Low-K feature formation processes and structures formed thereby
Semiconductor device structures having low-k features and methods of forming low-k features are described herein. Some examples relate to a surface modification layer, which may protect a low-k feature during subsequent processing. Some examples relate to gate spacers that include a low-k feature. Some examples relate to a low-k contact etch stop layer. Example methods are described for forming such features.
1. A method comprising:
forming a low-k layer using an Atomic Layer Deposition (ALD) process, the ALD process comprising:
pulsing a silicon precursor onto a gate structure a first plurality of times;
pulsing a carbon precursor onto the gate structure a second plurality of times;
pulsing an oxygen precursor onto the gate structure a third plurality of times, at least two of the pulsing the oxygen precursors being performed at different flow rates; and
pulsing a nitrogen precursor onto the gate structure a fourth plurality of times, at least two of the pulsing the nitrogen precursors being performed at different flow rates; and
etching the low-k layer to form a spacer.
2. The method of claim 1 , wherein a concentration of nitrogen is less than 10 atomic percent of the low-k layer.
3. The method of claim 1 , wherein a concentration of carbon is less than 5 atomic percent of the low-k layer.
4. The method of claim 1 , wherein the low-k layer is formed along a sidewall of a gate stack, and wherein the etching the low-k layer comprising anisotropically etching the low-k layer.
5. The method of claim 4 , further comprising forming a surface modification layer along the sidewall of the gate stack, the low-k layer being formed on the surface modification layer, the surface modification layer being disposed between the gate stack and the low-k layer, a second concentration of nitrogen in the surface modification layer increasing in a direction from the gate stack to the low-k layer, wherein the etching the low-k layer further comprises anisotropically etching the surface modification layer, the spacer comprising respective portions of the low-k layer and the surface modification layer.
6. The method of claim 1 , wherein the low-k layer is SiOC.
7. A method comprising:
forming a low-k layer using an Atomic Layer Deposition (ALD) process, the low-k layer having a concentration of oxygen, a first concentration of nitrogen, and a concentration of carbon, the concentration of oxygen being greater than the first concentration of nitrogen, the first concentration of nitrogen being greater than the concentration of carbon, the ALD process comprising:
for a cycle, flowing a carbon source precursor having an R functional group; and
repeating the cycle a number of times.
8. The method of claim 7 , wherein:
the first concentration of nitrogen is less than 10 atomic percent of the low-k layer; and
the concentration of carbon is less than 5 atomic percent of the low-k layer.
9. The method of claim 7 , wherein the low-k layer is formed along a sidewall of a gate stack, and further comprising forming a gate spacer along the sidewall of the gate stack comprising anisotropically etching the low-k layer.
10. The method of claim 9 further comprising forming a surface modification layer along the sidewall of the gate stack, the low-k layer being formed on the surface modification layer, the surface modification layer being disposed between the gate stack and the low-k layer, a second concentration of nitrogen in the surface modification layer increasing in a direction from the gate stack to the low-k layer, wherein forming the gate spacer further comprises anisotropically etching the surface modification layer, the gate spacer comprising respective portions of the low-k layer and the surface modification layer.
11. The method of claim 7 , wherein:
the ALD process further comprises, for the cycle:
flowing a silicon source precursor;
and flowing an oxygen source precursor.
12. The method of claim 11 , wherein:
the silicon source precursor is Si 2 Cl 6 ;
the carbon source precursor is C 6 H 15 N; and
the oxygen source precursor is O 2 .
13. The method of claim 7 , wherein the low-k layer is SiOC.
14. The method of claim 7 , wherein the number of times is between one time and one hundred and fifty times.
15. A method comprising:
forming a low-k layer using an Atomic Layer Deposition (ALD) process, the ALD process comprising:
individually pulsing precursors onto a gate structure a first time, the precursors comprising a silicon precursor, a carbon precursor, an oxygen precursor, and a nitrogen precursor; and
individually pulsing the silicon precursor, the carbon precursor, the oxygen precursor, and the nitrogen precursor onto the gate structure a second time, wherein at least two flow rates of the precursors are modified between the first time and the second time; and
etching the low-k layer to form a spacer.
16. The method of claim 15 , wherein a concentration of nitrogen is less than 10 atomic percent of the low-k layer.
17. The method of claim 16 , wherein a concentration of carbon is less than 5 atomic percent of the low-k layer.
18. The method of claim 15 , wherein the silicon precursor is Si 2 Cl 6 .
19. The method of claim 15 , wherein the carbon precursor is C 6 H 15 N.
20. The method of claim 15 , wherein the spacer further comprises a surface modification layer located between the low-k layer and a gate stack, wherein a second concentration of nitrogen in the surface modification layer increases from the gate stack to the low-k layer.