Coding distance topologies for structured light patterns for 3D reconstruction
Methods, systems, and devices for 3D measurement and/or pattern generation are provided in accordance with various embodiments. Some embodiments include a method of pattern projection that may include projecting one or more patterns. Each pattern from the one or more patterns may include an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement. Some embodiments further include: illuminating an object using the one or more projected patterns; collecting one or more images of the illuminated object; and/or computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.
1. A system for 3D measurement comprising:
a pattern projector that emits one or more patterns, wherein each pattern from the one or more patterns includes an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement and each symbol in the arrangement includes one or more dots;
an imager; and
a processor configured to estimate one or more 3D locations on an object based on at least:
illuminating the object using the one or more patterns projected from the pattern projector;
collecting one or more images of the illuminated object using the imager; and
computing the one or more 3D locations on the object based on the one or more projected patterns and the one or more collected images.
2. The system for 3D measurement of claim 1 , wherein the one or more dots include at least one or more dots that are on or one or more dots that are off.
3. The system for 3D measurement of claim 1 , wherein the one or more dots include a plurality of dots arranged in at least a plurality of rows or a plurality of columns.
4. The system for 3D measurement of claim 1 , wherein each symbol is modulated by a corresponding binary codeword.
5. The system for 3D measurement of claim 1 , wherein each symbol from the arrangement of three or more symbols is unique with respect to the other symbols in the arrangement of three or more symbols.
6. A pattern projection device comprising:
one or more pattern generators that emit one or more patterns, wherein each pattern from the one or more patterns includes an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement and each symbol in the arrangement includes one or more dots.
7. The pattern projection device of claim 6 , wherein the one or more dots include at least one or more dots that are on or one or more dots that are off.
8. The pattern projection device of claim 6 , wherein the one or more dots include a plurality of dots arranged in at least a plurality of rows or a plurality of columns.
9. The pattern projection device of claim 6 , wherein each symbol is modulated by a corresponding binary codeword.
10. The pattern projection device of claim 6 , wherein each symbol from the arrangement of three or more symbols is unique with respect to the other symbols in the arrangement of three or more symbols.
11. A method of pattern projection comprising:
projecting one or more patterns, wherein each pattern from the one or more patterns includes an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement and each symbol in the arrangement includes one or more dots.
12. The method of pattern projection of claim 11 , further comprising:
illuminating an object using the one or more projected patterns;
collecting one or more images of the illuminated object; and
computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.
13. The method of pattern projection of claim 11 , wherein the one or more dots include at least one or more dots that are on or one or more dots that are off.
14. The method of pattern projection of claim 11 , wherein the one or more dots include a plurality of dots arranged in at least a plurality of rows or a plurality of columns.
15. The method of pattern projection of claim 11 , wherein each symbol is modulated by a corresponding binary codeword.
16. The method of pattern projection of claim 11 , wherein each symbol from the arrangement of three or more symbols is unique with respect to the other symbols in the arrangement of three or more symbols.
17. The method of pattern projection of claim 11 , wherein each symbol in the arrangement that includes one or more dots is arranged in a rectangular lattice.
18. The method of pattern projection of claim 11 , wherein each symbol in the arrangement that includes one or more dots is arranged in at least a hexagonal lattice or with irregular spacings.
19. The method of pattern projection of claim 11 , wherein each symbol in the arrangement that includes one or more dots is configured such that a spatial configuration of each symbol in the arrangement varies from a spatial configuration of the other symbols in the arrangement.
20. The method of pattern projection of claim 12 , wherein collecting the one or more images of the illuminated object includes one or more regions of at least one of the one or more patterns that is missing from the one or more images.
21. The method of pattern projection of claim 12 , further comprising measuring and storing one or more illumination angles of each of the one or more dots.
22. The method of pattern projection of claim 12 , further comprising measuring one or more detection angles of each of the one or more dots.