising at least one camera configured to capture a reflowing process of the electronic components performed by the laser beam,

wherein each of the plurality of laser modules of the laser emission unit is configured to be independently controlled by a control signal, the control signal being generated based on a signal output from the camera and applied to the laser emission unit,

wherein each of the plurality of laser modules has an equal maximum output, and is configured to emit a laser beam equal in beam shape, beam area and emission area,

wherein the plurality of laser modules are arranged in a symmetrical manner each other about the at least one section of the substrate so that the laser beams emitted from the plurality of laser modules are superposed with one another on the at least one section of the substrate, and

wherein the superposed laser beams provide flat superposition to improve flatness of the laser beams in terms of spatial beam intensity in a large portion of the emission area.

2. The apparatus according to claim 1 , wherein each laser beam has an equal wavelength.

3. The apparatus according to claim 2 , wherein the plurality of laser modules have an equal beam emission angle.

4. A laser reflow method for reflowing electronic components on a substrate disposed on a stage by using a laser emission unit comprised of a plurality of laser modules, the method comprising:

emitting, by each of the plurality of laser modules, a laser beam to a section of the substrate on which the electronic components are disposed;

capturing, by at least one camera, a reflowing process of the electronic components performed by the laser beam; and

generating a control signal for independently controlling each of the plurality of laser modules of the laser emission unit based on a signal output from the camera and applying the control signal to the laser emission unit,

wherein each of the laser modules has an equal maximum output, and emits a laser beam equal in beam shape, beam area and emission area,

wherein the plurality of laser modules are arranged in a symmetrical manner each other about the section of the substrate so that the laser beams emitted from the plurality of laser modules are superposed with one another on the section of the substrate, and

wherein the superposed laser beams provide flat superposition to improve flatness of the laser beams in terms of spatial beam intensity in a large portion of the emission area.

5. The method according to claim 4 , wherein the emitting of a laser beam is performed with each laser beam having an equal wavelength.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 21, 2019
From: KIM, NAM SEONG; CHOI, JAE JOON
To: LASERSSEL CO., LTD.
Reel/Frame 050116/0001 →
Priority Claims (1)
KR 10-2018-0111572 · Sep 18, 2018 · national
Continuity (1)
Related Publication 20200091108A1 · Mar 19, 2020
Cited By (1)
US 12,715,073